JP7492821B2 - 圧電デバイス内のバイポーラ境界領域 - Google Patents
圧電デバイス内のバイポーラ境界領域 Download PDFInfo
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- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
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- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02118—Means for compensation or elimination of undesirable effects of lateral leakage between adjacent resonators
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- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
- H03H9/02031—Characteristics of piezoelectric layers, e.g. cutting angles consisting of ceramic
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- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
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- H03H2009/02173—Tuning of film bulk acoustic resonators [FBAR]
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- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H2009/02488—Vibration modes
- H03H2009/02496—Horizontal, i.e. parallel to the substrate plane
- H03H2009/02503—Breath-like, e.g. Lam? mode, wine-glass mode
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- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
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Description
本明細書は、2018年12月14日に出願された仮特許出願第62/779,605号の利益を主張するものであり、その開示は、参照によりその全体が本明細書に組み込まれる。
Claims (22)
- 圧電デバイスであって、
● 基礎構造と、
● 前記基礎構造を覆うトランスデューサであって、
● 底部電極と、
● 前記底部電極を覆う圧電層であって、圧電材料を備える、圧電層と、
● 前記圧電層を覆う頂部電極と、を備える、トランスデューサと、を備え、
● 前記圧電層が、前記トランスデューサの活性領域内の活性部分と、前記トランスデューサの境界領域内のバイポーラ境界部分と、を有し、
● 前記活性領域がユニポーラであるように、前記活性部分内の前記圧電材料が、第1の分極を有し、
● 前記バイポーラ境界部分が、第1のサブ部分と、前記第1のサブ部分を覆うまたはその下にある第2のサブ部分と、を備え、
● 前記第1のサブ部分内の前記圧電材料が、前記第1の分極を有し、前記第2のサブ部分内の前記圧電材料が、前記第1の分極と反対の第2の分極を有する、圧電デバイス。 - 前記第1のサブ部分と前記第2のサブ部分との間に第1の反転層をさらに備える、請求項1に記載の圧電デバイス。
- 前記第1の反転層が、前記境界領域内に質量負荷を提供する、請求項2に記載の圧電デバイス。
- 前記境界領域内に、および前記圧電層を覆う境界リングをさらに備え、前記境界リングが、質量負荷を提供する、請求項3に記載の圧電デバイス。
- 前記境界領域内に、および前記圧電層を覆う境界リングをさらに備え、前記境界リングが、質量負荷を提供する、請求項1に記載の圧電デバイス。
- 前記圧電材料が、金属元素および非金属元素を含む化合物から形成される、請求項1に記載の圧電デバイス。
- 前記金属元素が、III族元素である、請求項6に記載の圧電デバイス。
- 前記圧電材料が、スカンジウム、エルビウム、マグネシウム、およびハフニウムからなる群から選択される遷移金属でドープされたAlNを含む、請求項1に記載の圧電デバイス。
- 前記圧電材料は、前記境界領域が外側領域と前記活性領域との間にあるように、前記外側領域内に外側部分を有する、請求項1に記載の圧電デバイス。
- 前記圧電層の外側部分内の前記圧電材料が、前記第1の分極を有する、請求項1に記載の圧電デバイス。
- 前記基礎構造は、前記圧電デバイスがソリッドマウント共振器ベースのバルク音響波共振器であるように、基板と、前記基板を覆う複数の反射体層を備える反射器と、を備える、請求項1に記載の圧電デバイス。
- 前記基礎構造は、前記圧電デバイスが圧電薄膜共振器(FBAR)であるように、エアギャップを前記トランスデューサの下側に提供する基板を備える、請求項1に記載の圧電デバイス。
- 前記バイポーラ境界部分が、前記第1のサブ部分および前記第2のサブ部分を覆ってまたはその下に、少なくとも2つの追加のサブ部分を備え、前記少なくとも2つの追加のサブ部分が、前記第1の分極と前記第2の分極との間を交互する、請求項1に記載の圧電デバイス。
- 前記圧電層の外側部分が、前記第1の分極および前記第2の分極のうちの1つのみを有する、請求項1に記載の圧電デバイス。
- 前記第1のサブ部分の厚さと前記第2のサブ部分の厚さとの比が、0.7:1.0~1.3:1.0である、請求項1に記載の圧電デバイス。
- 圧電デバイスを形成するための方法であって、
● 基礎構造を提供することと、
● 前記基礎構造を覆って底部電極を形成することと、
● 前記底部電極を覆って、かつ外側領域、境界領域、および活性領域を通して、圧電層の下部分を形成することであって、前記活性領域が、前記境界領域の内側にあり、前記境界領域が、前記外側領域の内側にある、形成することと、
● 前記境界領域内に、前記圧電層の前記下部分を覆って反転層を形成することと、
● 前記反転層を覆って、かつ前記外側領域、前記境界領域、および前記活性領域を通して、前記圧電層の上部分を形成することであって、
● 前記反転層の下側の、および前記境界領域内の前記圧電層の前記下部分が、第1の分極を有し、
● 前記反転層を覆う、および前記境界領域内の前記圧電層の前記上部分が、前記第1の分極と反対の第2の分極を有する、前記圧電層の上部分を形成することと、
● 前記圧電層の前記上部分を覆う頂部電極を形成することと、を含み、
前記圧電層の活性部分が前記第1の分極および前記第2の分極のうち1つのみを有する、方法。 - 前記圧電層の活性部分および外側部分が、それぞれ、前記第1の分極および前記第2の分極のうちの1つのみを有する、請求項16に記載の方法。
- 前記圧電層の外側部分が、前記第1の分極および前記第2の分極のうちの1つのみを有する、請求項16に記載の方法。
- 前記基礎構造は、前記圧電デバイスがソリッドマウント共振器ベースのバルク音響波共振器であるように、基板と、前記基板を覆う複数の反射体層を備える反射器と、を備える、請求項16に記載の方法。
- 前記基礎構造は、前記圧電デバイスが圧電薄膜共振器(FBAR)であるように、エアギャップをトランスデューサの下側に提供する基板を備える、請求項16に記載の方法。
- 前記反転層が、質量負荷を前記境界領域内に提供する、請求項16に記載の方法。
- 第1のサブ部分の厚さと第2のサブ部分の厚さとの比が、0.7:1~1.3:1.0である、請求項16に記載の方法。
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US11509287B2 (en) * | 2018-12-14 | 2022-11-22 | Qorvo Us, Inc. | Bi-polar border region in piezoelectric device |
US20230223922A1 (en) * | 2022-01-11 | 2023-07-13 | Qorvo Us, Inc. | Acoustic wave resonator with low/zero-electromechanical coupling at border region |
US20230223920A1 (en) * | 2022-01-11 | 2023-07-13 | Qorvo Us, Inc. | Acoustic wave resonator using multilayer transduction materials with low/zero coupling border region |
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- 2019-12-16 CN CN201911291705.2A patent/CN111327293A/zh active Pending
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JP2020099050A (ja) | 2020-06-25 |
US20230036920A1 (en) | 2023-02-02 |
US11509287B2 (en) | 2022-11-22 |
KR20200074038A (ko) | 2020-06-24 |
US11784628B2 (en) | 2023-10-10 |
CN111327293A (zh) | 2020-06-23 |
JP2024102361A (ja) | 2024-07-30 |
JP7573776B2 (ja) | 2024-10-25 |
US20200195222A1 (en) | 2020-06-18 |
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