JP7384388B2 - 表示装置 - Google Patents
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- JP7384388B2 JP7384388B2 JP2019205701A JP2019205701A JP7384388B2 JP 7384388 B2 JP7384388 B2 JP 7384388B2 JP 2019205701 A JP2019205701 A JP 2019205701A JP 2019205701 A JP2019205701 A JP 2019205701A JP 7384388 B2 JP7384388 B2 JP 7384388B2
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- 239000004065 semiconductor Substances 0.000 claims description 90
- 239000010409 thin film Substances 0.000 description 34
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 239000013256 coordination polymer Substances 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000002161 passivation Methods 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 5
- 239000003086 colorant Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000002096 quantum dot Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 2
- 229910001195 gallium oxide Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- NJWNEWQMQCGRDO-UHFFFAOYSA-N indium zinc Chemical compound [Zn].[In] NJWNEWQMQCGRDO-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Led Device Packages (AREA)
Description
110、120、130、140、150、160:絶縁層
BM:遮光パターン
CCE:接続電極
CF:カラーフィルター
C:カバー層
ED:発光素子
EDa:活性発光素子
EDd:ダミー発光素子
OE1、OE2:出力電極
PAR:隔壁構造体
PX:画素
PXC:画素回路
RS:リセス領域
Claims (20)
- ベース層上の複数の画素と、
前記画素の中で第1画素上に配置された第1発光素子及び第2発光素子と、
前記第1発光素子及び前記第2発光素子と前記ベース層との間の第1電極と、
前記第1発光素子及び前記第2発光素子上の第2電極と、を含み、
前記第1発光素子及び前記第2発光素子の各々は、第1面及び前記第1面に対向する第2面を含み、
前記第1発光素子の前記第1面は、前記ベース層に対向し、
前記第2発光素子の前記第2面は、前記ベース層に対向し、
前記第1発光素子の前記第1面は、前記第1電極に接触し、
前記第2面は、前記第2電極に接触し、
前記第2発光素子の前記第1面は、前記第2電極に接触し、
前記第2面は、前記第1電極に接触する表示装置。 - 前記第1発光素子及び前記第2発光素子の各々は、順次的に積層された第1半導体層、活性層、及び第2半導体層を含み、
前記第1半導体層は、前記第1面に隣接し、
前記第2半導体層は、前記第2面に隣接する請求項1に記載の表示装置。 - 前記第1発光素子の前記第1面は、前記第1電極に対向し、前記第2面は、前記第2電極に対向し、
前記第2発光素子の前記第1面は、前記第2電極に対向し、前記第2面は、前記第1電極に対向する請求項1に記載の表示装置。 - 前記第1発光素子は、活性発光素子であり、
前記第2発光素子は、ダミー発光素子である請求項1に記載の表示装置。 - 前記第1発光素子の中心を通り、前記第1発光素子の両側壁に対して直交する第1中心線が定義され、
前記第2発光素子の中心を通り、前記第2発光素子の両側壁に対して直交する第2中心線が定義され、
前記第1中心線及び前記第2中心線は、互いに交差する請求項1に記載の表示装置。 - 前記第1発光素子及び前記第2発光素子の各々の前記第1面上に配置された導電パターンをさらに含む請求項1に記載の表示装置。
- 前記第1発光素子及び前記第2発光素子の各々は、その高さに対するその最大幅の比が2乃至50である請求項1に記載の表示装置。
- 前記第2面の面積は、前記第1面の面積より大きい請求項1に記載の表示装置。
- ベース層上の複数の画素と、
前記画素の中で第1画素上に配置された複数の発光素子と、を含み、
前記発光素子は、第1発光素子、及び前記第1発光素子に隣接する第2発光素子、第3発光素子及び第4発光素子を含み、
前記第1発光素子及び前記第2発光素子と前記ベース層との間の第1電極と、
前記第1発光素子及び前記第2発光素子上の第2電極と、をさらに含み、
前記第1発光素子の中心と前記第2発光素子の中心を連結する第1仮想線が定義され、
前記第1発光素子の中心と前記第3発光素子の中心とを連結する第2仮想線が定義され、
前記第1発光素子の中心と前記第4発光素子の中心とを連結する第3仮想線が定義され、
前記第1仮想線乃至前記第3仮想線は、互いに異なる長さを有し、
前記第1仮想線と前記第2仮想線との間の角度は、前記第2仮想線と前記第3仮想線との間の角度と異なり、
各々の前記発光素子は、第1面及び前記第1面に対向する第2面を含み、
前記第1発光素子の前記第1面は、前記第1電極に接触し、
前記第2面は、前記第2電極に接触し、
前記第2発光素子の前記第1面は、前記第2電極に接触し、
