JP7831694B2 - 蒸着マスク、及び電子デバイスの製造方法 - Google Patents

蒸着マスク、及び電子デバイスの製造方法

Info

Publication number
JP7831694B2
JP7831694B2 JP2025518929A JP2025518929A JP7831694B2 JP 7831694 B2 JP7831694 B2 JP 7831694B2 JP 2025518929 A JP2025518929 A JP 2025518929A JP 2025518929 A JP2025518929 A JP 2025518929A JP 7831694 B2 JP7831694 B2 JP 7831694B2
Authority
JP
Japan
Prior art keywords
membrane
substrate
support substrate
opening
deposition mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2025518929A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025105425A1 (https=
JPWO2025105425A5 (https=
Inventor
葵 佐野
数馬 碓氷
浩之 道
涼真 茂木
昭彦 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Holdings Inc
Original Assignee
Toppan Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Holdings Inc filed Critical Toppan Holdings Inc
Publication of JPWO2025105425A1 publication Critical patent/JPWO2025105425A1/ja
Publication of JPWO2025105425A5 publication Critical patent/JPWO2025105425A5/ja
Application granted granted Critical
Publication of JP7831694B2 publication Critical patent/JP7831694B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2025518929A 2023-11-16 2024-11-14 蒸着マスク、及び電子デバイスの製造方法 Active JP7831694B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023195185 2023-11-16
JP2023195185 2023-11-16
PCT/JP2024/040446 WO2025105425A1 (ja) 2023-11-16 2024-11-14 蒸着マスク、及び電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025105425A1 JPWO2025105425A1 (https=) 2025-05-22
JPWO2025105425A5 JPWO2025105425A5 (https=) 2025-10-15
JP7831694B2 true JP7831694B2 (ja) 2026-03-17

Family

ID=95743160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025518929A Active JP7831694B2 (ja) 2023-11-16 2024-11-14 蒸着マスク、及び電子デバイスの製造方法

Country Status (4)

Country Link
JP (1) JP7831694B2 (https=)
KR (1) KR20260046210A (https=)
CN (1) CN121263547A (https=)
WO (1) WO2025105425A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133433A (ja) 1998-10-29 2000-05-12 Sharp Corp 高周波加熱装置
JP2002305079A (ja) 2001-01-26 2002-10-18 Seiko Epson Corp マスク、マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置
JP2006202548A (ja) 2005-01-19 2006-08-03 Seiko Epson Corp マスク、及びマスクの製造方法
JP2009087840A (ja) 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2022175925A (ja) 2021-05-14 2022-11-25 キヤノン株式会社 蒸着マスク、及び、有機電子デバイスの製造方法
WO2023145955A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 マスク及びマスクの製造方法
JP2024014701A (ja) 2022-07-22 2024-02-01 オラム マテリアル コーポレーション マスクと支持部との連結体及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3024641B1 (ja) * 1998-10-23 2000-03-21 日本電気株式会社 シャドウマスク及びその製造方法並びにシャドウマスクを用いた有機ｅｌディスプレイの製造方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133433A (ja) 1998-10-29 2000-05-12 Sharp Corp 高周波加熱装置
JP2002305079A (ja) 2001-01-26 2002-10-18 Seiko Epson Corp マスク、マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置
JP2006202548A (ja) 2005-01-19 2006-08-03 Seiko Epson Corp マスク、及びマスクの製造方法
JP2009087840A (ja) 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
US20200044010A1 (en) 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2022175925A (ja) 2021-05-14 2022-11-25 キヤノン株式会社 蒸着マスク、及び、有機電子デバイスの製造方法
WO2023145955A1 (ja) 2022-01-31 2023-08-03 大日本印刷株式会社 マスク及びマスクの製造方法
JP2024014701A (ja) 2022-07-22 2024-02-01 オラム マテリアル コーポレーション マスクと支持部との連結体及びその製造方法

Also Published As

Publication number Publication date
JPWO2025105425A1 (https=) 2025-05-22
KR20260046210A (ko) 2026-04-06
WO2025105425A1 (ja) 2025-05-22
CN121263547A (zh) 2026-01-02

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