CN108728789A - 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 - Google Patents
用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 Download PDFInfo
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- CN108728789A CN108728789A CN201710244511.1A CN201710244511A CN108728789A CN 108728789 A CN108728789 A CN 108728789A CN 201710244511 A CN201710244511 A CN 201710244511A CN 108728789 A CN108728789 A CN 108728789A
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- layer
- semiconductor
- grid film
- shadow mask
- film layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (31)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710244511.1A CN108728789B (zh) | 2017-04-14 | 2017-04-14 | 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710244511.1A CN108728789B (zh) | 2017-04-14 | 2017-04-14 | 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 |
Publications (2)
Publication Number | Publication Date |
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CN108728789A true CN108728789A (zh) | 2018-11-02 |
CN108728789B CN108728789B (zh) | 2020-06-23 |
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CN201710244511.1A Active CN108728789B (zh) | 2017-04-14 | 2017-04-14 | 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法 |
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CN (1) | CN108728789B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108914058A (zh) * | 2018-08-20 | 2018-11-30 | 武汉华星光电半导体显示技术有限公司 | 一种精密金属掩膜版、蒸镀装置和蒸镀制程 |
CN113181549A (zh) * | 2021-04-28 | 2021-07-30 | 中国科学院空天信息创新研究院 | 癫痫灶定位脑深部柔性微纳电极阵列及其制备方法 |
CN115181934A (zh) * | 2022-06-21 | 2022-10-14 | 广州国显科技有限公司 | 掩膜板及掩膜板的制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008196029A (ja) * | 2007-02-15 | 2008-08-28 | Seiko Epson Corp | 蒸着用マスクの製造方法および蒸着用マスク |
CN103572206A (zh) * | 2013-11-08 | 2014-02-12 | 昆山允升吉光电科技有限公司 | 一种复合掩模板组件的制作方法 |
CN103866230A (zh) * | 2014-03-20 | 2014-06-18 | 中山新诺科技股份有限公司 | 一种oled显示面板生产用新型荫罩板的制作方法 |
CN104593722A (zh) * | 2014-12-23 | 2015-05-06 | 深圳市华星光电技术有限公司 | 掩膜板的制作方法 |
CN105336572A (zh) * | 2014-07-28 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构的形成方法 |
US20160160339A1 (en) * | 2014-12-05 | 2016-06-09 | Samsung Display Co., Ltd. | Method of manufacturing deposition mask |
-
2017
- 2017-04-14 CN CN201710244511.1A patent/CN108728789B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008196029A (ja) * | 2007-02-15 | 2008-08-28 | Seiko Epson Corp | 蒸着用マスクの製造方法および蒸着用マスク |
CN103572206A (zh) * | 2013-11-08 | 2014-02-12 | 昆山允升吉光电科技有限公司 | 一种复合掩模板组件的制作方法 |
CN103866230A (zh) * | 2014-03-20 | 2014-06-18 | 中山新诺科技股份有限公司 | 一种oled显示面板生产用新型荫罩板的制作方法 |
CN105336572A (zh) * | 2014-07-28 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构的形成方法 |
US20160160339A1 (en) * | 2014-12-05 | 2016-06-09 | Samsung Display Co., Ltd. | Method of manufacturing deposition mask |
CN104593722A (zh) * | 2014-12-23 | 2015-05-06 | 深圳市华星光电技术有限公司 | 掩膜板的制作方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108914058A (zh) * | 2018-08-20 | 2018-11-30 | 武汉华星光电半导体显示技术有限公司 | 一种精密金属掩膜版、蒸镀装置和蒸镀制程 |
CN113181549A (zh) * | 2021-04-28 | 2021-07-30 | 中国科学院空天信息创新研究院 | 癫痫灶定位脑深部柔性微纳电极阵列及其制备方法 |
CN115181934A (zh) * | 2022-06-21 | 2022-10-14 | 广州国显科技有限公司 | 掩膜板及掩膜板的制备方法 |
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Publication number | Publication date |
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CN108728789B (zh) | 2020-06-23 |
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Effective date of registration: 20191028 Address after: 201206 Shanghai, Pudong New Area, China (Shanghai) free trade zone, new Jinqiao Road, No. 13, building 2, floor 27 Applicant after: Shanghai Shiou Photoelectric Technology Co.,Ltd. Address before: 201206 6 building, 45 Jinhai Road, Pudong New Area, Shanghai, 1000 Applicant before: SEEYA INFORMATION TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20200826 Address after: 230012 room a5-103, No.999, Wenzhong Road, Xinzhan District, Hefei City, Anhui Province Patentee after: Hefei Shiya Technology Co.,Ltd. Address before: 201206 Shanghai, Pudong New Area, China (Shanghai) free trade zone, new Jinqiao Road, No. 13, building 2, floor 27 Patentee before: Shanghai Shiou Photoelectric Technology Co.,Ltd. |
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Address after: Room a5-103, No.999, Wenzhong Road, Xinzhan District, Hefei City, Anhui Province, 230012 Patentee after: Vision Technology Co.,Ltd. Address before: Room a5-103, No.999, Wenzhong Road, Xinzhan District, Hefei City, Anhui Province, 230012 Patentee before: Hefei Shiya Technology Co.,Ltd. |