JP7418098B2 - 光学多層膜の成膜方法および光学素子の製造方法 - Google Patents

光学多層膜の成膜方法および光学素子の製造方法 Download PDF

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JP7418098B2
JP7418098B2 JP2019085961A JP2019085961A JP7418098B2 JP 7418098 B2 JP7418098 B2 JP 7418098B2 JP 2019085961 A JP2019085961 A JP 2019085961A JP 2019085961 A JP2019085961 A JP 2019085961A JP 7418098 B2 JP7418098 B2 JP 7418098B2
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oxide
optical element
samarium
containing layer
film
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JP2020180360A (ja
JP2020180360A5 (https=
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英生 秋葉
恭兵 石川
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Canon Inc
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Canon Inc
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Priority to JP2019085961A priority Critical patent/JP7418098B2/ja
Priority to EP20168175.6A priority patent/EP3757626B1/en
Priority to US16/854,619 priority patent/US11971520B2/en
Priority to CN202010330201.3A priority patent/CN111926293A/zh
Publication of JP2020180360A publication Critical patent/JP2020180360A/ja
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Priority to US18/186,033 priority patent/US12523797B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)
JP2019085961A 2019-04-26 2019-04-26 光学多層膜の成膜方法および光学素子の製造方法 Active JP7418098B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019085961A JP7418098B2 (ja) 2019-04-26 2019-04-26 光学多層膜の成膜方法および光学素子の製造方法
EP20168175.6A EP3757626B1 (en) 2019-04-26 2020-04-06 Optical device and manufacturing method therefor
US16/854,619 US11971520B2 (en) 2019-04-26 2020-04-21 Optical device and manufacturing method therefor
CN202010330201.3A CN111926293A (zh) 2019-04-26 2020-04-24 光学器件及其制造方法
US18/186,033 US12523797B2 (en) 2019-04-26 2023-03-17 Optical device and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019085961A JP7418098B2 (ja) 2019-04-26 2019-04-26 光学多層膜の成膜方法および光学素子の製造方法

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JP2020180360A JP2020180360A (ja) 2020-11-05
JP2020180360A5 JP2020180360A5 (https=) 2022-04-26
JP7418098B2 true JP7418098B2 (ja) 2024-01-19

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US (2) US11971520B2 (https=)
EP (1) EP3757626B1 (https=)
JP (1) JP7418098B2 (https=)
CN (1) CN111926293A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7418098B2 (ja) * 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法
CN113064225B (zh) * 2021-03-24 2023-07-14 浙江舜宇光学有限公司 含氟化镁膜层的减反膜系及其制备方法
US12422593B2 (en) 2022-02-17 2025-09-23 Guardian Glass, LLC Heat treatable coated article having antireflective coating(s) on substrate
CN117488262A (zh) * 2023-11-07 2024-02-02 浙江日久新材料科技有限公司 Ar膜、元件及设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171609A (ja) 1998-12-09 2000-06-23 Oputoron:Kk 中間屈折率の光学薄膜用蒸着材料および該蒸着材料を用いた光学薄膜
JP2019007041A (ja) 2017-06-22 2019-01-17 キヤノン株式会社 フッ化膜を有する光学素子の製造方法およびフッ化膜の製造方法
WO2019058825A1 (ja) 2017-09-21 2019-03-28 富士フイルム株式会社 反射防止膜、光学素子および光学系

