KR20260046210A - 증착 마스크 및 전자 디바이스의 제조 방법 - Google Patents

증착 마스크 및 전자 디바이스의 제조 방법

Info

Publication number
KR20260046210A
KR20260046210A KR1020267006944A KR20267006944A KR20260046210A KR 20260046210 A KR20260046210 A KR 20260046210A KR 1020267006944 A KR1020267006944 A KR 1020267006944A KR 20267006944 A KR20267006944 A KR 20267006944A KR 20260046210 A KR20260046210 A KR 20260046210A
Authority
KR
South Korea
Prior art keywords
membrane
substrate
deposition mask
support substrate
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020267006944A
Other languages
English (en)
Korean (ko)
Inventor
아오이 사노
가즈마 우스이
히로유키 미치
료마 모테기
아키히코 고바야시
Original Assignee
도판 홀딩스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도판 홀딩스 가부시키가이샤 filed Critical 도판 홀딩스 가부시키가이샤
Publication of KR20260046210A publication Critical patent/KR20260046210A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020267006944A 2023-11-16 2024-11-14 증착 마스크 및 전자 디바이스의 제조 방법 Pending KR20260046210A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023195185 2023-11-16
JPJP-P-2023-195185 2023-11-16
PCT/JP2024/040446 WO2025105425A1 (ja) 2023-11-16 2024-11-14 蒸着マスク、及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20260046210A true KR20260046210A (ko) 2026-04-06

Family

ID=95743160

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020267006944A Pending KR20260046210A (ko) 2023-11-16 2024-11-14 증착 마스크 및 전자 디바이스의 제조 방법

Country Status (4)

Country Link
JP (1) JP7831694B2 (https=)
KR (1) KR20260046210A (https=)
CN (1) CN121263547A (https=)
WO (1) WO2025105425A1 (https=)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3024641B1 (ja) * 1998-10-23 2000-03-21 日本電気株式会社 シャドウマスク及びその製造方法並びにシャドウマスクを用いた有機ｅｌディスプレイの製造方法
JP2000133433A (ja) 1998-10-29 2000-05-12 Sharp Corp 高周波加熱装置
JP4092914B2 (ja) 2001-01-26 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、有機エレクトロルミネッセンス装置の製造方法
JP2006202548A (ja) 2005-01-19 2006-08-03 Seiko Epson Corp マスク、及びマスクの製造方法
JP2009087840A (ja) * 2007-10-02 2009-04-23 Seiko Epson Corp 蒸着マスク、蒸着マスクの製造方法、有機ｅｌ素子、電子機器
CN108735915B (zh) 2017-04-14 2021-02-09 上海视涯技术有限公司 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
JP2022175925A (ja) 2021-05-14 2022-11-25 キヤノン株式会社 蒸着マスク、及び、有機電子デバイスの製造方法
US20250146121A1 (en) 2022-01-31 2025-05-08 Dai Nippon Printing Co., Ltd. Mask and method of manufacturing mask
JP2024014701A (ja) 2022-07-22 2024-02-01 オラム マテリアル コーポレーション マスクと支持部との連結体及びその製造方法

Also Published As

Publication number Publication date
JPWO2025105425A1 (https=) 2025-05-22
JP7831694B2 (ja) 2026-03-17
WO2025105425A1 (ja) 2025-05-22
CN121263547A (zh) 2026-01-02

Similar Documents

Publication Publication Date Title
JP3150053U (ja) シャワーヘッド電極
KR20220155201A (ko) 증착 마스크 및 유기 전자 디바이스의 제조방법
US20140190006A1 (en) Method for manufacturing charged particle beam lens
JP2026012862A (ja) 蒸着マスク及び、電子デバイスの製造方法
JP2026012861A (ja) 蒸着マスク及び、電子デバイスの製造方法
KR20260046210A (ko) 증착 마스크 및 전자 디바이스의 제조 방법
CN108728789A (zh) 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
WO2022088733A1 (zh) 半导体结构的形成方法
JP7708338B2 (ja) 蒸着マスク及び、電子デバイスの製造方法
JP7823804B1 (ja) 蒸着マスク及び、電子デバイスの製造方法
KR20250123832A (ko) 마스크의 제조 방법 및 마스크
US12571084B2 (en) Corrugated high-resolution shadow masks
KR102955251B1 (ko) 웨이퍼 프레임 연속 가공 마스크의 제조방법 및 이에 의해 제조된 웨이퍼 프레임 연속형 마스크
US20240384389A1 (en) Evaporation mask and manufacturing method thereof
WO2023138081A1 (en) Corrugated high-resolution shadow masks
US20250385176A1 (en) Tilted super vias
KR100555236B1 (ko) 반도체 및 ｌｃｄ 제조용 정전척 구조
CN120933154A (zh) 一种凸起区窗口的制备方法
JP2005089771A (ja) 撥水性構造およびその製造方法
CN118103545A (zh) 波纹状高分辨率荫罩
CN112349701A (zh) 半导体基板及其制备方法
KR20210128545A (ko) 표시 장치의 제조 방법
KR20020043954A (ko) 반도체 장치의 제조에서 건식 식각 장치
JP2012226116A (ja) 液晶表示装置及びその製造方法
KR20070114956A (ko) 반도체 소자의 형성 방법

Legal Events

Date Code Title Description
D11 Substantive examination requested

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D11-EXM-PA0201 (AS PROVIDED BY THE NATIONAL OFFICE)

D16 Fast track examination requested

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D16-EXM-PA0302 (AS PROVIDED BY THE NATIONAL OFFICE)

D17 Fast track examination accepted

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D17-EXM-PA0302 (AS PROVIDED BY THE NATIONAL OFFICE)

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13 Application amended

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

Q12 Application published

Free format text: ST27 STATUS EVENT CODE: A-1-1-Q10-Q12-NAP-PG1501 (AS PROVIDED BY THE NATIONAL OFFICE)

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902