CN114600209B - 复合电容器 - Google Patents

复合电容器 Download PDF

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Publication number
CN114600209B
CN114600209B CN202080073908.9A CN202080073908A CN114600209B CN 114600209 B CN114600209 B CN 114600209B CN 202080073908 A CN202080073908 A CN 202080073908A CN 114600209 B CN114600209 B CN 114600209B
Authority
CN
China
Prior art keywords
capacitor
electrode layer
capacitors
supporting
columnar portions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202080073908.9A
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English (en)
Chinese (zh)
Other versions
CN114600209A (zh
Inventor
永田真己
清水康弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Publication of CN114600209A publication Critical patent/CN114600209A/zh
Application granted granted Critical
Publication of CN114600209B publication Critical patent/CN114600209B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/008Selection of materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/012Form of non-self-supporting electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/33Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/38Multiple capacitors, i.e. structural combinations of fixed capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/38Multiple capacitors, i.e. structural combinations of fixed capacitors
    • H01G4/385Single unit multiple capacitors, e.g. dual capacitor in one coil

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Ceramic Capacitors (AREA)
CN202080073908.9A 2019-10-24 2020-07-09 复合电容器 Active CN114600209B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019193614 2019-10-24
JP2019-193614 2019-10-24
PCT/JP2020/026831 WO2021079566A1 (ja) 2019-10-24 2020-07-09 複合キャパシタ

Publications (2)

Publication Number Publication Date
CN114600209A CN114600209A (zh) 2022-06-07
CN114600209B true CN114600209B (zh) 2024-07-23

Family

ID=75620434

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080073908.9A Active CN114600209B (zh) 2019-10-24 2020-07-09 复合电容器

Country Status (4)

Country Link
US (1) US11869719B2 (https=)
JP (1) JP7575395B2 (https=)
CN (1) CN114600209B (https=)
WO (1) WO2021079566A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7151907B2 (ja) * 2019-09-25 2022-10-12 株式会社村田製作所 キャパシタおよびその製造方法
CN119403137B (zh) * 2024-10-17 2025-05-30 普赛微科技(杭州)有限公司 一种堆叠电容器的封装结构和制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW506083B (en) * 2001-11-28 2002-10-11 Ind Tech Res Inst Method of using nano-tube to increase semiconductor device capacitance
JP2003249417A (ja) * 2002-02-25 2003-09-05 Tdk Corp コンデンサ構造体およびその製造方法
JP4150552B2 (ja) * 2002-08-28 2008-09-17 富士通株式会社 複合キャパシタ
JP4695817B2 (ja) * 2002-10-23 2011-06-08 富士通株式会社 キャパシタ、半導体記憶装置及び方法
US20050167655A1 (en) 2004-01-29 2005-08-04 International Business Machines Corporation Vertical nanotube semiconductor device structures and methods of forming the same
KR100677771B1 (ko) * 2005-03-31 2007-02-02 주식회사 하이닉스반도체 무촉매층으로 성장시킨 나노튜브를 갖는 캐패시터 및 그의제조 방법
JP4920335B2 (ja) * 2006-08-07 2012-04-18 新光電気工業株式会社 キャパシタ内蔵インターポーザ及びその製造方法と電子部品装置
JP2008130778A (ja) * 2006-11-20 2008-06-05 Taiyo Yuden Co Ltd コンデンサ素子及びその製造方法並びにコンデンサ
KR100874912B1 (ko) * 2006-12-06 2008-12-19 삼성전자주식회사 반도체 소자 및 그 제조방법
US8085522B2 (en) 2007-06-26 2011-12-27 Headway Technologies, Inc. Capacitor and method of manufacturing the same and capacitor unit
JP2009021512A (ja) * 2007-07-13 2009-01-29 Taiyo Yuden Co Ltd 積層コンデンサ
US7626802B2 (en) * 2007-10-19 2009-12-01 Oh Young Joo Metal capacitor and manufacturing method thereof
US8203823B2 (en) * 2008-01-11 2012-06-19 Oh Young Joo Metal capacitor and manufacturing method thereof
JP5171407B2 (ja) * 2008-06-06 2013-03-27 昭和電工株式会社 回路基板およびその製造方法並びに電子装置
US9406442B2 (en) * 2012-03-22 2016-08-02 California Institute Of Technology Micro- and nanoscale capacitors that incorporate an array of conductive elements having elongated bodies
FR3012664B1 (fr) * 2013-10-29 2016-01-01 Ipdia Structure a capacite amelioree
JP6451186B2 (ja) * 2014-09-30 2019-01-16 株式会社村田製作所 コンデンサ素子
WO2016136771A1 (ja) * 2015-02-27 2016-09-01 株式会社村田製作所 可変容量素子
KR102460748B1 (ko) * 2017-09-21 2022-10-31 삼성전기주식회사 커패시터 부품
KR102427927B1 (ko) 2017-11-10 2022-08-02 삼성전기주식회사 3단자 적층형 커패시터

Also Published As

Publication number Publication date
JP7575395B2 (ja) 2024-10-29
US11869719B2 (en) 2024-01-09
CN114600209A (zh) 2022-06-07
US20220238275A1 (en) 2022-07-28
WO2021079566A1 (ja) 2021-04-29
JPWO2021079566A1 (https=) 2021-04-29

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