JPS6428916A - Aligner - Google Patents

Aligner

Info

Publication number
JPS6428916A
JPS6428916A JP62185842A JP18584287A JPS6428916A JP S6428916 A JPS6428916 A JP S6428916A JP 62185842 A JP62185842 A JP 62185842A JP 18584287 A JP18584287 A JP 18584287A JP S6428916 A JPS6428916 A JP S6428916A
Authority
JP
Japan
Prior art keywords
aligner
illumination
caused
reticle
tilt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62185842A
Other languages
Japanese (ja)
Inventor
Kazuhiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62185842A priority Critical patent/JPS6428916A/en
Publication of JPS6428916A publication Critical patent/JPS6428916A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a highly accurate aligner which eliminates an influence due to a vibration caused inside an exposure mechanism by a method wherein an optical fiber is fixed to a photodetecting part of an illumination beam from an aligner so that the illumination beam can be accurately incident on a prescribed position of the aligner at a prescribed angle. CONSTITUTION:When an X-Y stage is moved, the center of gravity is shifted inside a device; the whole device is slightly tilted or vibrated. If a laser light source A and an aligner B are arranged separately, in optical axis L between a laser beam and the aligner B is displaced even when a tilt or a vibration is caused slightly. Then, the beam which is incident on an optical integrator 8 is displaced; an unexposed part is caused; the intensity of illumination on a reticle 11 becomes irregular. However, because a fiber 2 is fixed to the aligner B by using a fixing part 4, the optical axis L between the laser beam and the aligner can be kept always constant even when the aligner B is tilted as indicated by a one-dot chain line; the same illumination state as prior to the tilt can be maintained on the reticle 11.
JP62185842A 1987-07-24 1987-07-24 Aligner Pending JPS6428916A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62185842A JPS6428916A (en) 1987-07-24 1987-07-24 Aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62185842A JPS6428916A (en) 1987-07-24 1987-07-24 Aligner

Publications (1)

Publication Number Publication Date
JPS6428916A true JPS6428916A (en) 1989-01-31

Family

ID=16177832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62185842A Pending JPS6428916A (en) 1987-07-24 1987-07-24 Aligner

Country Status (1)

Country Link
JP (1) JPS6428916A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6638800B1 (en) 1992-11-06 2003-10-28 Semiconductor Energy Laboratory Co., Ltd. Laser processing apparatus and laser processing process

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6638800B1 (en) 1992-11-06 2003-10-28 Semiconductor Energy Laboratory Co., Ltd. Laser processing apparatus and laser processing process

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