前記第2面は、前記第1電極に接触する表示装置。 - 前記発光素子は、前記第1画素上でランダムに2次元的に配列された請求項9に記載の表示装置。
- 前記第1発光素子の前記第1面は、前記ベース層に対向し、
前記第2発光素子の前記第2面は、前記ベース層に対向する請求項9に記載の表示装置。 - 各々の前記発光素子は、順次的に積層された第1半導体層、活性層、及び第2半導体層を含み、
前記第1半導体層は、前記第1面に隣接し、
前記第2半導体層は、前記第2面に隣接する請求項11に記載の表示装置。 - 各々の前記発光素子は、その高さに対するその最大幅の比が2乃至100である請求項9に記載の表示装置。
- 前記発光素子は、前記第1電極及び前記第2電極の間に設けられている請求項9に記載の表示装置。
- ベース層上で第1方向に配列された複数の画素と、
前記画素の中で第1画素上に配置された第1発光素子及び第2発光素子と、
前記第1発光素子及び前記第2発光素子と前記ベース層との間の第1電極と、
前記第1発光素子及び前記第2発光素子上の第2電極と、を含み、
前記第1発光素子の中心を通り、前記第1発光素子の両側壁に対して直交する第1中心線が定義され、
前記第2発光素子の中心を通り、前記第2発光素子の両側壁に対して直交する第2中心線が定義され、
前記第1中心線と前記第1方向とは、第1角度を成し、
前記第2中心線と前記第1方向とは、前記第1角度とは異なる第2角度をなし、
前記第1発光素子及び前記第2発光素子の各々は、第1面、及び前記第1面に対向する第2面を含み、
前記第1発光素子の前記第1面は、前記第1電極に接触し、
前記第2面は、前記第2電極に接触し、
前記第2発光素子の前記第1面は、前記第2電極に接触し、
前記第2面は、前記第1電極に接触する表示装置。 - 前記第1画素上に配置された第3発光素子をさらに含み、
前記第3発光素子の中心を通り、前記第3発光素子の両側壁に対して直交する第3中心線が定義され、
前記第3中心線と前記第1方向とは、第3角度をなし、
前記第3角度は、前記第1角度及び前記第2角度の両方と異なる請求項15に記載の表示装置。 - 前記第1発光素子の前記第1面は、前記ベース層に対向し、
前記第2発光素子の前記第2面は、前記ベース層に対向する請求項15に記載の表示装置。 - 前記第1発光素子及び前記第2発光素子の各々は、順次的に積層された第1半導体層、活性層、及び第2半導体層を含み、
前記第1半導体層は、前記第1面に隣接し、
前記第2半導体層は、前記第2面に隣接する請求項17に記載の表示装置。 - 前記第1発光素子及び前記第2発光素子の各々は、その高さに対するその最大幅の比が2乃至50である請求項15に記載の表示装置。
- 前記第1及び第2発光素子は、前記第1電極及び前記第2電極の間に設けられている請求項15に記載の表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR1020180140244A KR102668034B1 (ko) | 2018-11-14 | 표시 장치 | |
KR10-2018-0140244 | 2018-11-14 |
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JP2020086452A JP2020086452A (ja) | 2020-06-04 |
JP7384388B2 true JP7384388B2 (ja) | 2023-11-21 |
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JP2019205701A Active JP7384388B2 (ja) | 2018-11-14 | 2019-11-13 | 表示装置 |
Country Status (4)
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US (1) | US11251337B2 (ja) |
EP (1) | EP3654375B1 (ja) |
JP (1) | JP7384388B2 (ja) |
CN (1) | CN111192895A (ja) |
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KR20210064856A (ko) * | 2019-11-26 | 2021-06-03 | 삼성전자주식회사 | Led 소자 및 그 제조방법과, led 소자를 포함하는 디스플레이 장치 |
KR20210102739A (ko) * | 2020-02-12 | 2021-08-20 | 삼성전자주식회사 | Led 소자 및 그 제조방법과, led 소자를 포함하는 디스플레이 장치 |
US20210335766A1 (en) * | 2020-04-23 | 2021-10-28 | Seoul National University R&Db Foundation | Display device and method of manufacturing the same |
KR20230142053A (ko) * | 2022-03-31 | 2023-10-11 | 삼성디스플레이 주식회사 | 표시 장치 |
WO2024052971A1 (ja) * | 2022-09-06 | 2024-03-14 | アルディーテック株式会社 | 発光ダイオードチップ、発光ダイオードチップ集積装置および発光ダイオードチップ集積装置の製造方法 |
Citations (4)
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JP2010087452A (ja) | 2008-10-03 | 2010-04-15 | Panasonic Corp | 表示装置およびその製造方法 |
JP2016522585A (ja) | 2013-06-17 | 2016-07-28 | ルクスビュー テクノロジー コーポレイション | 反射バンク構造及び発光デバイスを組み込むための方法 |
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