JPS6465836A - Aligner - Google Patents

Aligner

Info

Publication number
JPS6465836A
JPS6465836A JP62222712A JP22271287A JPS6465836A JP S6465836 A JPS6465836 A JP S6465836A JP 62222712 A JP62222712 A JP 62222712A JP 22271287 A JP22271287 A JP 22271287A JP S6465836 A JPS6465836 A JP S6465836A
Authority
JP
Japan
Prior art keywords
main body
exposure light
exposure
light source
oscillation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62222712A
Other languages
Japanese (ja)
Other versions
JP2653793B2 (en
Inventor
Yukio Tokuda
Takanaga Shiozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62222712A priority Critical patent/JP2653793B2/en
Publication of JPS6465836A publication Critical patent/JPS6465836A/en
Application granted granted Critical
Publication of JP2653793B2 publication Critical patent/JP2653793B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent such defectives as the uneven illumination intensity, the loss in exposure level due to oscillation and the deterioration in throughput from occurring by a method wherein the leading-in port of exposure light from annexed exposure light source to the aligner main body is arranged on the substantial oscillation center of the main body. CONSTITUTION:The beams from an annexed exposure light source 1 enter from a main body leading-in port mirror 1-8 to an exposure optical system 1-14 to expose wafer 1-2 on an XY stage 1-4' through a projection optical system 1-3. At this time, the main body leading-in port mirror 1-8 being arranged on the substantial oscillation center (a) of the device main body, the exposure light is led in the exposure light source system 1-14 similar to the case when the device does not oscillate. Consequently, such defectives as the uneven illumination intensity, the loss in exposure level due to oscillation and the deterioration in throughput can be prevented from occurring.
JP62222712A 1987-09-04 1987-09-04 Exposure apparatus and element manufacturing method Expired - Fee Related JP2653793B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62222712A JP2653793B2 (en) 1987-09-04 1987-09-04 Exposure apparatus and element manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62222712A JP2653793B2 (en) 1987-09-04 1987-09-04 Exposure apparatus and element manufacturing method

Publications (2)

Publication Number Publication Date
JPS6465836A true JPS6465836A (en) 1989-03-13
JP2653793B2 JP2653793B2 (en) 1997-09-17

Family

ID=16786724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62222712A Expired - Fee Related JP2653793B2 (en) 1987-09-04 1987-09-04 Exposure apparatus and element manufacturing method

Country Status (1)

Country Link
JP (1) JP2653793B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
JPS62165916A (en) * 1986-01-17 1987-07-22 Matsushita Electric Ind Co Ltd Exposure device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
JPS62165916A (en) * 1986-01-17 1987-07-22 Matsushita Electric Ind Co Ltd Exposure device

Also Published As

Publication number Publication date
JP2653793B2 (en) 1997-09-17

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees