JP7222666B2 - 多層基板 - Google Patents
多層基板 Download PDFInfo
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- JP7222666B2 JP7222666B2 JP2018214108A JP2018214108A JP7222666B2 JP 7222666 B2 JP7222666 B2 JP 7222666B2 JP 2018214108 A JP2018214108 A JP 2018214108A JP 2018214108 A JP2018214108 A JP 2018214108A JP 7222666 B2 JP7222666 B2 JP 7222666B2
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- Prior art keywords
- conductive layer
- layer
- multilayer substrate
- brittle material
- glass
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/426—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4061—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in inorganic insulating substrates
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Laminated Bodies (AREA)
Description
先ず、第1の実施形態について説明する。図1は、第1の実施形態に係る多層基板を示す断面図である。
次に、第2の実施形態について説明する。図8は、第2の実施形態に係る多層基板を示す断面図である。
第3の実施形態は、多層基板を含む半導体装置に関する。図10は、第3の実施形態に係る半導体装置を示す平面図である。図11は、第3の実施形態に係る半導体装置に含まれる多層基板を示す断面図である。
板厚方向に積層された複数の脆性材料板と、
隣り合う前記脆性材料板の間に設けられた樹脂層及び内部導電層と、
前記複数の脆性材料板のうち、前記板厚方向の両端に位置する脆性材料板の外面に設けられた外部導電層と、
を有し、
前記内部導電層及び前記外部導電層の合計厚さは、前記脆性材料板の合計厚さの25%以下であることを特徴とする多層基板。
(付記2)
前記内部導電層及び前記外部導電層の合計厚さは、前記脆性材料板の合計厚さの20%以下であることを特徴とする付記1に記載の多層基板。
(付記3)
前記脆性材料板の弾性率が80GPa以下であることを特徴とする付記1又は2に記載の多層基板。
(付記4)
前記脆性材料板を10以上含むことを特徴とする付記1乃至3のいずれか1項に記載の多層基板。
(付記5)
前記脆性材料板はガラス板であることを特徴とする付記1乃至4のいずれか1項に記載の多層基板。
(付記6)
前記多層基板の一部の層において、前記複数の脆性材料板と、隣り合う前記脆性材料板の間に設けられた樹脂層及び内部導電層とが、積層されていることを特徴とする付記1乃至5のいずれか1項に記載の多層基板。
101:脆性材料板
113A、213A、313A:内部導電層
113B、213B、313B:外部導電層
121、221、321:樹脂層
201、301:ガラス板
Claims (2)
- 板厚方向に積層された複数のガラス板と、
隣り合う前記ガラス板の間に設けられた樹脂層及び内部導電層と、
前記複数のガラス板のうち、前記板厚方向の両端に位置するガラス板の外面に設けられた外部導電層と、
を有し、
前記ガラス板の最大内部応力を49MPa以下にするために、
前記ガラス板を10以上含み、
前記内部導電層及び前記外部導電層の合計厚さは、前記ガラス板の合計厚さの25%以下であって、
前記ガラス板の弾性率が80GPa以下であることを特徴とする多層基板。 - 前記多層基板の一部の層において、前記複数のガラス板と、隣り合う前記ガラス板の間に設けられた樹脂層及び内部導電層とが、積層されていることを特徴とする請求項1記載の多層基板。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018214108A JP7222666B2 (ja) | 2018-11-14 | 2018-11-14 | 多層基板 |
US16/662,440 US11152291B2 (en) | 2018-11-14 | 2019-10-24 | Multilayer substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018214108A JP7222666B2 (ja) | 2018-11-14 | 2018-11-14 | 多層基板 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2020087938A JP2020087938A (ja) | 2020-06-04 |
JP2020087938A5 JP2020087938A5 (ja) | 2021-04-30 |
JP7222666B2 true JP7222666B2 (ja) | 2023-02-15 |
Family
ID=70550829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018214108A Active JP7222666B2 (ja) | 2018-11-14 | 2018-11-14 | 多層基板 |
Country Status (2)
Country | Link |
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US (1) | US11152291B2 (ja) |
JP (1) | JP7222666B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230102183A1 (en) * | 2021-09-29 | 2023-03-30 | Advanced Micro Devices, Inc. | Glass core package substrates |
US20230207406A1 (en) * | 2021-12-24 | 2023-06-29 | Intel Corporation | Ultra low loss and high-density routing between cores |
WO2023189540A1 (ja) * | 2022-03-30 | 2023-10-05 | ソニーセミコンダクタソリューションズ株式会社 | ガラス配線基板及びその製造方法、撮像装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001267746A (ja) | 2000-03-17 | 2001-09-28 | Hitachi Ltd | 多層配線基板 |
JP2015012013A (ja) | 2013-06-26 | 2015-01-19 | 京セラ株式会社 | 多層配線基板およびそれを備えたプローブカード用基板 |
JP2017107934A (ja) | 2015-12-08 | 2017-06-15 | 富士通株式会社 | 回路基板、電子機器、及び回路基板の製造方法 |
JP2018148126A (ja) | 2017-03-08 | 2018-09-20 | 日本特殊陶業株式会社 | 配線基板、及び配線基板の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216598A (ja) * | 1985-07-15 | 1987-01-24 | 富士通株式会社 | 多層セラミツク回路基板の接続ピン形成方法 |
JPH02142198A (ja) * | 1988-11-22 | 1990-05-31 | Matsushita Electric Works Ltd | セラミック多層配線板の製造方法 |
CN102822962B (zh) | 2010-03-31 | 2015-12-09 | 京瓷株式会社 | 内插件及使用了该内插件的电子装置 |
US20130180769A1 (en) * | 2011-09-22 | 2013-07-18 | Hitachi Chemical Company, Ltd. | Laminate body, laminate plate, multilayer laminate plate, printed wiring board, and method for manufacture of laminate plate |
US20130112459A1 (en) | 2011-09-22 | 2013-05-09 | Hitachi Chemical Company, Ltd. | Laminate body, laminate plate, multilayer laminate plate, printed wiring board, and method for manufacture of laminate plate |
WO2013042750A1 (ja) | 2011-09-22 | 2013-03-28 | 日立化成株式会社 | 積層体、積層板、多層積層板、プリント配線板及び積層板の製造方法 |
JP2019079856A (ja) * | 2017-10-20 | 2019-05-23 | トヨタ自動車株式会社 | 多層基板の製造方法 |
JP2019140226A (ja) * | 2018-02-09 | 2019-08-22 | 富士通株式会社 | 回路基板、回路基板の製造方法及び電子装置 |
-
2018
- 2018-11-14 JP JP2018214108A patent/JP7222666B2/ja active Active
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2019
- 2019-10-24 US US16/662,440 patent/US11152291B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001267746A (ja) | 2000-03-17 | 2001-09-28 | Hitachi Ltd | 多層配線基板 |
JP2015012013A (ja) | 2013-06-26 | 2015-01-19 | 京セラ株式会社 | 多層配線基板およびそれを備えたプローブカード用基板 |
JP2017107934A (ja) | 2015-12-08 | 2017-06-15 | 富士通株式会社 | 回路基板、電子機器、及び回路基板の製造方法 |
JP2018148126A (ja) | 2017-03-08 | 2018-09-20 | 日本特殊陶業株式会社 | 配線基板、及び配線基板の製造方法 |
Also Published As
Publication number | Publication date |
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US20200152562A1 (en) | 2020-05-14 |
US11152291B2 (en) | 2021-10-19 |
JP2020087938A (ja) | 2020-06-04 |
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