JP7427461B2 - 露光装置、及び物品の製造方法 - Google Patents

露光装置、及び物品の製造方法 Download PDF

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Publication number
JP7427461B2
JP7427461B2 JP2020018861A JP2020018861A JP7427461B2 JP 7427461 B2 JP7427461 B2 JP 7427461B2 JP 2020018861 A JP2020018861 A JP 2020018861A JP 2020018861 A JP2020018861 A JP 2020018861A JP 7427461 B2 JP7427461 B2 JP 7427461B2
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Japan
Prior art keywords
exposure
lens barrel
traveling direction
exposure apparatus
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2020018861A
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English (en)
Japanese (ja)
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JP2021124634A (ja
JP2021124634A5 (enExample
Inventor
良一 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020018861A priority Critical patent/JP7427461B2/ja
Priority to TW113113085A priority patent/TWI874179B/zh
Priority to TW109146782A priority patent/TWI840643B/zh
Priority to KR1020210000641A priority patent/KR102818067B1/ko
Priority to CN202110140250.5A priority patent/CN113238459B/zh
Publication of JP2021124634A publication Critical patent/JP2021124634A/ja
Publication of JP2021124634A5 publication Critical patent/JP2021124634A5/ja
Application granted granted Critical
Publication of JP7427461B2 publication Critical patent/JP7427461B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
JP2020018861A 2020-02-06 2020-02-06 露光装置、及び物品の製造方法 Active JP7427461B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2020018861A JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法
TW113113085A TWI874179B (zh) 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法
TW109146782A TWI840643B (zh) 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法
KR1020210000641A KR102818067B1 (ko) 2020-02-06 2021-01-05 광학장치, 노광장치, 및 물품의 제조방법
CN202110140250.5A CN113238459B (zh) 2020-02-06 2021-02-02 光学装置、曝光装置以及物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020018861A JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2021124634A JP2021124634A (ja) 2021-08-30
JP2021124634A5 JP2021124634A5 (enExample) 2023-02-02
JP7427461B2 true JP7427461B2 (ja) 2024-02-05

Family

ID=77130109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020018861A Active JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法

Country Status (4)

Country Link
JP (1) JP7427461B2 (enExample)
KR (1) KR102818067B1 (enExample)
CN (1) CN113238459B (enExample)
TW (2) TWI840643B (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292761A (ja) 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP2015079074A (ja) 2013-10-16 2015-04-23 キヤノン株式会社 露光装置
JP2016095412A (ja) 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092735A (ja) * 1996-09-13 1998-04-10 Nikon Corp 露光装置
KR20010031972A (ko) * 1997-11-12 2001-04-16 오노 시게오 노광 장치, 디바이스 제조 장치 및 노광 장치의 제조 방법
WO2003030229A1 (en) * 2001-09-27 2003-04-10 Nikon Corporation Aligner and method for fabricating device
JP2003124092A (ja) * 2001-10-09 2003-04-25 Canon Inc 露光装置及びその制御方法、デバイス製造方法
TWI503865B (zh) * 2003-05-23 2015-10-11 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
JP5517847B2 (ja) * 2010-09-08 2014-06-11 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP7016661B2 (ja) * 2017-10-06 2022-02-07 キヤノン株式会社 露光装置および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292761A (ja) 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP2015079074A (ja) 2013-10-16 2015-04-23 キヤノン株式会社 露光装置
JP2016095412A (ja) 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Also Published As

Publication number Publication date
TWI874179B (zh) 2025-02-21
JP2021124634A (ja) 2021-08-30
TW202131107A (zh) 2021-08-16
TWI840643B (zh) 2024-05-01
TW202429220A (zh) 2024-07-16
KR102818067B1 (ko) 2025-06-11
CN113238459A (zh) 2021-08-10
CN113238459B (zh) 2024-09-13
KR20210100528A (ko) 2021-08-17

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