JPWO2022162895A1 - - Google Patents

Info

Publication number
JPWO2022162895A1
JPWO2022162895A1 JP2022577968A JP2022577968A JPWO2022162895A1 JP WO2022162895 A1 JPWO2022162895 A1 JP WO2022162895A1 JP 2022577968 A JP2022577968 A JP 2022577968A JP 2022577968 A JP2022577968 A JP 2022577968A JP WO2022162895 A1 JPWO2022162895 A1 JP WO2022162895A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022577968A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022162895A1 publication Critical patent/JPWO2022162895A1/ja
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Materials For Photolithography (AREA)
JP2022577968A 2021-01-29 2021-01-29 Pending JPWO2022162895A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/003345 WO2022162895A1 (ja) 2021-01-29 2021-01-29 ポリイミド前駆体の選択方法、樹脂組成物の製造方法、ポリイミド前駆体、樹脂組成物及び硬化物

Publications (1)

Publication Number Publication Date
JPWO2022162895A1 true JPWO2022162895A1 (https=) 2022-08-04

Family

ID=82654337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022577968A Pending JPWO2022162895A1 (https=) 2021-01-29 2021-01-29

Country Status (3)

Country Link
JP (1) JPWO2022162895A1 (https=)
TW (1) TW202239819A (https=)
WO (1) WO2022162895A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025205567A1 (ja) * 2024-03-27 2025-10-02 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10135199A (ja) * 1996-10-28 1998-05-22 Internatl Business Mach Corp <Ibm> 集積回路素子及び作製プロセス
WO2000043439A1 (fr) * 1999-01-21 2000-07-27 Asahi Kasei Kabushiki Kaisha Ester d'acide polyamique
JP2002040658A (ja) * 2000-07-27 2002-02-06 Hitachi Chemical Dupont Microsystems Ltd 感光性樹脂組成物、これを用いた半導体装置及び電子部品
JP2012113212A (ja) * 2010-11-26 2012-06-14 Hitachi Displays Ltd 配向膜形成用溶媒、それを用いた配向膜材料および液晶表示装置の製造方法
WO2014097594A1 (ja) * 2012-12-21 2014-06-26 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体樹脂組成物
JP2015224261A (ja) * 2014-05-26 2015-12-14 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体を含む樹脂組成物、硬化膜、及びその製造方法
JP2016027357A (ja) * 2014-03-27 2016-02-18 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
JP2019031597A (ja) * 2017-08-07 2019-02-28 東レ株式会社 樹脂組成物、硬化膜、半導体装置および半導体装置の製造方法
JP2020024374A (ja) * 2018-04-23 2020-02-13 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法
JP2020026534A (ja) * 2018-08-16 2020-02-20 長興材料工業股▲ふん▼有限公司Eternal Materials Co.,Ltd. ポリイミドを調製するための方法
WO2020080207A1 (ja) * 2018-10-15 2020-04-23 日産化学株式会社 感光性絶縁膜組成物
JP2022021933A (ja) * 2020-07-22 2022-02-03 Hdマイクロシステムズ株式会社 感光性樹脂組成物、硬化物、パターン硬化物の製造方法、及び電子部品
JP2022021934A (ja) * 2020-07-22 2022-02-03 Hdマイクロシステムズ株式会社 感光性樹脂組成物、硬化物、パターン硬化物の製造方法、及び電子部品

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10135199A (ja) * 1996-10-28 1998-05-22 Internatl Business Mach Corp <Ibm> 集積回路素子及び作製プロセス
WO2000043439A1 (fr) * 1999-01-21 2000-07-27 Asahi Kasei Kabushiki Kaisha Ester d'acide polyamique
JP2002040658A (ja) * 2000-07-27 2002-02-06 Hitachi Chemical Dupont Microsystems Ltd 感光性樹脂組成物、これを用いた半導体装置及び電子部品
JP2012113212A (ja) * 2010-11-26 2012-06-14 Hitachi Displays Ltd 配向膜形成用溶媒、それを用いた配向膜材料および液晶表示装置の製造方法
WO2014097594A1 (ja) * 2012-12-21 2014-06-26 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体樹脂組成物
JP2016027357A (ja) * 2014-03-27 2016-02-18 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
JP2015224261A (ja) * 2014-05-26 2015-12-14 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体を含む樹脂組成物、硬化膜、及びその製造方法
JP2019031597A (ja) * 2017-08-07 2019-02-28 東レ株式会社 樹脂組成物、硬化膜、半導体装置および半導体装置の製造方法
JP2020024374A (ja) * 2018-04-23 2020-02-13 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法
JP2020026534A (ja) * 2018-08-16 2020-02-20 長興材料工業股▲ふん▼有限公司Eternal Materials Co.,Ltd. ポリイミドを調製するための方法
WO2020080207A1 (ja) * 2018-10-15 2020-04-23 日産化学株式会社 感光性絶縁膜組成物
JP2022021933A (ja) * 2020-07-22 2022-02-03 Hdマイクロシステムズ株式会社 感光性樹脂組成物、硬化物、パターン硬化物の製造方法、及び電子部品
JP2022021934A (ja) * 2020-07-22 2022-02-03 Hdマイクロシステムズ株式会社 感光性樹脂組成物、硬化物、パターン硬化物の製造方法、及び電子部品

Also Published As

Publication number Publication date
TW202239819A (zh) 2022-10-16
WO2022162895A1 (ja) 2022-08-04

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