CN111926293A - 光学器件及其制造方法 - Google Patents

光学器件及其制造方法 Download PDF

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Publication number
CN111926293A
CN111926293A CN202010330201.3A CN202010330201A CN111926293A CN 111926293 A CN111926293 A CN 111926293A CN 202010330201 A CN202010330201 A CN 202010330201A CN 111926293 A CN111926293 A CN 111926293A
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CN
China
Prior art keywords
layer
oxide
optical device
metal oxide
samarium
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Pending
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CN202010330201.3A
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English (en)
Chinese (zh)
Inventor
秋叶英生
石川恭兵
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Canon Inc
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Canon Inc
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Publication of CN111926293A publication Critical patent/CN111926293A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)
CN202010330201.3A 2019-04-26 2020-04-24 光学器件及其制造方法 Pending CN111926293A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019085961A JP7418098B2 (ja) 2019-04-26 2019-04-26 光学多層膜の成膜方法および光学素子の製造方法
JP2019-085961 2019-04-26

Publications (1)

Publication Number Publication Date
CN111926293A true CN111926293A (zh) 2020-11-13

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CN202010330201.3A Pending CN111926293A (zh) 2019-04-26 2020-04-24 光学器件及其制造方法

Country Status (4)

Country Link
US (2) US11971520B2 (https=)
EP (1) EP3757626B1 (https=)
JP (1) JP7418098B2 (https=)
CN (1) CN111926293A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113064225A (zh) * 2021-03-24 2021-07-02 浙江舜宇光学有限公司 含氟化镁膜层的减反膜系及其制备方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7418098B2 (ja) * 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法
US12422593B2 (en) 2022-02-17 2025-09-23 Guardian Glass, LLC Heat treatable coated article having antireflective coating(s) on substrate
CN117488262A (zh) * 2023-11-07 2024-02-02 浙江日久新材料科技有限公司 Ar膜、元件及设备

