JP7575395B2 - 複合キャパシタ - Google Patents

複合キャパシタ Download PDF

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Publication number
JP7575395B2
JP7575395B2 JP2021554072A JP2021554072A JP7575395B2 JP 7575395 B2 JP7575395 B2 JP 7575395B2 JP 2021554072 A JP2021554072 A JP 2021554072A JP 2021554072 A JP2021554072 A JP 2021554072A JP 7575395 B2 JP7575395 B2 JP 7575395B2
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JP
Japan
Prior art keywords
capacitor
electrode layer
composite
capacitors
support electrode
Prior art date
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JP2021554072A
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English (en)
Japanese (ja)
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JPWO2021079566A5 (https=
JPWO2021079566A1 (https=
Inventor
真己 永田
康弘 清水
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Murata Manufacturing Co Ltd
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Murata Manufacturing Co Ltd
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Publication of JPWO2021079566A5 publication Critical patent/JPWO2021079566A5/ja
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/008Selection of materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/012Form of non-self-supporting electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/33Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/38Multiple capacitors, i.e. structural combinations of fixed capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/38Multiple capacitors, i.e. structural combinations of fixed capacitors
    • H01G4/385Single unit multiple capacitors, e.g. dual capacitor in one coil

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Ceramic Capacitors (AREA)
JP2021554072A 2019-10-24 2020-07-09 複合キャパシタ Active JP7575395B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019193614 2019-10-24
JP2019193614 2019-10-24
PCT/JP2020/026831 WO2021079566A1 (ja) 2019-10-24 2020-07-09 複合キャパシタ

Publications (3)

Publication Number Publication Date
JPWO2021079566A1 JPWO2021079566A1 (https=) 2021-04-29
JPWO2021079566A5 JPWO2021079566A5 (https=) 2022-06-24
JP7575395B2 true JP7575395B2 (ja) 2024-10-29

Family

ID=75620434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021554072A Active JP7575395B2 (ja) 2019-10-24 2020-07-09 複合キャパシタ

Country Status (4)

Country Link
US (1) US11869719B2 (https=)
JP (1) JP7575395B2 (https=)
CN (1) CN114600209B (https=)
WO (1) WO2021079566A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7151907B2 (ja) * 2019-09-25 2022-10-12 株式会社村田製作所 キャパシタおよびその製造方法
CN119403137B (zh) * 2024-10-17 2025-05-30 普赛微科技(杭州)有限公司 一种堆叠电容器的封装结构和制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146520A (ja) 2002-10-23 2004-05-20 Fujitsu Ltd キャパシタ
JP2006287197A (ja) 2005-03-31 2006-10-19 Hynix Semiconductor Inc ナノチューブを有するキャパシタ及びその製造方法
JP2008130778A (ja) 2006-11-20 2008-06-05 Taiyo Yuden Co Ltd コンデンサ素子及びその製造方法並びにコンデンサ
US20080135908A1 (en) 2006-12-06 2008-06-12 Samsung Electronics Co., Ltd. Semiconductor device and method of manufacturing the same
JP2009170861A (ja) 2008-01-11 2009-07-30 Young Joo Oh 金属キャパシタ及びその製造方法
JP2019057703A (ja) 2017-09-21 2019-04-11 サムソン エレクトロ−メカニックス カンパニーリミテッド. キャパシタ部品
JP2019091877A (ja) 2017-11-10 2019-06-13 サムソン エレクトロ−メカニックス カンパニーリミテッド. 積層型キャパシタ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW506083B (en) * 2001-11-28 2002-10-11 Ind Tech Res Inst Method of using nano-tube to increase semiconductor device capacitance
JP2003249417A (ja) * 2002-02-25 2003-09-05 Tdk Corp コンデンサ構造体およびその製造方法
JP4150552B2 (ja) * 2002-08-28 2008-09-17 富士通株式会社 複合キャパシタ
US20050167655A1 (en) 2004-01-29 2005-08-04 International Business Machines Corporation Vertical nanotube semiconductor device structures and methods of forming the same
JP4920335B2 (ja) * 2006-08-07 2012-04-18 新光電気工業株式会社 キャパシタ内蔵インターポーザ及びその製造方法と電子部品装置
US8085522B2 (en) 2007-06-26 2011-12-27 Headway Technologies, Inc. Capacitor and method of manufacturing the same and capacitor unit
JP2009021512A (ja) * 2007-07-13 2009-01-29 Taiyo Yuden Co Ltd 積層コンデンサ
US7626802B2 (en) * 2007-10-19 2009-12-01 Oh Young Joo Metal capacitor and manufacturing method thereof
JP5171407B2 (ja) * 2008-06-06 2013-03-27 昭和電工株式会社 回路基板およびその製造方法並びに電子装置
US9406442B2 (en) * 2012-03-22 2016-08-02 California Institute Of Technology Micro- and nanoscale capacitors that incorporate an array of conductive elements having elongated bodies
FR3012664B1 (fr) * 2013-10-29 2016-01-01 Ipdia Structure a capacite amelioree
JP6451186B2 (ja) * 2014-09-30 2019-01-16 株式会社村田製作所 コンデンサ素子
WO2016136771A1 (ja) * 2015-02-27 2016-09-01 株式会社村田製作所 可変容量素子

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004146520A (ja) 2002-10-23 2004-05-20 Fujitsu Ltd キャパシタ
JP2006287197A (ja) 2005-03-31 2006-10-19 Hynix Semiconductor Inc ナノチューブを有するキャパシタ及びその製造方法
JP2008130778A (ja) 2006-11-20 2008-06-05 Taiyo Yuden Co Ltd コンデンサ素子及びその製造方法並びにコンデンサ
US20080135908A1 (en) 2006-12-06 2008-06-12 Samsung Electronics Co., Ltd. Semiconductor device and method of manufacturing the same
JP2009170861A (ja) 2008-01-11 2009-07-30 Young Joo Oh 金属キャパシタ及びその製造方法
JP2019057703A (ja) 2017-09-21 2019-04-11 サムソン エレクトロ−メカニックス カンパニーリミテッド. キャパシタ部品
JP2019091877A (ja) 2017-11-10 2019-06-13 サムソン エレクトロ−メカニックス カンパニーリミテッド. 積層型キャパシタ

Also Published As

Publication number Publication date
CN114600209B (zh) 2024-07-23
US11869719B2 (en) 2024-01-09
CN114600209A (zh) 2022-06-07
US20220238275A1 (en) 2022-07-28
WO2021079566A1 (ja) 2021-04-29
JPWO2021079566A1 (https=) 2021-04-29

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