JPS6465836A - Aligner - Google Patents
AlignerInfo
- Publication number
- JPS6465836A JPS6465836A JP62222712A JP22271287A JPS6465836A JP S6465836 A JPS6465836 A JP S6465836A JP 62222712 A JP62222712 A JP 62222712A JP 22271287 A JP22271287 A JP 22271287A JP S6465836 A JPS6465836 A JP S6465836A
- Authority
- JP
- Japan
- Prior art keywords
- main body
- exposure light
- exposure
- light source
- oscillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To prevent such defectives as the uneven illumination intensity, the loss in exposure level due to oscillation and the deterioration in throughput from occurring by a method wherein the leading-in port of exposure light from annexed exposure light source to the aligner main body is arranged on the substantial oscillation center of the main body. CONSTITUTION:The beams from an annexed exposure light source 1 enter from a main body leading-in port mirror 1-8 to an exposure optical system 1-14 to expose wafer 1-2 on an XY stage 1-4' through a projection optical system 1-3. At this time, the main body leading-in port mirror 1-8 being arranged on the substantial oscillation center (a) of the device main body, the exposure light is led in the exposure light source system 1-14 similar to the case when the device does not oscillate. Consequently, such defectives as the uneven illumination intensity, the loss in exposure level due to oscillation and the deterioration in throughput can be prevented from occurring.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62222712A JP2653793B2 (en) | 1987-09-04 | 1987-09-04 | Exposure apparatus and element manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62222712A JP2653793B2 (en) | 1987-09-04 | 1987-09-04 | Exposure apparatus and element manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6465836A true JPS6465836A (en) | 1989-03-13 |
JP2653793B2 JP2653793B2 (en) | 1997-09-17 |
Family
ID=16786724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62222712A Expired - Fee Related JP2653793B2 (en) | 1987-09-04 | 1987-09-04 | Exposure apparatus and element manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2653793B2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
JPS62165916A (en) * | 1986-01-17 | 1987-07-22 | Matsushita Electric Ind Co Ltd | Exposure device |
-
1987
- 1987-09-04 JP JP62222712A patent/JP2653793B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
JPS62165916A (en) * | 1986-01-17 | 1987-07-22 | Matsushita Electric Ind Co Ltd | Exposure device |
Also Published As
Publication number | Publication date |
---|---|
JP2653793B2 (en) | 1997-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |