JP7430451B2 - 切削装置 - Google Patents
切削装置 Download PDFInfo
- Publication number
- JP7430451B2 JP7430451B2 JP2020066791A JP2020066791A JP7430451B2 JP 7430451 B2 JP7430451 B2 JP 7430451B2 JP 2020066791 A JP2020066791 A JP 2020066791A JP 2020066791 A JP2020066791 A JP 2020066791A JP 7430451 B2 JP7430451 B2 JP 7430451B2
- Authority
- JP
- Japan
- Prior art keywords
- camera
- axis
- axis direction
- workpiece
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003384 imaging method Methods 0.000 claims description 51
- 244000309466 calf Species 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Description
4 :基台
6 :X軸移動機構(第1送り機構、加工送り機構)
8 :X軸ガイドレール
10 :X軸移動部(第2移動部)
10a :底板部
10b :側板部
10c :天板部
10d :空間
10e :ナット
10f :開口
12 :ネジ軸
14 :X軸パルスモーター(第1モーター)
16 :テーブル
18 :枠体
18a :空間
20 :支持板
20a :上面
20b :下面
20c :マーク(ずれ量算出用マーク)
22 :プーリー
24 :回転駆動源
26 :プーリー
28 :無端ベルト
30 :クランプ
32 :第1Y軸移動機構(第2送り機構、割り出し送り機構)
34 :Y軸ガイドレール
36 :Y軸移動部(第2移動部)
36a :第1部分
36b :第2部分
38 :ネジ軸
40 :Y軸パルスモーター(第2モーター)
42 :第1Z軸移動機構
44 :Z軸ガイドレール
46 :Z軸移動部
48 :Z軸パルスモーター
50 :切削ユニット
52 :スピンドルハウジング
54 :スピンドル
56 :切削ブレード
56d :判定部
58 :上部カメラ(第1カメラ)
60 :第2Y軸移動機構(第3送り機構)
62 :Y軸ガイドレール
64 :Y軸移動部(第3移動部)
66 :ネジ軸
68 :Y軸パルスモーター(第3モーター)
70 :支持部
72 :第2Z軸移動機構
74 :Z軸ガイドレール
76 :Z軸移動部
78 :ネジ軸
80 :Z軸パルスモーター
82 :アーム
84 :下部カメラ(第2カメラ)
86 :制御ユニット
86a :移動制御部
86b :撮像制御部
86c :記憶部
86d :判定部
11 :被加工物
11a :表面
11b :裏面
11c :カーフ
13 :加工予定ライン(ストリート)
15 :デバイス
21 :テープ
23 :フレーム
31 :画像
31a :基準線
33 :画像
33a :基準線
35 :画像
35a :基準線
37 :画像
37a :基準線
ST1 :加工ステップ
ST2 :撮像ステップ
ST3 :判定ステップ
ST4 :異常時処理ステップ
ST5 :正常時処理ステップ
Claims (3)
- 可視域で透明な支持板を備え、板状の被加工物を該支持板で支持するテーブルと、
環状のブレードが装着されるスピンドルを備え、該テーブルに支持された該被加工物を切削する切削ユニットと、
該テーブルを支持する第1移動部と、該第1移動部をX軸方向に移動させる第1モーターと、を備える第1送り機構と、
該切削ユニットを支持する第2移動部と、該第2移動部をY軸方向に移動させる第2モーターと、を備える第2送り機構と、
該支持板の該被加工物を支持する第1面側に配置される第1カメラと、
該支持板の該第1面とは反対の第2面側に配置される第2カメラと、
該第1カメラの基準の位置での撮像領域と該第2カメラの基準の位置での撮像領域との該X軸方向及び該Y軸方向の位置のずれ量を記憶する記憶部と、を含み、
該テーブルには、該ずれ量の算出に使用されるずれ量算出用マークが設けられ、
該記憶部には、該ずれ量算出用マークを含む領域を該第1カメラで撮像して得られる画像と、該ずれ量算出用マークを含む領域を該第2カメラで撮像して得られる画像と、に基づいて算出される該ずれ量が記憶され、
該記憶部に記録された該ずれ量に基づき該第1カメラ又は該第2カメラと該テーブルとの位置の関係を調整することで、該第1カメラ及び該第2カメラの一方で撮像した領域を該第1カメラ及び該第2カメラの他方で撮像できる切削装置。 - 第3移動部と、該第3移動部をY軸方向に移動させる第3モーターと、を備える第3送り機構と、を更に含み、
該第1カメラは、該第2移動部に支持されており、
該第2カメラは、該第3移動部に支持されている請求項1に記載の切削装置。 - 該第1カメラと該第2カメラとは、該第2移動部に支持されている請求項1に記載の切削装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020066791A JP7430451B2 (ja) | 2020-04-02 | 2020-04-02 | 切削装置 |
TW110109377A TW202138114A (zh) | 2020-04-02 | 2021-03-16 | 切削裝置 |
CN202110312752.1A CN113492465A (zh) | 2020-04-02 | 2021-03-24 | 切削装置 |
KR1020210037840A KR20210123211A (ko) | 2020-04-02 | 2021-03-24 | 절삭 장치 |
US17/215,118 US11699606B2 (en) | 2020-04-02 | 2021-03-29 | Cutting apparatus |
DE102021203272.9A DE102021203272A1 (de) | 2020-04-02 | 2021-03-31 | Schneidvorrichtung |
SG10202103310WA SG10202103310WA (en) | 2020-04-02 | 2021-03-31 | Cutting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020066791A JP7430451B2 (ja) | 2020-04-02 | 2020-04-02 | 切削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021160056A JP2021160056A (ja) | 2021-10-11 |
JP7430451B2 true JP7430451B2 (ja) | 2024-02-13 |
Family
ID=77749857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020066791A Active JP7430451B2 (ja) | 2020-04-02 | 2020-04-02 | 切削装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11699606B2 (ja) |
JP (1) | JP7430451B2 (ja) |
KR (1) | KR20210123211A (ja) |
CN (1) | CN113492465A (ja) |
DE (1) | DE102021203272A1 (ja) |
SG (1) | SG10202103310WA (ja) |
TW (1) | TW202138114A (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010082644A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2012256749A (ja) | 2011-06-09 | 2012-12-27 | Disco Abrasive Syst Ltd | 切削装置 |
