JP7301075B2 - リモートプラズマ源用のラジカル出力モニタ及びその使用方法 - Google Patents

リモートプラズマ源用のラジカル出力モニタ及びその使用方法 Download PDF

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Publication number
JP7301075B2
JP7301075B2 JP2020568979A JP2020568979A JP7301075B2 JP 7301075 B2 JP7301075 B2 JP 7301075B2 JP 2020568979 A JP2020568979 A JP 2020568979A JP 2020568979 A JP2020568979 A JP 2020568979A JP 7301075 B2 JP7301075 B2 JP 7301075B2
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plasma source
gas
plasma
thermal sensor
temperature
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Japanese (ja)
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JPWO2019241405A5 (https=
JP2021530076A5 (https=
JP2021530076A (ja
Inventor
ハリス，マイケル
タイ，チウヤン
グプタ，アトゥル
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MKS Inc
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MKS Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0068—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by thermal means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32954—Electron temperature measurement

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP2020568979A 2018-06-14 2019-06-12 リモートプラズマ源用のラジカル出力モニタ及びその使用方法 Active JP7301075B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862684820P 2018-06-14 2018-06-14
US62/684,820 2018-06-14
PCT/US2019/036796 WO2019241405A1 (en) 2018-06-14 2019-06-12 Radical output monitor for a remote plasma source and method of use

Publications (4)

Publication Number Publication Date
JP2021530076A JP2021530076A (ja) 2021-11-04
JPWO2019241405A5 JPWO2019241405A5 (https=) 2022-06-27
JP2021530076A5 JP2021530076A5 (https=) 2022-06-27
JP7301075B2 true JP7301075B2 (ja) 2023-06-30

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JP2020568979A Active JP7301075B2 (ja) 2018-06-14 2019-06-12 リモートプラズマ源用のラジカル出力モニタ及びその使用方法

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US (1) US11114287B2 (https=)
EP (1) EP3785494B8 (https=)
JP (1) JP7301075B2 (https=)
KR (1) KR102697703B1 (https=)
CN (1) CN112335342B (https=)
SG (1) SG11202011069RA (https=)
TW (1) TWI809122B (https=)
WO (1) WO2019241405A1 (https=)

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SG11201912566WA (en) 2017-06-27 2020-01-30 Canon Anelva Corp Plasma processing apparatus
KR102257134B1 (ko) 2017-06-27 2021-05-26 캐논 아네르바 가부시키가이샤 플라스마 처리 장치
TWI745813B (zh) 2017-06-27 2021-11-11 日商佳能安內華股份有限公司 電漿處理裝置
EP3648551B1 (en) 2017-06-27 2021-08-18 Canon Anelva Corporation Plasma treatment device
CN112292911A (zh) * 2018-06-26 2021-01-29 佳能安内华股份有限公司 等离子体处理装置、等离子体处理方法、程序和存储介质
CN115900990A (zh) * 2023-01-03 2023-04-04 大连理工大学 用于七通道级联弧等离子体源的温度监测系统
CN120264567B (zh) * 2025-04-29 2026-04-21 江苏神州半导体科技股份有限公司 一种远程等离子发生器
CN120870230A (zh) * 2025-09-24 2025-10-31 江苏神州半导体科技有限公司 一种远程等离子体源解离率监测装置及监测方法

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Also Published As

Publication number Publication date
KR102697703B1 (ko) 2024-08-23
EP3785494A4 (en) 2022-01-26
TW202017074A (zh) 2020-05-01
KR20210009428A (ko) 2021-01-26
EP3785494B1 (en) 2026-02-18
WO2019241405A1 (en) 2019-12-19
TWI809122B (zh) 2023-07-21
EP3785494A1 (en) 2021-03-03
US11114287B2 (en) 2021-09-07
EP3785494B8 (en) 2026-04-01
CN112335342B (zh) 2023-07-14
US20190385829A1 (en) 2019-12-19
JP2021530076A (ja) 2021-11-04
SG11202011069RA (en) 2020-12-30
CN112335342A (zh) 2021-02-05

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