JPH01107557A - 配線の形成方法 - Google Patents

配線の形成方法

Info

Publication number
JPH01107557A
JPH01107557A JP26372187A JP26372187A JPH01107557A JP H01107557 A JPH01107557 A JP H01107557A JP 26372187 A JP26372187 A JP 26372187A JP 26372187 A JP26372187 A JP 26372187A JP H01107557 A JPH01107557 A JP H01107557A
Authority
JP
Japan
Prior art keywords
film
hole
deposited
target
molybdenum silicide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26372187A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0552057B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Toru Mogami
徹 最上
Kiyoyoshi Kajihari
鍛治梁 喜代儀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP26372187A priority Critical patent/JPH01107557A/ja
Publication of JPH01107557A publication Critical patent/JPH01107557A/ja
Publication of JPH0552057B2 publication Critical patent/JPH0552057B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
JP26372187A 1987-10-21 1987-10-21 配線の形成方法 Granted JPH01107557A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26372187A JPH01107557A (ja) 1987-10-21 1987-10-21 配線の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26372187A JPH01107557A (ja) 1987-10-21 1987-10-21 配線の形成方法

Publications (2)

Publication Number Publication Date
JPH01107557A true JPH01107557A (ja) 1989-04-25
JPH0552057B2 JPH0552057B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-04

Family

ID=17393386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26372187A Granted JPH01107557A (ja) 1987-10-21 1987-10-21 配線の形成方法

Country Status (1)

Country Link
JP (1) JPH01107557A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6119883A (en) * 1998-12-07 2000-09-19 Owens-Illinois Closure Inc. Tamper-indicating closure and method of manufacture
US6152316A (en) * 1999-05-17 2000-11-28 Owens-Illinois Closure Inc. Tamper-indicating closure and method of manufacture
US6382443B1 (en) 1999-04-28 2002-05-07 Owens-Illinois Closure Inc. Tamper-indicating closure with lugs on a stop flange for spacing the flange from the finish of a container

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189241A (ja) * 1984-03-08 1985-09-26 Agency Of Ind Science & Technol 段差の被覆方法
JPS60193336A (ja) * 1984-03-15 1985-10-01 Nec Corp コンタクト電極の形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189241A (ja) * 1984-03-08 1985-09-26 Agency Of Ind Science & Technol 段差の被覆方法
JPS60193336A (ja) * 1984-03-15 1985-10-01 Nec Corp コンタクト電極の形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6119883A (en) * 1998-12-07 2000-09-19 Owens-Illinois Closure Inc. Tamper-indicating closure and method of manufacture
US6382443B1 (en) 1999-04-28 2002-05-07 Owens-Illinois Closure Inc. Tamper-indicating closure with lugs on a stop flange for spacing the flange from the finish of a container
US6152316A (en) * 1999-05-17 2000-11-28 Owens-Illinois Closure Inc. Tamper-indicating closure and method of manufacture

Also Published As

Publication number Publication date
JPH0552057B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-04

Similar Documents

Publication Publication Date Title
JP3287392B2 (ja) 半導体装置およびその製造方法
US5081064A (en) Method of forming electrical contact between interconnection layers located at different layer levels
JPS6110256A (ja) 集積回路の接点孔への相互接続線の自動位置決め方法
JP2959758B2 (ja) コンタクトホール内の導電性プラグ形成方法
JP3408463B2 (ja) 半導体装置の製造方法
KR900007682B1 (ko) 반도체기판의 단차부 매립방법
JPH01107557A (ja) 配線の形成方法
JPH0645281A (ja) 配線形成方法及び半導体装置、及びこれに用いることができるスパッタ方法及びスパッタ装置
US5940730A (en) Method of forming a contact hole of a semiconductor device
JP3119198B2 (ja) 半導体装置の製造方法
JPH01107559A (ja) 配線の形成方法
KR100197669B1 (ko) 반도체 소자의 금속배선 형성방법
KR100257154B1 (ko) 반도체 소자의 금속 배선 형성 방법
KR100260522B1 (ko) 반도체소자의콘택홀매립방법
JPH0569294B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH06236928A (ja) 半導体装置およびその製造方法
KR100236095B1 (ko) 반도체 소자의 금속배선 형성방법
JPS61179532A (ja) コンタクト電極の形成方法
JPS61172327A (ja) 導体膜の堆積方法
JPS6346751A (ja) 2つの金属化面間の絶縁層中に低抵抗接合層を製造する方法
JP3254763B2 (ja) 多層配線形成方法
JPH03108721A (ja) 配線の形成方法
JPS61117829A (ja) コンタクト電極の形成方法
JPH03263833A (ja) テーパエツチング方法
JPS6351659A (ja) 配線の形成方法

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term