JP7406872B1 - シリンダ用3価クロムめっき装置及び方法 - Google Patents
シリンダ用3価クロムめっき装置及び方法 Download PDFInfo
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- JP7406872B1 JP7406872B1 JP2023543113A JP2023543113A JP7406872B1 JP 7406872 B1 JP7406872 B1 JP 7406872B1 JP 2023543113 A JP2023543113 A JP 2023543113A JP 2023543113 A JP2023543113 A JP 2023543113A JP 7406872 B1 JP7406872 B1 JP 7406872B1
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- Prior art keywords
- cylinder
- trivalent chromium
- chromium plating
- treated
- insoluble electrode
- Prior art date
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- 238000007747 plating Methods 0.000 title claims abstract description 205
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 132
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 130
- 239000011651 chromium Substances 0.000 title claims abstract description 130
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000002093 peripheral effect Effects 0.000 claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000007639 printing Methods 0.000 abstract description 17
- 230000008021 deposition Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 9
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229960000359 chromic chloride Drugs 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- -1 calcium halide Chemical class 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/04—Tubes; Rings; Hollow bodies
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Claims (6)
- 3価クロムめっき液が貯留されるめっき槽と、被処理シリンダを回転可能且つ通電可能に長手方向両端を把持して前記めっき槽に水平方向に収容するチャック手段と、所定の通電が行われる不溶性電極と、を備え、前記不溶性電極を前記被処理シリンダの外周面に所定間隔をおいて近接せしめ、前記外周面に3価クロムめっきを施すようにしたシリンダ用3価クロムめっき装置であり、
前記不溶性電極が、前記被処理シリンダの外周面の周囲を囲繞する囲繞型不溶性電極であり、
前記囲繞型不溶性電極が、前記めっき槽に水平方向に収容された被処理シリンダの下側外周面の周囲を囲繞する下側囲繞型不溶性電極、及び/又は前記めっき槽に水平方向に収容された被処理シリンダの上側外周面の周囲を囲繞する上側囲繞型不溶性電極、を含む、シリンダ用3価クロムめっき装置。 - 前記上側囲繞型不溶性電極及び/又は前記下側囲繞型不溶性電極が、交差型電極である請求項1記載のシリンダ用3価クロムめっき装置。
- 前記囲繞型不溶性電極が、エアシリンダ又は電動モータにより、前記被処理シリンダのシリンダ径に応じて前記外周面に近接せしめられてなる、請求項1記載のシリンダ用3価クロムめっき装置。
- 前記囲繞型不溶性電極が、アームの回転運動又は間隔を広狭する動作により、前記被処理シリンダのシリンダ径に応じて前記外周面に近接せしめられてなる、請求項1記載のシリンダ用3価クロムめっき装置。
- 請求項1~4いずれか1項記載のシリンダ用3価クロムめっき装置を用いて、前記3価クロムめっき液で前記被処理シリンダをめっき処理してなる、3価クロムめっき方法。
- 請求項1~4いずれか1項記載のシリンダ用3価クロムめっき装置を用いて、前記3価クロムめっき液で前記被処理シリンダをめっき処理することによりグラビアシリンダを製造してなる、グラビアシリンダの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022031030 | 2022-03-01 | ||
JP2022031030 | 2022-03-01 | ||
PCT/JP2023/005674 WO2023167009A1 (ja) | 2022-03-01 | 2023-02-17 | シリンダ用3価クロムめっき装置及び方法 |
Publications (2)
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JPWO2023167009A1 JPWO2023167009A1 (ja) | 2023-09-07 |
JP7406872B1 true JP7406872B1 (ja) | 2023-12-28 |
Family
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JP2023543113A Active JP7406872B1 (ja) | 2022-03-01 | 2023-02-17 | シリンダ用3価クロムめっき装置及び方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7406872B1 (ja) |
KR (1) | KR20240033149A (ja) |
CN (1) | CN117836474A (ja) |
TW (1) | TW202346657A (ja) |
WO (1) | WO2023167009A1 (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910828A (ja) * | 1972-06-01 | 1974-01-30 | ||
JPH10121291A (ja) * | 1996-09-13 | 1998-05-12 | Mdc Max Daetwyler Bleienbach Ag | グラビア胴にクロム層を被着させる方法及び装置 |
WO2012043513A1 (ja) * | 2010-10-01 | 2012-04-05 | 株式会社シンク・ラボラトリー | シリンダ用メッキ装置 |
WO2015151665A1 (ja) * | 2014-03-31 | 2015-10-08 | 株式会社シンク・ラボラトリー | シリンダ用メッキ装置及び方法 |
US20180016688A1 (en) * | 2015-01-30 | 2018-01-18 | Acrom S.A. | Ecologic method for the continuous chrome plating of bars and associated device |
WO2019164445A1 (en) * | 2018-02-22 | 2019-08-29 | Absolicon Solar Collector Ab | Electroplating of selective surfaces for concentrating solar collectors |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7095867B2 (ja) | 2018-01-15 | 2022-07-05 | 国立大学法人京都大学 | 金属または金属塩の溶解用溶液およびその利用 |
-
2023
- 2023-02-17 JP JP2023543113A patent/JP7406872B1/ja active Active
- 2023-02-17 KR KR1020247006858A patent/KR20240033149A/ko active Search and Examination
- 2023-02-17 WO PCT/JP2023/005674 patent/WO2023167009A1/ja active Application Filing
- 2023-02-17 CN CN202380013241.7A patent/CN117836474A/zh active Pending
- 2023-02-24 TW TW112106924A patent/TW202346657A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910828A (ja) * | 1972-06-01 | 1974-01-30 | ||
JPH10121291A (ja) * | 1996-09-13 | 1998-05-12 | Mdc Max Daetwyler Bleienbach Ag | グラビア胴にクロム層を被着させる方法及び装置 |
WO2012043513A1 (ja) * | 2010-10-01 | 2012-04-05 | 株式会社シンク・ラボラトリー | シリンダ用メッキ装置 |
WO2015151665A1 (ja) * | 2014-03-31 | 2015-10-08 | 株式会社シンク・ラボラトリー | シリンダ用メッキ装置及び方法 |
US20180016688A1 (en) * | 2015-01-30 | 2018-01-18 | Acrom S.A. | Ecologic method for the continuous chrome plating of bars and associated device |
WO2019164445A1 (en) * | 2018-02-22 | 2019-08-29 | Absolicon Solar Collector Ab | Electroplating of selective surfaces for concentrating solar collectors |
Also Published As
Publication number | Publication date |
---|---|
KR20240033149A (ko) | 2024-03-12 |
WO2023167009A1 (ja) | 2023-09-07 |
JPWO2023167009A1 (ja) | 2023-09-07 |
TW202346657A (zh) | 2023-12-01 |
CN117836474A (zh) | 2024-04-05 |
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