CN121263547A - 蒸镀掩模、以及电子器件的制造方法 - Google Patents

蒸镀掩模、以及电子器件的制造方法

Info

Publication number
CN121263547A
CN121263547A CN202480035638.0A CN202480035638A CN121263547A CN 121263547 A CN121263547 A CN 121263547A CN 202480035638 A CN202480035638 A CN 202480035638A CN 121263547 A CN121263547 A CN 121263547A
Authority
CN
China
Prior art keywords
vapor deposition
substrate
thin film
deposition mask
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480035638.0A
Other languages
English (en)
Chinese (zh)
Inventor
佐野葵
碓冰数马
道浩之
茂木凉真
小林昭彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takahashi Holdings Co ltd
Original Assignee
Takahashi Holdings Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takahashi Holdings Co ltd filed Critical Takahashi Holdings Co ltd
Publication of CN121263547A publication Critical patent/CN121263547A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN202480035638.0A 2023-11-16 2024-11-14 蒸镀掩模、以及电子器件的制造方法 Pending CN121263547A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023195185 2023-11-16
JP2023-195185 2023-11-16
PCT/JP2024/040446 WO2025105425A1 (ja) 2023-11-16 2024-11-14 蒸着マスク、及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
CN121263547A true CN121263547A (zh) 2026-01-02

Family

ID=95743160

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480035638.0A Pending CN121263547A (zh) 2023-11-16 2024-11-14 蒸镀掩模、以及电子器件的制造方法

Country Status (4)

Country Link
JP (1) JP7831694B2 (https=)
KR (1) KR20260046210A (https=)
CN (1) CN121263547A (https=)
WO (1) WO2025105425A1 (https=)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3024641B1 (ja) * 1998-10-23 2000-03-21 日本電気株式会社 シャドウマスク及びその製造方法並びにシャドウマスクを用いた有機ｅｌディスプレイの製造方法
JP2000133433A (ja) 1998-10-29 2000-05-12 Sharp Corp 高周波加熱装置
JP4092914B2 (ja) 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
JP2006202548A (ja) 2005-01-19 2006-08-03 Seiko Epson Corp マスク、及びマスクの製造方法
JP2009087840A (ja) * 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
CN108735915B (zh) 2017-04-14 2021-02-09 上海视涯技术有限公司 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
JP2022175925A (ja) 2021-05-14 2022-11-25 キヤノン株式会社 蒸着マスク、及び、有機電子デバイスの製造方法
US20250146121A1 (en) 2022-01-31 2025-05-08 Dai Nippon Printing Co., Ltd. Mask and method of manufacturing mask
JP2024014701A (ja) 2022-07-22 2024-02-01 オラム マテリアル コーポレーション マスクと支持部との連結体及びその製造方法

Also Published As

Publication number Publication date
JPWO2025105425A1 (https=) 2025-05-22
KR20260046210A (ko) 2026-04-06
JP7831694B2 (ja) 2026-03-17
WO2025105425A1 (ja) 2025-05-22

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