JP7331860B2 - 感光性絶縁膜組成物 - Google Patents

感光性絶縁膜組成物 Download PDF

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Publication number
JP7331860B2
JP7331860B2 JP2020553100A JP2020553100A JP7331860B2 JP 7331860 B2 JP7331860 B2 JP 7331860B2 JP 2020553100 A JP2020553100 A JP 2020553100A JP 2020553100 A JP2020553100 A JP 2020553100A JP 7331860 B2 JP7331860 B2 JP 7331860B2
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JP
Japan
Prior art keywords
group
photosensitive resin
resin composition
carbon atoms
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020553100A
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English (en)
Japanese (ja)
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JPWO2020080207A1 (ja
JPWO2020080207A5 (https=
Inventor
隼人 服部
拓矢 大橋
友輝 臼井
和宏 澤田
雅久 遠藤
崇洋 坂口
一樹 平佐田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of JPWO2020080207A1 publication Critical patent/JPWO2020080207A1/ja
Publication of JPWO2020080207A5 publication Critical patent/JPWO2020080207A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP2020553100A 2018-10-15 2019-10-09 感光性絶縁膜組成物 Active JP7331860B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018194130 2018-10-15
JP2018194130 2018-10-15
PCT/JP2019/039734 WO2020080207A1 (ja) 2018-10-15 2019-10-09 感光性絶縁膜組成物

Publications (3)

Publication Number Publication Date
JPWO2020080207A1 JPWO2020080207A1 (ja) 2021-10-07
JPWO2020080207A5 JPWO2020080207A5 (https=) 2022-07-08
JP7331860B2 true JP7331860B2 (ja) 2023-08-23

Family

ID=70283803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020553100A Active JP7331860B2 (ja) 2018-10-15 2019-10-09 感光性絶縁膜組成物

Country Status (3)

Country Link
JP (1) JP7331860B2 (https=)
TW (1) TW202028865A (https=)
WO (1) WO2020080207A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7431241B2 (ja) * 2019-07-29 2024-02-14 旭化成株式会社 ネガ型感光性樹脂組成物、ポリイミドの製造方法、硬化レリーフパターンの製造方法、及び半導体装置
JPWO2022162895A1 (https=) * 2021-01-29 2022-08-04
JP7683276B2 (ja) * 2021-03-30 2025-05-27 味の素株式会社 感光性樹脂組成物
JPWO2023106101A1 (https=) * 2021-12-09 2023-06-15
KR102803377B1 (ko) * 2022-02-17 2025-05-02 아사히 가세이 가부시키가이샤 감광성 수지 조성물, 폴리이미드 경화막, 및 이들의 제조 방법
EP4503100A4 (en) * 2022-03-31 2026-03-18 Nissan Chemical Corp POLYMER FILM FORMING COMPOSITION AND SELECTIVE POLYMER FILM FORMING PROCESS

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009009107A (ja) 2007-05-25 2009-01-15 Toray Ind Inc 感光性樹脂組成物
JP2010211095A (ja) 2009-03-12 2010-09-24 Toray Ind Inc 感光性カバーレイ
WO2011059089A1 (ja) 2009-11-16 2011-05-19 旭化成イーマテリアルズ株式会社 ポリイミド前駆体及び該ポリイミド前駆体を含む感光性樹脂組成物
WO2011067998A1 (ja) 2009-12-04 2011-06-09 東レ株式会社 感光性樹脂組成物、それを用いた積層体および固体撮像装置
WO2018043467A1 (ja) 2016-08-31 2018-03-08 富士フイルム株式会社 樹脂組成物およびその応用

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009009107A (ja) 2007-05-25 2009-01-15 Toray Ind Inc 感光性樹脂組成物
JP2010211095A (ja) 2009-03-12 2010-09-24 Toray Ind Inc 感光性カバーレイ
WO2011059089A1 (ja) 2009-11-16 2011-05-19 旭化成イーマテリアルズ株式会社 ポリイミド前駆体及び該ポリイミド前駆体を含む感光性樹脂組成物
WO2011067998A1 (ja) 2009-12-04 2011-06-09 東レ株式会社 感光性樹脂組成物、それを用いた積層体および固体撮像装置
WO2018043467A1 (ja) 2016-08-31 2018-03-08 富士フイルム株式会社 樹脂組成物およびその応用

Also Published As

Publication number Publication date
WO2020080207A1 (ja) 2020-04-23
JPWO2020080207A1 (ja) 2021-10-07
TW202028865A (zh) 2020-08-01

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