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB968253A (en) * 1961-10-04 1964-09-02 Nat Lead Co Monocrystalline metal oxide materials
US4927239A (en) * 1983-09-12 1990-05-22 Optische Werke G. Rodenstock Anti-reflection film for an optical element consisting of an organic material
JPH06337303A (ja) * 1993-05-31 1994-12-06 Toray Ind Inc 反射防止性プラスチック光学部品
JP2000297366A (ja) * 1999-04-09 2000-10-24 Canon Inc 光学薄膜の製造方法及び光学部材
CN1360544A (zh) * 1999-07-08 2002-07-24 福来克斯产品公司 具有色移背景的衍射表面
CN104142525A (zh) * 2013-05-06 2014-11-12 卡尔蔡司光学国际有限公司 具有高扩散性的涂层的光学元件
CN105970171A (zh) * 2016-06-08 2016-09-28 苏州佳新新材料科技有限公司 一种采用磁控溅射制备柔性稀土氧化物薄膜的方法
US20160313473A1 (en) * 2013-12-13 2016-10-27 Canon Kabushiki Kaisha Optical multilayer coating, optical lens, and method of manufacturing optical multilayer coating
CN108732659A (zh) * 2017-04-21 2018-11-02 佳能株式会社 光学薄膜和光学元件的制造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902109A (en) * 1986-05-02 1990-02-20 Canon Kabushiki Kaisha Electrochromic device
US5241411A (en) * 1987-07-02 1993-08-31 Saint-Gobain Vitrage Electrochromic variable transmission glazing
US5510173A (en) * 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
JP3689524B2 (ja) 1996-03-22 2005-08-31 キヤノン株式会社 酸化アルミニウム膜及びその形成方法
JPH09291358A (ja) 1996-04-24 1997-11-11 Olympus Optical Co Ltd 光学薄膜の製造方法および光学薄膜
JP3472169B2 (ja) * 1998-12-09 2003-12-02 株式会社オプトロン 中間屈折率の光学薄膜用蒸着材料および該蒸着材料を用いた光学薄膜
US6368470B1 (en) * 1999-12-29 2002-04-09 Southwall Technologies, Inc. Hydrogenating a layer of an antireflection coating
JP2002071946A (ja) * 2000-08-30 2002-03-12 Nippon Sheet Glass Co Ltd 偏光フィルタおよびそれを用いた光学装置
EP1357405A4 (en) * 2001-01-31 2007-08-22 Zeon Corp LIGHTING PLATE AND LIGHTING UNIT
DE10307095A1 (de) * 2003-02-19 2004-09-02 Merck Patent Gmbh Aufdampfmaterial zur Herstellung hochbrechender optischer Schichten
JP2005054220A (ja) * 2003-08-01 2005-03-03 Canon Inc フッ化物薄膜の形成方法及びその形成装置
JP2007156362A (ja) 2005-12-08 2007-06-21 Canon Inc 反射防止膜、成膜方法及び装置、露光装置、並びに、デバイス製造方法
US9586385B2 (en) * 2014-08-27 2017-03-07 3M Innovative Properties Company Inorganic multilayer lamination transfer films
US10446706B2 (en) * 2015-05-15 2019-10-15 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Hexagonal phase epitaxial cadmium sulfide on copper indium gallium selenide for a photovoltaic junction
JP6887230B2 (ja) 2016-08-22 2021-06-16 株式会社アルバック 成膜方法
US20180219113A1 (en) * 2017-01-30 2018-08-02 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Cigs based photovoltaic cell with non-stoichiometric metal sulfide layer and method and apparatus for making thereof
CN215340409U (zh) * 2017-05-08 2021-12-28 康宁股份有限公司 包含光学涂层的制品
JP6953197B2 (ja) * 2017-06-22 2021-10-27 キヤノン株式会社 フッ化膜を有する光学素子の製造方法およびフッ化膜の製造方法
CN111095037B (zh) * 2017-09-21 2021-07-30 富士胶片株式会社 防反射膜、光学元件及光学系统
JP7418098B2 (ja) * 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB968253A (en) * 1961-10-04 1964-09-02 Nat Lead Co Monocrystalline metal oxide materials
US4927239A (en) * 1983-09-12 1990-05-22 Optische Werke G. Rodenstock Anti-reflection film for an optical element consisting of an organic material
JPH06337303A (ja) * 1993-05-31 1994-12-06 Toray Ind Inc 反射防止性プラスチック光学部品
JP2000297366A (ja) * 1999-04-09 2000-10-24 Canon Inc 光学薄膜の製造方法及び光学部材
CN1360544A (zh) * 1999-07-08 2002-07-24 福来克斯产品公司 具有色移背景的衍射表面
CN104142525A (zh) * 2013-05-06 2014-11-12 卡尔蔡司光学国际有限公司 具有高扩散性的涂层的光学元件
US20160313473A1 (en) * 2013-12-13 2016-10-27 Canon Kabushiki Kaisha Optical multilayer coating, optical lens, and method of manufacturing optical multilayer coating
CN105970171A (zh) * 2016-06-08 2016-09-28 苏州佳新新材料科技有限公司 一种采用磁控溅射制备柔性稀土氧化物薄膜的方法
CN108732659A (zh) * 2017-04-21 2018-11-02 佳能株式会社 光学薄膜和光学元件的制造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113064225A (zh) * 2021-03-24 2021-07-02 浙江舜宇光学有限公司 含氟化镁膜层的减反膜系及其制备方法

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Publication number Publication date
US11971520B2 (en) 2024-04-30
JP2020180360A (ja) 2020-11-05
US20200341170A1 (en) 2020-10-29
JP7418098B2 (ja) 2024-01-19
EP3757626B1 (en) 2022-06-01
US20230228914A1 (en) 2023-07-20
US12523797B2 (en) 2026-01-13
EP3757626A1 (en) 2020-12-30

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