JP7471299B2 - 不活性ガスを使用する3dプリンティングシステムにおける光開始重合反応の酸素阻害を防止するためのシステム及び方法 - Google Patents
不活性ガスを使用する3dプリンティングシステムにおける光開始重合反応の酸素阻害を防止するためのシステム及び方法 Download PDFInfo
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Description
本出願は、2018年12月11日に提出された米国仮出願番号62/777,902に対する優先権を主張する。
本発明は、不活性ガス流を使用して反応表面から酸素をパージすることにより3Dプリンティングシステムにより使用される光開始重合反応の酸素阻害を防止するシステムに関する。
クエンチング反応: PI*+O2 ⇒ PI+O2 *
スカベンジング反応: R・+O2 * ⇒ R-O-O・
実施形態1. 周囲条件での光開始重合反応の酸素阻害を防止するシステムであって、
紫外線(UV)光源と、
UV硬化性材料の層を有する加工物を受け入れるUV硬化スペースと、
UV光源がUV硬化性材料の層に光を放射するときに、UV硬化スペース内でUV硬化性材料のUV硬化を促進するためUV硬化スペースから酸素をパージする手段と、
を備えるシステム。
UV光源からUV硬化スペースに紫外(UV)光を周期的に照射するステップであって、UV硬化スペースは、UV硬化性材料の層を有する加工物がUV硬化スペース内でUV硬化性材料のUV硬化を促進するように配置される、ステップと、
UV光源がUV硬化性材料の層に光を放射するときに、UV硬化スペースから酸素をパージするステップと、
を含む方法。
22 ガス拡散システム
28 ガス入口
30 ガスディフューザー
34 加工物
36 UV硬化性材料
44 無酸素領域
48 UV光
Claims (15)
- 3Dプリンティングシステムによって使用される周囲条件での光開始重合反応の酸素阻害を防止するシステムであって、
UV光源(26)と、
UV硬化性材料の層(36)を有する加工物(34)を受け入れるUV硬化スペース(40)と、
前記UV光源(26)が前記UV硬化性材料の層(36)に光を放射するときに、前記UV硬化スペース(40)内で前記UV硬化性材料のUV硬化を促進するため前記UV硬化スペースから酸素をパージする手段と、
を備え、
酸素をパージする前記手段が、前記UV光源(26)と前記加工物(34)のUV硬化性材料の層(36)との間のワークスペースに不活性ガスを導入するガス拡散システム(22)と、前記UV光源(26)と前記ワークスペースを分離する透明カバー(24)と、を含み、前記ガス拡散システム(22)と前記透明カバー(24)は、前記ガス拡散システム(22)の1又は2以上のガス入口(28)から流入する不活性ガスがディフューザー(30)を通って前記ワークスペースに向かって流出できるように、互いに対して配置されており、前記ディフューザー(30)が、UV透過性材料のブリッジ(42)を有する複数の微細孔(38)を有し、前記UV透過性材料のブリッジが、前記微細孔(38)へのそれぞれの入口と前記UV光源との間に位置付けられるように前記微細孔上に配置される、システム(20)。 - 前記システム全体に一定の圧力を確保するためのガス圧ホモジナイザー(32)を更に備える、請求項1に記載のシステム。
- 前記ディフューザー(30)は、前記UV光源(26)からのUV光を透過させることを可能にするUV透過性材料で作られている、請求項1に記載のシステム。
- 前記微細孔(38)は、前記ワークスペース全体にわたってガス分布及びUV光分布を最適化するように、互いに対してサイズ及び間隔が設定されている、請求項1に記載のシステム。
- 前記微細孔(38)は、ガスが前記ワークスペース全体にわたってほぼ均等に分配されるようにアレイ内で互いに対して間隔をあけて配置され、UV光が前記ワークスペース内でほぼ均等に分配されるように均等なサイズにされる、請求項4に記載のシステム。
- ガスが前記ワークスペース全体にわたってほぼ均等に分配され、UV光が前記ワークスペース内でほぼ均等に分配されるように、前記微細孔(38)がアレイ状に互いに対して間隔を置いて配置される、請求項1に記載のシステム。
- 前記不活性ガスの温度が均一な反応温度を生成するように制御される、請求項1に記載のシステム。
- 所望の均一な反応温度を維持するように前記不活性ガスが加熱される、請求項1に記載のシステム。
- 3Dプリンティングシステムによって使用される周囲条件での光開始重合反応の酸素阻害を防止する方法であって、
UV光源(26)からUV硬化スペース(40)にUV光を周期的に照射するステップであって、前記UV硬化スペースは、UV硬化性フォトポリマーの層(36)を有する加工物(34)が前記UV硬化スペース(40)内で前記UV硬化性フォトポリマーのUV硬化を促進するように配置される、ステップと、
前記UV光源(26)が前記UV硬化性フォトポリマーの層(36)に光を放射するときに、前記UV硬化スペース(40)から酸素をパージするステップと、
