TWI840643B - 光學裝置、曝光裝置、及物品之製造方法 - Google Patents

光學裝置、曝光裝置、及物品之製造方法 Download PDF

Info

Publication number
TWI840643B
TWI840643B TW109146782A TW109146782A TWI840643B TW I840643 B TWI840643 B TW I840643B TW 109146782 A TW109146782 A TW 109146782A TW 109146782 A TW109146782 A TW 109146782A TW I840643 B TWI840643 B TW I840643B
Authority
TW
Taiwan
Prior art keywords
exposure
travel direction
exposure device
barrel
gas
Prior art date
Application number
TW109146782A
Other languages
English (en)
Chinese (zh)
Other versions
TW202131107A (zh
Inventor
木村良一
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202131107A publication Critical patent/TW202131107A/zh
Application granted granted Critical
Publication of TWI840643B publication Critical patent/TWI840643B/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
TW109146782A 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法 TWI840643B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-018861 2020-02-06
JP2020018861A JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
TW202131107A TW202131107A (zh) 2021-08-16
TWI840643B true TWI840643B (zh) 2024-05-01

Family

ID=77130109

Family Applications (2)

Application Number Title Priority Date Filing Date
TW109146782A TWI840643B (zh) 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法
TW113113085A TWI874179B (zh) 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW113113085A TWI874179B (zh) 2020-02-06 2020-12-30 光學裝置、曝光裝置、及物品之製造方法

Country Status (4)

Country Link
JP (1) JP7427461B2 (enExample)
KR (1) KR102818067B1 (enExample)
CN (1) CN113238459B (enExample)
TW (2) TWI840643B (enExample)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200609687A (en) * 2004-05-25 2006-03-16 Asml Netherlands Bv Lithographic apparatus having a gas flushing device
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法
TW201806001A (zh) * 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
TW201822249A (zh) * 2016-11-30 2018-06-16 日商佳能股份有限公司 曝光裝置及物品之製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092735A (ja) * 1996-09-13 1998-04-10 Nikon Corp 露光装置
KR20010031972A (ko) * 1997-11-12 2001-04-16 오노 시게오 노광 장치, 디바이스 제조 장치 및 노광 장치의 제조 방법
WO2003030229A1 (en) * 2001-09-27 2003-04-10 Nikon Corporation Aligner and method for fabricating device
JP2003124092A (ja) * 2001-10-09 2003-04-25 Canon Inc 露光装置及びその制御方法、デバイス製造方法
JP2008292761A (ja) * 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP5517847B2 (ja) * 2010-09-08 2014-06-11 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
JP2015079074A (ja) * 2013-10-16 2015-04-23 キヤノン株式会社 露光装置
JP7016661B2 (ja) * 2017-10-06 2022-02-07 キヤノン株式会社 露光装置および物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201806001A (zh) * 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
TW200609687A (en) * 2004-05-25 2006-03-16 Asml Netherlands Bv Lithographic apparatus having a gas flushing device
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法
TW201822249A (zh) * 2016-11-30 2018-06-16 日商佳能股份有限公司 曝光裝置及物品之製造方法

Also Published As

Publication number Publication date
KR102818067B1 (ko) 2025-06-11
CN113238459B (zh) 2024-09-13
KR20210100528A (ko) 2021-08-17
TW202131107A (zh) 2021-08-16
TW202429220A (zh) 2024-07-16
TWI874179B (zh) 2025-02-21
JP7427461B2 (ja) 2024-02-05
CN113238459A (zh) 2021-08-10
JP2021124634A (ja) 2021-08-30

Similar Documents

Publication Publication Date Title
JP5071385B2 (ja) 可変スリット装置、照明装置、露光装置、露光方法及びデバイス製造方法
KR102169893B1 (ko) 노광 장치 및 물품의 제조 방법
KR102234255B1 (ko) 노광 장치 및 물품의 제조 방법
CN101379593A (zh) 曝光装置、元件制造方法以及曝光方法
TWI710792B (zh) 投影光學系統、曝光裝置及物品之製造方法
JPH09127702A (ja) 大サイズ基板用露光装置および露光方法
JP2007052214A (ja) 走査型露光装置及びマイクロデバイスの製造方法
JPH10142555A (ja) 投影露光装置
KR100558195B1 (ko) 광도 보정 방법과 노광 방법 및 이를 수행하기 위한 광도보정 장치와 노광 장치
TWI840643B (zh) 光學裝置、曝光裝置、及物品之製造方法
TW201344378A (zh) 光學系統、曝光裝置、及元件製造方法
JP6238580B2 (ja) 露光装置、露光方法、それらを用いたデバイスの製造方法
TWI722386B (zh) 決定方法、曝光方法、曝光裝置、物品的製造方法及記憶媒體
KR20130032893A (ko) 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법
CN116482946A (zh) 曝光方法、曝光装置以及物品的制造方法
TW201400994A (zh) 微影裝置及器件製造方法
JP2021124634A5 (enExample)
JP2025072046A (ja) 露光装置、物品の製造方法、及び露光方法
TW200912558A (en) Method for manufacturing projection optics
JP2025025620A (ja) 露光装置及び物品の製造方法
JP2007132981A (ja) 対物光学系、収差測定装置、および露光装置
CN120029010A (zh) 曝光装置、物品的制造方法以及曝光方法
JPWO2006101086A1 (ja) 露光装置、露光方法及びマイクロデバイスの製造方法
JPH0616477B2 (ja) 投影光学装置
CN117950275A (zh) 曝光方法、曝光装置以及用于制造物品的方法