JP7382507B2 - 制御回路、パルス電源システム及び半導体処理装置 - Google Patents

制御回路、パルス電源システム及び半導体処理装置 Download PDF

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Publication number
JP7382507B2
JP7382507B2 JP2022534686A JP2022534686A JP7382507B2 JP 7382507 B2 JP7382507 B2 JP 7382507B2 JP 2022534686 A JP2022534686 A JP 2022534686A JP 2022534686 A JP2022534686 A JP 2022534686A JP 7382507 B2 JP7382507 B2 JP 7382507B2
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terminal
circuit
switch
signal
control
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Japanese (ja)
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JP2023505974A (ja
Inventor
ウェイ、ガン
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32027—DC powered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32045—Circuits specially adapted for controlling the glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M3/00—Conversion of dc power input into dc power output
    • H02M3/02—Conversion of dc power input into dc power output without intermediate conversion into ac
    • H02M3/04—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters
    • H02M3/10—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
    • H02M3/145—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
    • H02M3/155—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
    • H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B70/00—Technologies for an efficient end-user side electric power management and consumption
    • Y02B70/10—Technologies improving the efficiency by using switched-mode power supplies [SMPS], i.e. efficient power electronics conversion e.g. power factor correction or reduction of losses in power supplies or efficient standby modes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/16—Mechanical energy storage, e.g. flywheels or pressurised fluids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Power Engineering (AREA)
  • Dc-Dc Converters (AREA)
  • Plasma Technology (AREA)
  • Electronic Switches (AREA)
JP2022534686A 2019-12-18 2020-12-17 制御回路、パルス電源システム及び半導体処理装置 Active JP7382507B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201911310564.4A CN110993478A (zh) 2019-12-18 2019-12-18 脉冲电源控制电路及半导体加工设备
CN201911310564.4 2019-12-18
PCT/CN2020/137126 WO2021121304A1 (zh) 2019-12-18 2020-12-17 控制电路、脉冲电源系统和半导体加工设备

Publications (2)

Publication Number Publication Date
JP2023505974A JP2023505974A (ja) 2023-02-14
JP7382507B2 true JP7382507B2 (ja) 2023-11-16

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JP2022534686A Active JP7382507B2 (ja) 2019-12-18 2020-12-17 制御回路、パルス電源システム及び半導体処理装置

Country Status (7)

Country Link
US (1) US11955313B2 (zh)
EP (1) EP4080542A4 (zh)
JP (1) JP7382507B2 (zh)
KR (1) KR102619475B1 (zh)
CN (2) CN110993478A (zh)
TW (1) TWI773026B (zh)
WO (1) WO2021121304A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110993478A (zh) * 2019-12-18 2020-04-10 北京北方华创微电子装备有限公司 脉冲电源控制电路及半导体加工设备
CN112130497B (zh) * 2020-09-23 2022-04-22 北京北方华创微电子装备有限公司 半导体设备中的电源输出控制方法和系统、处理器

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2896644Y (zh) 2006-03-03 2007-05-02 李玉林 逆变电源并联装置
CN101030706A (zh) 2006-03-03 2007-09-05 李玉林 逆变电源并联装置
JP2012033409A (ja) 2010-07-30 2012-02-16 Origin Electric Co Ltd 直流プラズマ用逆極性パルス発生回路及び直流プラズマ電源装置
JP2018535504A (ja) 2015-10-03 2018-11-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 近似鋸歯状波パルス生成によるｒｆ電力供給
CN110198138A (zh) 2019-05-24 2019-09-03 核工业西南物理研究院 一种直流磁控溅射镀膜电源快速可靠助燃电路

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US5159261A (en) * 1989-07-25 1992-10-27 Superconductivity, Inc. Superconducting energy stabilizer with charging and discharging DC-DC converters
JPH03102278A (ja) 1989-09-14 1991-04-26 Jeol Ltd Ｎｍｒ装置の実時間コントロール方式
JP2578044Y2 (ja) * 1991-11-15 1998-08-06 株式会社三社電機製作所 放電灯電源装置
JPH11339983A (ja) * 1998-05-28 1999-12-10 Midori Denshi Kk 交流電力制御装置
DE19933842A1 (de) * 1999-07-20 2001-02-01 Bosch Gmbh Robert Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas
US6538909B2 (en) * 2001-12-13 2003-03-25 Enova Systems Universal high efficiency power converter
JP3811681B2 (ja) 2002-06-12 2006-08-23 日本碍子株式会社 高電圧パルス発生回路
US7099169B2 (en) * 2003-02-21 2006-08-29 Distributed Power, Inc. DC to AC inverter with single-switch bipolar boost circuit
US7663319B2 (en) 2004-02-22 2010-02-16 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2896644Y (zh) 2006-03-03 2007-05-02 李玉林 逆变电源并联装置
CN101030706A (zh) 2006-03-03 2007-09-05 李玉林 逆变电源并联装置
JP2012033409A (ja) 2010-07-30 2012-02-16 Origin Electric Co Ltd 直流プラズマ用逆極性パルス発生回路及び直流プラズマ電源装置
JP2018535504A (ja) 2015-10-03 2018-11-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 近似鋸歯状波パルス生成によるｒｆ電力供給
CN110198138A (zh) 2019-05-24 2019-09-03 核工业西南物理研究院 一种直流磁控溅射镀膜电源快速可靠助燃电路

Also Published As

Publication number Publication date
US20230023621A1 (en) 2023-01-26
TW202125936A (zh) 2021-07-01
CN110993478A (zh) 2020-04-10
EP4080542A4 (en) 2024-01-03
KR102619475B1 (ko) 2023-12-29
US11955313B2 (en) 2024-04-09
WO2021121304A1 (zh) 2021-06-24
JP2023505974A (ja) 2023-02-14
CN113013007A (zh) 2021-06-22
KR20220093161A (ko) 2022-07-05
EP4080542A1 (en) 2022-10-26
TWI773026B (zh) 2022-08-01

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