JP7352332B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP7352332B2
JP7352332B2 JP2018093066A JP2018093066A JP7352332B2 JP 7352332 B2 JP7352332 B2 JP 7352332B2 JP 2018093066 A JP2018093066 A JP 2018093066A JP 2018093066 A JP2018093066 A JP 2018093066A JP 7352332 B2 JP7352332 B2 JP 7352332B2
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JP
Japan
Prior art keywords
exposure
shutter member
period
light
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018093066A
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English (en)
Japanese (ja)
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JP2019200235A (ja
JP2019200235A5 (enExample
Inventor
瑞真 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018093066A priority Critical patent/JP7352332B2/ja
Priority to TW108114067A priority patent/TWI766158B/zh
Priority to KR1020190055389A priority patent/KR102497946B1/ko
Publication of JP2019200235A publication Critical patent/JP2019200235A/ja
Publication of JP2019200235A5 publication Critical patent/JP2019200235A5/ja
Application granted granted Critical
Publication of JP7352332B2 publication Critical patent/JP7352332B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure Control For Cameras (AREA)
JP2018093066A 2018-05-14 2018-05-14 露光装置 Active JP7352332B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018093066A JP7352332B2 (ja) 2018-05-14 2018-05-14 露光装置
TW108114067A TWI766158B (zh) 2018-05-14 2019-04-23 曝光裝置及使用其之物品之製造方法
KR1020190055389A KR102497946B1 (ko) 2018-05-14 2019-05-13 노광 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018093066A JP7352332B2 (ja) 2018-05-14 2018-05-14 露光装置

Publications (3)

Publication Number Publication Date
JP2019200235A JP2019200235A (ja) 2019-11-21
JP2019200235A5 JP2019200235A5 (enExample) 2021-06-17
JP7352332B2 true JP7352332B2 (ja) 2023-09-28

Family

ID=68612097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018093066A Active JP7352332B2 (ja) 2018-05-14 2018-05-14 露光装置

Country Status (3)

Country Link
JP (1) JP7352332B2 (enExample)
KR (1) KR102497946B1 (enExample)
TW (1) TWI766158B (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015149450A (ja) 2014-02-07 2015-08-20 キヤノン株式会社 露光装置、および物品の製造方法
WO2017167259A1 (zh) 2016-03-31 2017-10-05 上海微电子装备（集团）股份有限公司 一种用于光刻机曝光的快门装置及其使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04229843A (ja) * 1990-12-27 1992-08-19 Canon Inc 露光装置用シャッタ
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JP3988091B2 (ja) * 1997-01-17 2007-10-10 フジノン株式会社 露光制御装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP5100088B2 (ja) * 2006-11-07 2012-12-19 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) * 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法
JP6194702B2 (ja) 2013-08-30 2017-09-13 ソニー株式会社 露出制御装置および露出制御方法、ならびに撮像装置
JP6861463B2 (ja) * 2015-06-16 2021-04-21 キヤノン株式会社 露光装置及び物品の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015149450A (ja) 2014-02-07 2015-08-20 キヤノン株式会社 露光装置、および物品の製造方法
WO2017167259A1 (zh) 2016-03-31 2017-10-05 上海微电子装备（集团）股份有限公司 一种用于光刻机曝光的快门装置及其使用方法

Also Published As

Publication number Publication date
JP2019200235A (ja) 2019-11-21
TW201947328A (zh) 2019-12-16
TWI766158B (zh) 2022-06-01
KR102497946B1 (ko) 2023-02-10
KR20190130500A (ko) 2019-11-22

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