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL283979A (https=) 1961-10-04
DE3332872A1 (de) 1983-09-12 1985-04-04 Optische Werke G. Rodenstock, 8000 München Reflexionsvermindernder belag fuer ein optisches element aus organischem material
US4902109A (en) * 1986-05-02 1990-02-20 Canon Kabushiki Kaisha Electrochromic device
US5241411A (en) * 1987-07-02 1993-08-31 Saint-Gobain Vitrage Electrochromic variable transmission glazing
JPH06337303A (ja) 1993-05-31 1994-12-06 Toray Ind Inc 反射防止性プラスチック光学部品
US5510173A (en) * 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
JP3689524B2 (ja) 1996-03-22 2005-08-31 キヤノン株式会社 酸化アルミニウム膜及びその形成方法
JPH09291358A (ja) 1996-04-24 1997-11-11 Olympus Optical Co Ltd 光学薄膜の製造方法および光学薄膜
JP3825936B2 (ja) 1999-04-09 2006-09-27 キヤノン株式会社 光学薄膜の製造方法及びその薄膜形成装置
US6761959B1 (en) * 1999-07-08 2004-07-13 Flex Products, Inc. Diffractive surfaces with color shifting backgrounds
US6368470B1 (en) * 1999-12-29 2002-04-09 Southwall Technologies, Inc. Hydrogenating a layer of an antireflection coating
JP2002071946A (ja) * 2000-08-30 2002-03-12 Nippon Sheet Glass Co Ltd 偏光フィルタおよびそれを用いた光学装置
EP1357405A4 (en) * 2001-01-31 2007-08-22 Zeon Corp LIGHTING PLATE AND LIGHTING UNIT
DE10307095A1 (de) * 2003-02-19 2004-09-02 Merck Patent Gmbh Aufdampfmaterial zur Herstellung hochbrechender optischer Schichten
JP2005054220A (ja) * 2003-08-01 2005-03-03 Canon Inc フッ化物薄膜の形成方法及びその形成装置
JP2007156362A (ja) 2005-12-08 2007-06-21 Canon Inc 反射防止膜、成膜方法及び装置、露光装置、並びに、デバイス製造方法
DE102013208310B4 (de) * 2013-05-06 2019-07-04 Carl Zeiss Vision International Gmbh Optisches Element mit Substratkörper und Hartlackschicht sowie Herstellungsverfahren hierfür
JP6366263B2 (ja) 2013-12-13 2018-08-01 キヤノン株式会社 光学多層膜、光学レンズ及び光学多層膜の製造方法
US9586385B2 (en) * 2014-08-27 2017-03-07 3M Innovative Properties Company Inorganic multilayer lamination transfer films
US10446706B2 (en) * 2015-05-15 2019-10-15 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Hexagonal phase epitaxial cadmium sulfide on copper indium gallium selenide for a photovoltaic junction
CN105970171B (zh) 2016-06-08 2019-07-26 扬州君禾薄膜科技有限公司 一种采用磁控溅射制备柔性稀土氧化物薄膜的方法
JP6887230B2 (ja) 2016-08-22 2021-06-16 株式会社アルバック 成膜方法
US20180219113A1 (en) * 2017-01-30 2018-08-02 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Cigs based photovoltaic cell with non-stoichiometric metal sulfide layer and method and apparatus for making thereof
JP6995491B2 (ja) * 2017-04-21 2022-01-14 キヤノン株式会社 光学薄膜、光学素子、光学素子の製造方法
CN215340409U (zh) * 2017-05-08 2021-12-28 康宁股份有限公司 包含光学涂层的制品
JP7418098B2 (ja) * 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171609A (ja) 1998-12-09 2000-06-23 Oputoron:Kk 中間屈折率の光学薄膜用蒸着材料および該蒸着材料を用いた光学薄膜
JP2019007041A (ja) 2017-06-22 2019-01-17 キヤノン株式会社 フッ化膜を有する光学素子の製造方法およびフッ化膜の製造方法
WO2019058825A1 (ja) 2017-09-21 2019-03-28 富士フイルム株式会社 反射防止膜、光学素子および光学系

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Publication number Publication date
US11971520B2 (en) 2024-04-30
JP2020180360A (ja) 2020-11-05
US20200341170A1 (en) 2020-10-29
CN111926293A (zh) 2020-11-13
EP3757626B1 (en) 2022-06-01
US20230228914A1 (en) 2023-07-20
US12523797B2 (en) 2026-01-13
EP3757626A1 (en) 2020-12-30

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