JP7331318B2 - Oled表示基板、oled表示基板の製造方法及び表示装置 - Google Patents
Oled表示基板、oled表示基板の製造方法及び表示装置 Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims description 153
- 238000000034 method Methods 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000003990 capacitor Substances 0.000 claims description 248
- 239000010410 layer Substances 0.000 claims description 167
- 238000003860 storage Methods 0.000 claims description 108
- 229910052751 metal Inorganic materials 0.000 claims description 34
- 239000002184 metal Substances 0.000 claims description 34
- 238000002834 transmittance Methods 0.000 claims description 18
- 238000002161 passivation Methods 0.000 claims description 13
- 239000011229 interlayer Substances 0.000 claims description 11
- 239000004020 conductor Substances 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910016027 MoTi Inorganic materials 0.000 claims description 7
- 229910021389 graphene Inorganic materials 0.000 claims description 7
- 238000009413 insulation Methods 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 2
- 238000005468 ion implantation Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 53
- 229910052719 titanium Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000002950 deficient Effects 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 229910052779 Neodymium Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 229910052748 manganese Inorganic materials 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- 238000002207 thermal evaporation Methods 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229920001621 AMOLED Polymers 0.000 description 2
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Description
本出願は、2018年5月16日に中国特許庁に提出された中国特許出願201810469781.7の優先権を主張し、その全ての内容が援用により本出願に取り込まれる。
B 開口領域
21 ベース基板
22 遮光金属層
23 バッファ層
24 第1コンデンサ電極又は活性層
25 層間絶縁層
26 第2コンデンサ電極又は透明電極
27 パッシベーション層
28 第3コンデンサ電極又は陽極
サブステップS12において、前記第1コンデンサ電極上に位置する第1絶縁層を作製する。
サブステップS13において、前記第1絶縁層上に第2コンデンサ電極を作製する。
サブステップS14において、前記第2コンデンサ電極上に位置する第2絶縁層を作製する。
サブステップS15において、前記第2絶縁層上に、前記第1コンデンサ電極と電気的に接続される第3コンデンサ電極を作製する。
Claims (11)
- 有機発光ダイオードOLED表示基板であって、
ベース基板上にアレイ状に配置された複数の画素の開口領域と、
前記ベース基板上に位置する複数の蓄積コンデンサと、
データ書き込みトランジスタと、
駆動トランジスタと、
センシングトランジスタと、
第1ゲート電極及び第2ゲート電極と
を含み、
前記データ書き込みトランジスタは、前記駆動トランジスタに隣接し、前記データ書き込みトランジスタ及び前記センシングトランジスタは、前記駆動トランジスタの両側に位置し、且つ前記第1ゲート電極は前記第2ゲート電極と接続せず、
前記複数の蓄積コンデンサの各々の蓄積コンデンサの前記ベース基板における正投影と、前記複数の画素の開口領域のうち前記蓄積コンデンサに対応する開口領域の前記ベース基板における正投影とは、重なり領域を有し、
