JP7417611B2 - 傾斜回折格子のローリングｋベクトルの調整 - Google Patents

傾斜回折格子のローリングｋベクトルの調整 Download PDF

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Publication number
JP7417611B2
JP7417611B2 JP2021533784A JP2021533784A JP7417611B2 JP 7417611 B2 JP7417611 B2 JP 7417611B2 JP 2021533784 A JP2021533784 A JP 2021533784A JP 2021533784 A JP2021533784 A JP 2021533784A JP 7417611 B2 JP7417611 B2 JP 7417611B2
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ion beam
electrodes
electrode
angle
housing
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Japanese (ja)
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JP2022514238A (ja
Inventor
ジョセフ シー． オルソン，
モーガン エヴァンズ，
ティマーマン タイセン， ラトガー マイヤー
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12107—Grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
    • H01J2237/1507—Tilting or rocking beam around an axis substantially at an angle to optical axis dynamically, e.g. to obtain same impinging angle on whole area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Drying Of Semiconductors (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Mechanical Engineering (AREA)
JP2021533784A 2018-12-17 2019-12-05 傾斜回折格子のローリングｋベクトルの調整 Active JP7417611B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862780815P 2018-12-17 2018-12-17
US62/780,815 2018-12-17
PCT/US2019/064601 WO2020131398A1 (en) 2018-12-17 2019-12-05 Modulation of rolling k vectors of angled gratings

Publications (2)

Publication Number Publication Date
JP2022514238A JP2022514238A (ja) 2022-02-10
JP7417611B2 true JP7417611B2 (ja) 2024-01-18

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JP2021533784A Active JP7417611B2 (ja) 2018-12-17 2019-12-05 傾斜回折格子のローリングｋベクトルの調整
JP2021533308A Active JP7494179B2 (ja) 2018-12-17 2019-12-05 傾斜回折格子のローリングｋベクトルの調整
JP2024083599A Pending JP2024122990A (ja) 2018-12-17 2024-05-22 傾斜回折格子のローリングｋベクトルの調整

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JP2021533308A Active JP7494179B2 (ja) 2018-12-17 2019-12-05 傾斜回折格子のローリングｋベクトルの調整
JP2024083599A Pending JP2024122990A (ja) 2018-12-17 2024-05-22 傾斜回折格子のローリングｋベクトルの調整

Country Status (7)

Country Link
US (4) US11456152B2 (enExample)
EP (2) EP3899607A4 (enExample)
JP (3) JP7417611B2 (enExample)
KR (3) KR102849594B1 (enExample)
CN (2) CN113195151B (enExample)
TW (3) TWI846780B (enExample)
WO (2) WO2020131398A1 (enExample)

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US10302826B1 (en) 2018-05-30 2019-05-28 Applied Materials, Inc. Controlling etch angles by substrate rotation in angled etch tools
EP3899607A4 (en) 2018-12-17 2023-03-01 Applied Materials, Inc. MODULATION OF ROLLING K-VECTORS OF ANGULAR GRIDS
US11487058B2 (en) 2020-08-13 2022-11-01 Applied Materials, Inc. Method for manufacturing optical device structures
CN112394436B (zh) * 2020-11-25 2021-07-06 中国科学院上海光学精密机械研究所 1064纳米波段的非对称结构全介质反射式合束光栅
EP4416540A4 (en) * 2021-10-15 2025-08-13 Applied Materials Inc MULTILAYER TRANSMISSION STRUCTURES FOR WAVEGUIDE DISPLAY DEVICE
US12674927B2 (en) 2022-04-20 2026-07-07 Applied Materials, Inc. Method for roughness reduction in manufacturing optical device structures
US12687776B2 (en) 2023-04-24 2026-07-21 Tel Manufacturing And Engineering Of America, Inc. Optical elements patterning
TW202544502A (zh) 2024-02-16 2025-11-16 美商應用材料股份有限公司 用於獨立控制虛擬影像與世界漏角度的稜鏡

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Publication number Publication date
JP2024122990A (ja) 2024-09-10
TW202030766A (zh) 2020-08-16
TW202037932A (zh) 2020-10-16
JP2022514238A (ja) 2022-02-10
KR20210094103A (ko) 2021-07-28
US12106935B2 (en) 2024-10-01
EP3899607A1 (en) 2021-10-27
KR20250133452A (ko) 2025-09-05
US20200194228A1 (en) 2020-06-18
KR102717774B1 (ko) 2024-10-15
KR102849594B1 (ko) 2025-08-21
EP3899607A4 (en) 2023-03-01
EP3898068A1 (en) 2021-10-27
TWI841643B (zh) 2024-05-11
JP2022512366A (ja) 2022-02-03
TW202439365A (zh) 2024-10-01
US20210027985A1 (en) 2021-01-28
CN113195151A (zh) 2021-07-30
US20200194227A1 (en) 2020-06-18
US11670482B2 (en) 2023-06-06
US11367589B2 (en) 2022-06-21
KR20210094104A (ko) 2021-07-28
CN113167948A (zh) 2021-07-23
US20230260746A1 (en) 2023-08-17
EP3898068A4 (en) 2022-11-23
TWI921809B (zh) 2026-04-11
WO2020131394A1 (en) 2020-06-25
US11456152B2 (en) 2022-09-27
WO2020131398A1 (en) 2020-06-25
JP7494179B2 (ja) 2024-06-03
TWI846780B (zh) 2024-07-01
CN113195151B (zh) 2024-04-16

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