JP7352804B2 - 中空微粒子の製造方法及び中空微粒子 - Google Patents

中空微粒子の製造方法及び中空微粒子 Download PDF

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Publication number
JP7352804B2
JP7352804B2 JP2019089002A JP2019089002A JP7352804B2 JP 7352804 B2 JP7352804 B2 JP 7352804B2 JP 2019089002 A JP2019089002 A JP 2019089002A JP 2019089002 A JP2019089002 A JP 2019089002A JP 7352804 B2 JP7352804 B2 JP 7352804B2
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Prior art keywords
fluorine
fine particles
hollow fine
monomer
hollow
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Japanese (ja)
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JP2020183500A5 (https=
JP2020183500A (ja
Inventor
義人 田中
絵美 山本
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Daikin Industries Ltd
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Daikin Industries Ltd
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Priority to JP2019089002A priority Critical patent/JP7352804B2/ja
Priority to PCT/JP2020/015368 priority patent/WO2020226010A1/ja
Priority to EP20801443.1A priority patent/EP3967715A4/en
Priority to CN202080031788.6A priority patent/CN113748137B/zh
Publication of JP2020183500A publication Critical patent/JP2020183500A/ja
Priority to US17/519,937 priority patent/US20220056178A1/en
Publication of JP2020183500A5 publication Critical patent/JP2020183500A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/20—After-treatment of capsule walls, e.g. hardening
    • B01J13/203—Exchange of core-forming material by diffusion through the capsule wall
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • B01J13/18—In situ polymerisation with all reactants being present in the same phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • B01J13/18—In situ polymerisation with all reactants being present in the same phase
    • B01J13/185—In situ polymerisation with all reactants being present in the same phase in an organic phase
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/22—Emulsion polymerisation
    • C08F2/24—Emulsion polymerisation with the aid of emulsifying agents
    • C08F2/26—Emulsion polymerisation with the aid of emulsifying agents anionic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/443—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds
    • H01B3/445—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds from vinylfluorides or other fluoroethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
JP2019089002A 2019-05-09 2019-05-09 中空微粒子の製造方法及び中空微粒子 Active JP7352804B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019089002A JP7352804B2 (ja) 2019-05-09 2019-05-09 中空微粒子の製造方法及び中空微粒子
PCT/JP2020/015368 WO2020226010A1 (ja) 2019-05-09 2020-04-03 中空微粒子の製造方法及び中空微粒子
EP20801443.1A EP3967715A4 (en) 2019-05-09 2020-04-03 Hollow fine particle production method and hollow fine particles
CN202080031788.6A CN113748137B (zh) 2019-05-09 2020-04-03 中空微粒的制造方法和中空微粒
US17/519,937 US20220056178A1 (en) 2019-05-09 2021-11-05 Hollow fine particle production method and hollow fine particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019089002A JP7352804B2 (ja) 2019-05-09 2019-05-09 中空微粒子の製造方法及び中空微粒子

Publications (3)

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JP2020183500A JP2020183500A (ja) 2020-11-12
JP2020183500A5 JP2020183500A5 (https=) 2021-12-02
JP7352804B2 true JP7352804B2 (ja) 2023-09-29

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US (1) US20220056178A1 (https=)
EP (1) EP3967715A4 (https=)
JP (1) JP7352804B2 (https=)
CN (1) CN113748137B (https=)
WO (1) WO2020226010A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4166579A4 (en) * 2020-07-09 2024-07-10 Daikin Industries, Ltd. Manufacturing method for hollow fine particles, and hollow fine particles
JP2022117398A (ja) * 2021-01-29 2022-08-10 住友ベークライト株式会社 封止用樹脂組成物、半導体装置の製造方法、および中空無機フィラーの検出方法
CN116745027B (zh) * 2021-01-29 2026-03-13 日本瑞翁株式会社 中空颗粒
CN118043130A (zh) * 2021-10-08 2024-05-14 大金工业株式会社 中空微粒的制造方法、中空微粒、相分离微粒、水分散体和组合物
WO2024214700A1 (ja) 2023-04-12 2024-10-17 ダイキン工業株式会社 中空微粒子の製造方法、中空微粒子、相分離微粒子、水分散体及び組成物
WO2026034577A1 (ja) * 2024-08-09 2026-02-12 積水化成品工業株式会社 中空樹脂粒子、およびその用途

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WO2014041983A1 (ja) 2012-09-11 2014-03-20 Jsr株式会社 保護膜を作製するための組成物および保護膜、ならびに蓄電デバイス
JP2017525585A (ja) 2014-09-30 2017-09-07 エルジー・ケム・リミテッド フレキシブル金属積層体およびその製造方法
JP2018124435A (ja) 2017-02-01 2018-08-09 コニカミノルタ株式会社 定着部材、画像形成装置、定着方法および画像形成方法

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JP2010167410A (ja) 2008-12-26 2010-08-05 Fujifilm Corp 中空微粒子の製造方法、それにより得られる中空微粒子及びその分散液、並びにこの中空微粒子を用いた反射防止フィルム
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Also Published As

Publication number Publication date
EP3967715A1 (en) 2022-03-16
US20220056178A1 (en) 2022-02-24
EP3967715A4 (en) 2023-04-19
CN113748137A (zh) 2021-12-03
JP2020183500A (ja) 2020-11-12
CN113748137B (zh) 2023-08-29
WO2020226010A1 (ja) 2020-11-12

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