前記複数の蓄積コンデンサの各々の蓄積コンデンサの光透過率は、予め設定された閾値より大きく、
前記蓄積コンデンサの前記ベース基板における正投影は、前記開口領域の前記ベース基板における正投影内に収まり、
前記蓄積コンデンサは、第1コンデンサ電極と、前記第1コンデンサ電極上に設置された第1絶縁層と、前記第1絶縁層上に設置された第2コンデンサ電極と、前記第2コンデンサ電極上に設置された第2絶縁層と、前記第2絶縁層上に設置された第3コンデンサ電極とを含み、前記第3コンデンサ電極は、前記第1コンデンサ電極に電気的に接続され、
前記第1コンデンサ電極は、導体化された活性層であり、
前記第2コンデンサ電極は、透明電極であり、
前記第3コンデンサ電極は、前記OLED表示基板の陽極であり、
前記予め設定された閾値は、80%以上であり、
前記第1コンデンサ電極と前記第1絶縁層の間に位置するゲート絶縁層と、ゲートラインと、前記ゲート絶縁層を貫通するイオン注入用のビアホールを更に含む、
OLED表示基板。 - 前記透明電極は、ITO、グラフェン及びMoTiの中の一種を用いて作られる、請求項1に記載のOLED表示基板。
- 前記第1絶縁層は、層間絶縁層であり、
前記第2絶縁層は、パッシベーション層である、請求項1又は2に記載のOLED表示基板。 - 前記第2コンデンサ電極と同一層に位置するソース電極と、ドレイン電極と、データラインとを更に含む、請求項1~3のいずれか一項に記載のOLED表示基板。
- 前記第1コンデンサ電極の下方に位置する遮光金属層と、
前記遮光金属層と前記第1コンデンサ電極の間に位置するバッファ層と
を更に含む、請求項1~4のいずれか一項に記載のOLED表示基板。 - 請求項1~5のいずれか一項に記載のOLED表示基板を含む表示装置。
- ベース基板上にアレイ状に配置された複数の画素の開口領域、データ書き込みトランジスタと、駆動トランジスタと、センシングトランジスタと、第1ゲート電極及び第2ゲート電極とを含み、前記データ書き込みトランジスタは、前記駆動トランジスタに隣接し、前記データ書き込みトランジスタ及び前記センシングトランジスタは、前記駆動トランジスタの両側に位置し、且つ前記第1ゲート電極は前記第2ゲート電極と接続しないOLED表示基板の製造方法であって、
前記ベース基板上に光透過率が予め設定された閾値より大きい複数の蓄積コンデンサを作製することを含み、
前記複数の蓄積コンデンサの各々の蓄積コンデンサの前記ベース基板における正投影と、前記複数の画素の開口領域のうち前記蓄積コンデンサに対応する開口領域の前記ベース基板における正投影とは、重なり領域を有し、前記蓄積コンデンサの前記ベース基板における正投影は、前記開口領域の前記ベース基板における正投影内に収まり、
前記ベース基板上に光透過率が予め設定された閾値より大きい複数の蓄積コンデンサを作製することは、
前記ベース基板上に第1コンデンサ電極を作製することと、
前記第1コンデンサ電極上に位置する第1絶縁層を作製することと、
前記第1絶縁層上に第2コンデンサ電極を作製することと、
前記第2コンデンサ電極上に位置する第2絶縁層を作製することと、
前記第2絶縁層上に、前記第1コンデンサ電極と電気的に接続される第3コンデンサ電極を作製することと
を含み、
前記第1コンデンサ電極を作製することは、導体化された活性層を用いて前記第1コンデンサ電極を作製することを含み、
前記第2コンデンサ電極を作製することは、透明導電材料を用いて前記第2コンデンサ電極を作製することを含み、
前記第3コンデンサ電極を作製することは、前記第3コンデンサ電極として前記OLED表示基板の陽極を用いることを含み、
前記予め設定された閾値は、80%以上であり、
前記ベース基板上に前記第1コンデンサ電極を作製した後であって、前記第1コンデンサ電極上に位置する第1絶縁層を作製する前に、
前記第1コンデンサ電極上に位置するゲート絶縁層と、ゲート電極と、ゲートラインとを作製することを更に含み、
前記第1コンデンサ電極上に位置するゲート絶縁層と、ゲート電極と、ゲートラインとを作成した後、導体化された活性層を用いて前記第1コンデンサ電極を作製することは、
前記ゲート絶縁層を貫通するビアホールを形成するように前記ゲート絶縁層をパターンニングすることと、
前記ビアホールを介して前記活性層の導体化すべき部分に対してイオン注入を行って、前記第1コンデンサ電極として、導体化された活性層を形成することとを含む、
OLED表示基板の製造方法。 - 前記透明導電材料は、ITO、グラフェン及びMoTiの中の一種を用いて作られる、請求項7に記載のOLED表示基板の製造方法。
- 前記第1コンデンサ電極上に位置する第1絶縁層を作製することは、前記第1コンデンサ電極上に位置する層間絶縁層を作製することを含み、
前記第2コンデンサ電極上に位置する第2絶縁層を作製することは、前記第2コンデンサ電極上に位置するパッシベーション層を作製することを含む、請求項7又は8に記載のOLED表示基板の製造方法。 - 前記第1絶縁層上に前記第2コンデンサ電極を作製した後であって、前記第2コンデンサ電極上に位置する第2絶縁層を作製する前に、
前記第2コンデンサ電極の所在する層にソース電極と、ドレイン電極と、データラインとを作製することを更に含む、請求項7又は8に記載のOLED表示基板の製造方法。 - 前記ベース基板上に第1コンデンサ電極を作製する前に、
前記ベース基板上に遮光金属層を作製することと、
前記遮光金属層上にバッファ層を作製することと
を更に含む、請求項7又は8に記載のOLED表示基板の製造方法。
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