TWI766158B - 曝光裝置及使用其之物品之製造方法 - Google Patents

曝光裝置及使用其之物品之製造方法 Download PDF

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Publication number
TWI766158B
TWI766158B TW108114067A TW108114067A TWI766158B TW I766158 B TWI766158 B TW I766158B TW 108114067 A TW108114067 A TW 108114067A TW 108114067 A TW108114067 A TW 108114067A TW I766158 B TWI766158 B TW I766158B
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TW
Taiwan
Prior art keywords
shutter member
exposure
light
blocking
exposure apparatus
Prior art date
Application number
TW108114067A
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English (en)
Chinese (zh)
Other versions
TW201947328A (zh
Inventor
村上瑞真
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW201947328A publication Critical patent/TW201947328A/zh
Application granted granted Critical
Publication of TWI766158B publication Critical patent/TWI766158B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure Control For Cameras (AREA)
TW108114067A 2018-05-14 2019-04-23 曝光裝置及使用其之物品之製造方法 TWI766158B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-093066 2018-05-14
JP2018093066A JP7352332B2 (ja) 2018-05-14 2018-05-14 露光装置

Publications (2)

Publication Number Publication Date
TW201947328A TW201947328A (zh) 2019-12-16
TWI766158B true TWI766158B (zh) 2022-06-01

Family

ID=68612097

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108114067A TWI766158B (zh) 2018-05-14 2019-04-23 曝光裝置及使用其之物品之製造方法

Country Status (3)

Country Link
JP (1) JP7352332B2 (enExample)
KR (1) KR102497946B1 (enExample)
TW (1) TWI766158B (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10206926A (ja) * 1997-01-17 1998-08-07 Fuji Photo Optical Co Ltd 露光制御装置
TW201715312A (zh) * 2015-06-16 2017-05-01 佳能股份有限公司 曝光設備和製造物品的方法
TW201736983A (zh) * 2016-03-31 2017-10-16 Shanghai Micro Electronics Equipment (Group) Co Ltd 一種用於光蝕刻機曝光的快門裝置及其使用方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04229843A (ja) * 1990-12-27 1992-08-19 Canon Inc 露光装置用シャッタ
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP5100088B2 (ja) * 2006-11-07 2012-12-19 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) * 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法
JP6194702B2 (ja) 2013-08-30 2017-09-13 ソニー株式会社 露出制御装置および露出制御方法、ならびに撮像装置
JP6415057B2 (ja) 2014-02-07 2018-10-31 キヤノン株式会社 露光装置、および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10206926A (ja) * 1997-01-17 1998-08-07 Fuji Photo Optical Co Ltd 露光制御装置
TW201715312A (zh) * 2015-06-16 2017-05-01 佳能股份有限公司 曝光設備和製造物品的方法
TW201736983A (zh) * 2016-03-31 2017-10-16 Shanghai Micro Electronics Equipment (Group) Co Ltd 一種用於光蝕刻機曝光的快門裝置及其使用方法

Also Published As

Publication number Publication date
JP7352332B2 (ja) 2023-09-28
JP2019200235A (ja) 2019-11-21
TW201947328A (zh) 2019-12-16
KR102497946B1 (ko) 2023-02-10
KR20190130500A (ko) 2019-11-22

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