US20190259645A1 (en) | 2016-02-15 | 2019-08-22 | Eo Technics Co., Ltd. | Marking position correcting apparatus and method |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5321352A (en) * | 1991-08-01 | 1994-06-14 | Tokyo Electron Yamanashi Limited | Probe apparatus and method of alignment for the same |
JP5274966B2 (ja) | 2008-09-30 | 2013-08-28 | 株式会社ディスコ | 加工装置 |
JP6393583B2 (ja) * | 2014-10-30 | 2018-09-19 | 株式会社ディスコ | 保護膜検出装置及び保護膜検出方法 |
WO2018127973A1 (ja) * | 2017-01-06 | 2018-07-12 | 株式会社Fuji | ミラーダイ画像認識システム |
JP2018120913A (ja) * | 2017-01-24 | 2018-08-02 | 株式会社ディスコ | レーザー加工装置 |
JP6979296B2 (ja) * | 2017-07-28 | 2021-12-08 | 株式会社ディスコ | 切削方法 |
US10957566B2 (en) * | 2018-04-12 | 2021-03-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer-level inspection using on-valve inspection detectors |
US10703016B2 (en) * | 2018-06-20 | 2020-07-07 | Texas Instruments Incorporated | Semiconductor sawing method and system |
JP7313805B2 (ja) * | 2018-08-15 | 2023-07-25 | 株式会社ディスコ | 切削装置 |
JP7325897B2 (ja) * | 2019-04-18 | 2023-08-15 | 株式会社ディスコ | 加工装置及び被加工物の加工方法 |
CN114556537A (zh) * | 2019-10-10 | 2022-05-27 | 东京毅力科创株式会社 | 接合系统和重合基板的检查方法 |
TWI751613B (zh) * | 2020-07-17 | 2022-01-01 | 倍利科技股份有限公司 | 半導體元件的檢測方法及其裝置 |
JP2022107953A (ja) * | 2021-01-12 | 2022-07-25 | 株式会社ディスコ | レーザー加工装置 |
JP2023006794A (ja) * | 2021-06-30 | 2023-01-18 | 株式会社ディスコ | 製造方法 |
-
2020
- 2020-04-02 JP JP2020066791A patent/JP7430451B2/ja active Active
-
2021
- 2021-03-16 TW TW110109377A patent/TW202138114A/zh unknown
- 2021-03-24 KR KR1020210037840A patent/KR20210123211A/ko active Search and Examination
- 2021-03-24 CN CN202110312752.1A patent/CN113492465A/zh active Pending
- 2021-03-29 US US17/215,118 patent/US11699606B2/en active Active
- 2021-03-31 DE DE102021203272.9A patent/DE102021203272A1/de active Pending
- 2021-03-31 SG SG10202103310WA patent/SG10202103310WA/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010082644A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2012256749A (ja) | 2011-06-09 | 2012-12-27 | Disco Abrasive Syst Ltd | 切削装置 |
US20190259645A1 (en) | 2016-02-15 | 2019-08-22 | Eo Technics Co., Ltd. | Marking position correcting apparatus and method |
Also Published As
Publication number | Publication date |
---|---|
US20210313208A1 (en) | 2021-10-07 |
CN113492465A (zh) | 2021-10-12 |
JP2021160056A (ja) | 2021-10-11 |
SG10202103310WA (en) | 2021-11-29 |
US11699606B2 (en) | 2023-07-11 |
TW202138114A (zh) | 2021-10-16 |
KR20210123211A (ko) | 2021-10-13 |
DE102021203272A1 (de) | 2021-10-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US12051613B2 (en) | Method of using a processing apparatus | |
JP2018078145A (ja) | 切削装置 | |
JP2009012127A (ja) | 切削装置 | |
JP2016153154A (ja) | ウェーハの位置合わせ方法 | |
JP2024096180A (ja) | 加工装置 | |
US20230410370A1 (en) | Positioning method | |
KR20220001450A (ko) | 가공 장치 | |
JP7430451B2 (ja) | 切削装置 | |
JP7520456B2 (ja) | 切削ブレード刃先位置検出方法 | |
TW202143313A (zh) | 切削裝置 | |
JP7362334B2 (ja) | 加工方法 | |
TWI849189B (zh) | 加工方法 | |
JP7465670B2 (ja) | 保持テーブル機構及び加工装置 | |
JP5538015B2 (ja) | 加工装置における加工移動量補正値の決定方法 | |
JP2022083252A (ja) | 加工装置及び加工方法 | |
JP2022016821A (ja) | 傾き測定方法及び切削方法 | |
JP2024122146A (ja) | 加工方法 | |
TW202131400A (zh) | 切削刀的位置檢測方法 | |
TW202407780A (zh) | 加工裝置 | |
CN113199651A (zh) | 加工方法和加工装置 | |
JP2022059155A (ja) | 切削装置 | |
JP2024053653A (ja) | 切削装置 | |
JP2023051422A (ja) | 切削装置 | |
KR20240133595A (ko) | 피가공물의 가공 방법 | |
CN117862971A (zh) | 修整板和形状判定方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231212 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20231213 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231228 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240130 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240130 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7430451 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |