JPWO2020080207A5 - - Google Patents
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- Publication number
- JPWO2020080207A5 JPWO2020080207A5 JP2020553100A JP2020553100A JPWO2020080207A5 JP WO2020080207 A5 JPWO2020080207 A5 JP WO2020080207A5 JP 2020553100 A JP2020553100 A JP 2020553100A JP 2020553100 A JP2020553100 A JP 2020553100A JP WO2020080207 A5 JPWO2020080207 A5 JP WO2020080207A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- photosensitive resin
- relief pattern
- isocyanate
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Isocyanate compound Chemical class 0.000 claims 5
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 239000011342 resin composition Substances 0.000 claims 5
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 3
- 239000012948 isocyanate Substances 0.000 claims 3
- 125000000962 organic group Chemical group 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- NEAQRZUHTPSBBM-UHFFFAOYSA-N 2-hydroxy-3,3-dimethyl-7-nitro-4h-isoquinolin-1-one Chemical compound C1=C([N+]([O-])=O)C=C2C(=O)N(O)C(C)(C)CC2=C1 NEAQRZUHTPSBBM-UHFFFAOYSA-N 0.000 claims 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 150000008064 anhydrides Chemical class 0.000 claims 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims 1
- 125000004112 carboxyamino group Chemical group [H]OC(=O)N([H])[*] 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims 1
- 125000005067 haloformyl group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000002513 isocyanates Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 claims 1
- 150000002923 oximes Chemical class 0.000 claims 1
- 125000004043 oxo group Chemical group O=* 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018194130 | 2018-10-15 | ||
| JP2018194130 | 2018-10-15 | ||
| PCT/JP2019/039734 WO2020080207A1 (ja) | 2018-10-15 | 2019-10-09 | 感光性絶縁膜組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020080207A1 JPWO2020080207A1 (ja) | 2021-10-07 |
| JPWO2020080207A5 true JPWO2020080207A5 (https=) | 2022-07-08 |
| JP7331860B2 JP7331860B2 (ja) | 2023-08-23 |
Family
ID=70283803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020553100A Active JP7331860B2 (ja) | 2018-10-15 | 2019-10-09 | 感光性絶縁膜組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7331860B2 (https=) |
| TW (1) | TW202028865A (https=) |
| WO (1) | WO2020080207A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7431241B2 (ja) * | 2019-07-29 | 2024-02-14 | 旭化成株式会社 | ネガ型感光性樹脂組成物、ポリイミドの製造方法、硬化レリーフパターンの製造方法、及び半導体装置 |
| JPWO2022162895A1 (https=) * | 2021-01-29 | 2022-08-04 | ||
| JP7683276B2 (ja) * | 2021-03-30 | 2025-05-27 | 味の素株式会社 | 感光性樹脂組成物 |
| JPWO2023106101A1 (https=) * | 2021-12-09 | 2023-06-15 | ||
| KR102803377B1 (ko) * | 2022-02-17 | 2025-05-02 | 아사히 가세이 가부시키가이샤 | 감광성 수지 조성물, 폴리이미드 경화막, 및 이들의 제조 방법 |
| EP4503100A4 (en) * | 2022-03-31 | 2026-03-18 | Nissan Chemical Corp | POLYMER FILM FORMING COMPOSITION AND SELECTIVE POLYMER FILM FORMING PROCESS |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5125747B2 (ja) * | 2007-05-25 | 2013-01-23 | 東レ株式会社 | 感光性樹脂組成物 |
| JP2010211095A (ja) * | 2009-03-12 | 2010-09-24 | Toray Ind Inc | 感光性カバーレイ |
| TWI440656B (zh) | 2009-11-16 | 2014-06-11 | Asahi Kasei E Materials Corp | A polyimide precursor and a photosensitive resin composition comprising the polyimide precursor |
| KR101913997B1 (ko) | 2009-12-04 | 2018-10-31 | 도레이 카부시키가이샤 | 감광성 수지 조성물, 그것을 이용한 적층체 및 고체 촬상 장치 |
| JP6782298B2 (ja) * | 2016-08-31 | 2020-11-11 | 富士フイルム株式会社 | 樹脂組成物およびその応用 |
-
2019
- 2019-10-09 JP JP2020553100A patent/JP7331860B2/ja active Active
- 2019-10-09 WO PCT/JP2019/039734 patent/WO2020080207A1/ja not_active Ceased
- 2019-10-09 TW TW108136533A patent/TW202028865A/zh unknown
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