JP7653785B2 - 基板洗浄装置および基板洗浄方法 - Google Patents

基板洗浄装置および基板洗浄方法 Download PDF

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Publication number
JP7653785B2
JP7653785B2 JP2020218543A JP2020218543A JP7653785B2 JP 7653785 B2 JP7653785 B2 JP 7653785B2 JP 2020218543 A JP2020218543 A JP 2020218543A JP 2020218543 A JP2020218543 A JP 2020218543A JP 7653785 B2 JP7653785 B2 JP 7653785B2
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Japan
Prior art keywords
substrate
cleaning
cleaning tool
force
brush
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JP2020218543A
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English (en)
Japanese (ja)
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JP2022103731A5 (https=
JP2022103731A (ja
Inventor
敬 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2020218543A priority Critical patent/JP7653785B2/ja
Priority to TW110144172A priority patent/TWI841883B/zh
Priority to CN202111571492.6A priority patent/CN114695186B/zh
Priority to KR1020210187137A priority patent/KR102653153B1/ko
Publication of JP2022103731A publication Critical patent/JP2022103731A/ja
Publication of JP2022103731A5 publication Critical patent/JP2022103731A5/ja
Application granted granted Critical
Publication of JP7653785B2 publication Critical patent/JP7653785B2/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0616—Monitoring of warpages, curvatures, damages, defects or the like
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2020218543A 2020-12-28 2020-12-28 基板洗浄装置および基板洗浄方法 Active JP7653785B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020218543A JP7653785B2 (ja) 2020-12-28 2020-12-28 基板洗浄装置および基板洗浄方法
TW110144172A TWI841883B (zh) 2020-12-28 2021-11-26 基板洗淨裝置及基板洗淨方法
CN202111571492.6A CN114695186B (zh) 2020-12-28 2021-12-21 衬底洗净装置及衬底洗净方法
KR1020210187137A KR102653153B1 (ko) 2020-12-28 2021-12-24 기판 세정 장치 및 기판 세정 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020218543A JP7653785B2 (ja) 2020-12-28 2020-12-28 基板洗浄装置および基板洗浄方法

Publications (3)

Publication Number Publication Date
JP2022103731A JP2022103731A (ja) 2022-07-08
JP2022103731A5 JP2022103731A5 (https=) 2023-06-30
JP7653785B2 true JP7653785B2 (ja) 2025-03-31

Family

ID=82136388

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JP2020218543A Active JP7653785B2 (ja) 2020-12-28 2020-12-28 基板洗浄装置および基板洗浄方法

Country Status (4)

Country Link
JP (1) JP7653785B2 (https=)
KR (1) KR102653153B1 (https=)
CN (1) CN114695186B (https=)
TW (1) TWI841883B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7843692B2 (ja) * 2022-12-23 2026-04-10 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法
JP2024091091A (ja) * 2022-12-23 2024-07-04 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置および基板洗浄方法
JP2025135997A (ja) * 2024-03-06 2025-09-19 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000188274A (ja) 1998-12-21 2000-07-04 Sony Corp 基板洗浄装置
JP2009206139A (ja) 2008-02-26 2009-09-10 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014038983A (ja) 2012-08-20 2014-02-27 Ebara Corp 基板洗浄装置及び基板処理装置
JP2015220402A (ja) 2014-05-20 2015-12-07 株式会社荏原製作所 基板洗浄装置および基板洗浄装置で実行される方法
JP2019216153A (ja) 2018-06-12 2019-12-19 ルネサスエレクトロニクス株式会社 半導体装置の製造方法及び洗浄装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10340873A (ja) * 1997-06-10 1998-12-22 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3953716B2 (ja) 2000-08-01 2007-08-08 株式会社荏原製作所 基板洗浄装置
JP4824664B2 (ja) * 2007-03-09 2011-11-30 大日本スクリーン製造株式会社 基板処理装置
JP4928343B2 (ja) * 2007-04-27 2012-05-09 大日本スクリーン製造株式会社 基板処理装置
CN102592961A (zh) * 2011-01-12 2012-07-18 柏连企业股份有限公司 晶片下片排片机
JP5904169B2 (ja) * 2013-07-23 2016-04-13 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法及び記憶媒体
JP6210935B2 (ja) * 2013-11-13 2017-10-11 東京エレクトロン株式会社 研磨洗浄機構、基板処理装置及び基板処理方法
JP6740065B2 (ja) * 2016-09-13 2020-08-12 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置、基板処理装置、基板洗浄方法および基板処理方法
JP6810631B2 (ja) * 2017-02-14 2021-01-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
TWI834489B (zh) * 2017-12-13 2024-03-01 日商東京威力科創股份有限公司 基板處理裝置
JP6895565B2 (ja) 2019-02-27 2021-06-30 株式会社荏原製作所 基板洗浄装置および基板洗浄装置で実行される方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000188274A (ja) 1998-12-21 2000-07-04 Sony Corp 基板洗浄装置
JP2009206139A (ja) 2008-02-26 2009-09-10 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014038983A (ja) 2012-08-20 2014-02-27 Ebara Corp 基板洗浄装置及び基板処理装置
JP2015220402A (ja) 2014-05-20 2015-12-07 株式会社荏原製作所 基板洗浄装置および基板洗浄装置で実行される方法
JP2019216153A (ja) 2018-06-12 2019-12-19 ルネサスエレクトロニクス株式会社 半導体装置の製造方法及び洗浄装置

Also Published As

Publication number Publication date
KR102653153B1 (ko) 2024-04-01
CN114695186A (zh) 2022-07-01
JP2022103731A (ja) 2022-07-08
CN114695186B (zh) 2026-02-10
KR20220094161A (ko) 2022-07-05
TWI841883B (zh) 2024-05-11
TW202224791A (zh) 2022-07-01

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