CN113195151B - 成角度的光栅的旋转k矢量的调制 - Google Patents

成角度的光栅的旋转k矢量的调制 Download PDF

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Publication number
CN113195151B
CN113195151B CN201980082330.0A CN201980082330A CN113195151B CN 113195151 B CN113195151 B CN 113195151B CN 201980082330 A CN201980082330 A CN 201980082330A CN 113195151 B CN113195151 B CN 113195151B
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Prior art keywords
ion beam
substrate
angle
fins
grating
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Chinese (zh)
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CN113195151A (zh
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约瑟夫·C·奥尔森
摩根·埃文斯
罗格·梅耶·蒂默曼·蒂杰森
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12107—Grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
    • H01J2237/1507—Tilting or rocking beam around an axis substantially at an angle to optical axis dynamically, e.g. to obtain same impinging angle on whole area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Drying Of Semiconductors (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Mechanical Engineering (AREA)
CN201980082330.0A 2018-12-17 2019-12-05 成角度的光栅的旋转k矢量的调制 Active CN113195151B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862780815P 2018-12-17 2018-12-17
US62/780,815 2018-12-17
PCT/US2019/064592 WO2020131394A1 (en) 2018-12-17 2019-12-05 Modulation of rolling k vectors of angled gratings

Publications (2)

Publication Number Publication Date
CN113195151A CN113195151A (zh) 2021-07-30
CN113195151B true CN113195151B (zh) 2024-04-16

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CN201980081505.6A Pending CN113167948A (zh) 2018-12-17 2019-12-05 成角度的光栅的旋转k矢量的调制

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US (4) US11456152B2 (enExample)
EP (2) EP3899607A4 (enExample)
JP (3) JP7417611B2 (enExample)
KR (3) KR102849594B1 (enExample)
CN (2) CN113195151B (enExample)
TW (3) TWI846780B (enExample)
WO (2) WO2020131398A1 (enExample)

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US11487058B2 (en) 2020-08-13 2022-11-01 Applied Materials, Inc. Method for manufacturing optical device structures
CN112394436B (zh) * 2020-11-25 2021-07-06 中国科学院上海光学精密机械研究所 1064纳米波段的非对称结构全介质反射式合束光栅
EP4416540A4 (en) * 2021-10-15 2025-08-13 Applied Materials Inc MULTILAYER TRANSMISSION STRUCTURES FOR WAVEGUIDE DISPLAY DEVICE
US12674927B2 (en) 2022-04-20 2026-07-07 Applied Materials, Inc. Method for roughness reduction in manufacturing optical device structures
US12687776B2 (en) 2023-04-24 2026-07-21 Tel Manufacturing And Engineering Of America, Inc. Optical elements patterning
TW202544502A (zh) 2024-02-16 2025-11-16 美商應用材料股份有限公司 用於獨立控制虛擬影像與世界漏角度的稜鏡

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JP2024122990A (ja) 2024-09-10
TW202030766A (zh) 2020-08-16
JP7417611B2 (ja) 2024-01-18
TW202037932A (zh) 2020-10-16
JP2022514238A (ja) 2022-02-10
KR20210094103A (ko) 2021-07-28
US12106935B2 (en) 2024-10-01
EP3899607A1 (en) 2021-10-27
KR20250133452A (ko) 2025-09-05
US20200194228A1 (en) 2020-06-18
KR102717774B1 (ko) 2024-10-15
KR102849594B1 (ko) 2025-08-21
EP3899607A4 (en) 2023-03-01
EP3898068A1 (en) 2021-10-27
TWI841643B (zh) 2024-05-11
JP2022512366A (ja) 2022-02-03
TW202439365A (zh) 2024-10-01
US20210027985A1 (en) 2021-01-28
CN113195151A (zh) 2021-07-30
US20200194227A1 (en) 2020-06-18
US11670482B2 (en) 2023-06-06
US11367589B2 (en) 2022-06-21
KR20210094104A (ko) 2021-07-28
CN113167948A (zh) 2021-07-23
US20230260746A1 (en) 2023-08-17
EP3898068A4 (en) 2022-11-23
TWI921809B (zh) 2026-04-11
WO2020131394A1 (en) 2020-06-25
US11456152B2 (en) 2022-09-27
WO2020131398A1 (en) 2020-06-25
JP7494179B2 (ja) 2024-06-03
TWI846780B (zh) 2024-07-01

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