JPH0480530B2 - - Google Patents

Info

Publication number
JPH0480530B2
JPH0480530B2 JP63188433A JP18843388A JPH0480530B2 JP H0480530 B2 JPH0480530 B2 JP H0480530B2 JP 63188433 A JP63188433 A JP 63188433A JP 18843388 A JP18843388 A JP 18843388A JP H0480530 B2 JPH0480530 B2 JP H0480530B2
Authority
JP
Japan
Prior art keywords
light
light source
exposure
pulse laser
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63188433A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6477124A (en
Inventor
Takeoki Myauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63188433A priority Critical patent/JPS6477124A/ja
Publication of JPS6477124A publication Critical patent/JPS6477124A/ja
Publication of JPH0480530B2 publication Critical patent/JPH0480530B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP63188433A 1988-07-29 1988-07-29 Projection type exposure device Granted JPS6477124A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63188433A JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63188433A JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP3257457A Division JP2501053B2 (ja) 1991-10-04 1991-10-04 紫外パルスレ―ザによる投影式露光方法

Publications (2)

Publication Number Publication Date
JPS6477124A JPS6477124A (en) 1989-03-23
JPH0480530B2 true JPH0480530B2 (enrdf_load_stackoverflow) 1992-12-18

Family

ID=16223589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63188433A Granted JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Country Status (1)

Country Link
JP (1) JPS6477124A (enrdf_load_stackoverflow)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enrdf_load_stackoverflow) * 1971-08-25 1973-04-23
JPS4831969A (enrdf_load_stackoverflow) * 1971-08-27 1973-04-26
JPS5144660B2 (enrdf_load_stackoverflow) * 1971-10-18 1976-11-30
JPS555081B2 (enrdf_load_stackoverflow) * 1973-01-24 1980-02-04
JPS505040A (enrdf_load_stackoverflow) * 1973-02-19 1975-01-20
JPS5038378A (enrdf_load_stackoverflow) * 1973-08-08 1975-04-09
JPS5721801B2 (enrdf_load_stackoverflow) * 1973-08-08 1982-05-10
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures

Also Published As

Publication number Publication date
JPS6477124A (en) 1989-03-23

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