前記UV硬化スペースから酸素をパージするステップは、ガス拡散システム(22)を介して、前記UV光源(26)と前記加工物(34)のUV硬化性フォトポリマーの層(36)との間のワークスペースに不活性ガスを導入するステップと、
を含み、
前記不活性ガスは、前記ガス拡散システム(22)の1又は2以上のガス入口(28)と、前記UV光源(26)及び前記ワークスペースを分離する透明なディフューザー(30)の複数の微細孔(38)を通して前記ワークスペースに向けて導入され、
前記UV光源(26)からのUV光は、前記加工物(34)のUV硬化性フォトポリマーの層(36)に向かって、前記ディフューザー(30)の前記微細孔(38)上に配置されたUV透過性材料のブリッジ(42)を通過する方法。 - 前記不活性ガスは、前記微細孔(38)を介して前記ワークスペース全体にほぼ均一に分配される、請求項9に記載の方法。
- 前記UV光は、前記微細孔(38)を介して前記ワークスペース内にほぼ均一に分配される、請求項9に記載の方法。
- 前記不活性ガスの温度は、均一な反応温度を生成するように制御される、請求項9に記載の方法。
- 前記不活性ガスは、所望の均一な反応温度を維持するように加熱される、請求項9に記載の方法。
- 前記UV硬化スペース(40)から酸素のパージするステップは、前記加工物(34)上のUV硬化性フォトポリマーの層(36)の堆積中に、前記加工物(34)が配置される前記UV硬化スペース(40)にディフューザー(30)を通して不活性ガスを導入することによって開始され、不活性ガスは、前記ディフューザー(30)に隣接する領域から酸素をパージするのに十分な圧力まで導入される、請求項9に記載の方法。
- UV硬化性フォトポリマーの層(36)の硬化後に、UV硬化性材料の次の層の堆積のために前記加工物(34)を再配置し、前記ディフューザーに隣接する前記領域の不活性ガス圧を低下するステップを更に含む、請求項14に記載の方法。
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PCT/IB2019/060453 WO2020121132A1 (en) | 2018-12-11 | 2019-12-04 | Systems and methods for preventing oxygen inhibition of a light-initiated polymerization reaction in a 3d printing system using inert gas |
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US11654618B2 (en) * | 2019-04-25 | 2023-05-23 | 3D Systems, Inc. | Three dimensional printing system with partially immersed imaging bar defining build plane below a free surface of photocurable resin |
US20230202098A1 (en) | 2021-12-23 | 2023-06-29 | Reophotonics, Ltd. | Systems for printing viscous materials using laser assisted deposition |
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EP3894181B1 (en) | 2022-11-16 |
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KR20210132640A (ko) | 2021-11-04 |
US20200180225A1 (en) | 2020-06-11 |
CN113412186B (zh) | 2023-04-04 |
US20220379560A1 (en) | 2022-12-01 |
US11203154B2 (en) | 2021-12-21 |
US11673328B2 (en) | 2023-06-13 |
US11453164B2 (en) | 2022-09-27 |
US11590701B2 (en) | 2023-02-28 |
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EP3894180C0 (en) | 2023-11-01 |
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US20200180190A1 (en) | 2020-06-11 |
CN113365796B (zh) | 2023-03-21 |
US20220055302A1 (en) | 2022-02-24 |
CN113365796A (zh) | 2021-09-07 |
EP3894180B1 (en) | 2023-11-01 |
JP2022512225A (ja) | 2022-02-02 |
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