JP7207612B2 - 半導体モジュールのケース及び半導体モジュールのケースの製造方法 - Google Patents
半導体モジュールのケース及び半導体モジュールのケースの製造方法 Download PDFInfo
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- JP7207612B2 JP7207612B2 JP2022533699A JP2022533699A JP7207612B2 JP 7207612 B2 JP7207612 B2 JP 7207612B2 JP 2022533699 A JP2022533699 A JP 2022533699A JP 2022533699 A JP2022533699 A JP 2022533699A JP 7207612 B2 JP7207612 B2 JP 7207612B2
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- H01L2924/1304—Transistor
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- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Description
(1)ケースの材料である樹脂ペレットが成型機のシリンダ内に供給される。
(2)シリンダ内で樹脂が加温されることにより、樹脂は可塑化(溶融化)する。
(3)シリンダ内のスクリューが回転されることにより、樹脂が高温・高圧の状態で金型内に射出される。
(4)樹脂は、金型内で加圧、冷却、固化され、その後、金型を開いてエジェクタピンなどによって成型品が取り出される。
(5)成型品の不要部分(樹脂流路部分等)をカットして製品を得る。
上記実施の形態に記載の半導体モジュールのケースは、半導体素子を収容し、下方が開口された箱型で射出成型により形成された半導体モジュールのケースであって、平面視矩形状を有し、上面又は側面に外部端子が配置され、前記外部端子は、前記ケースの内側で前記半導体素子と電気的に接続され、前記ケースの内側と外側を貫通しており、矩形状の短辺に対応する一側面に樹脂の入口である単一の第1ゲート部を備え、前記第1ゲート部は、前記ケースの幅方向に長い扁平形状を有する。
Claims (12)
- 半導体素子を収容し、下方が開口された箱型で射出成型により形成された半導体モジュールのケースであって、
平面視矩形状を有し、上面又は側面に外部端子が配置され、
前記外部端子は、前記ケースの内側で前記半導体素子と電気的に接続され、前記ケースの内側と外側を貫通しており、
矩形状の短辺に対応する一側面に樹脂の入口である単一の第1ゲート部を備え、
前記第1ゲート部は、前記ケースの幅方向に長い扁平形状を有する、半導体モジュールのケース。 - 前記矩形状の一端側に主端子が配置され、他端側に制御端子が配置され、
前記第1ゲート部は、前記他端側の一側面に配置されている、請求項1に記載の半導体モジュールのケース。 - 前記矩形状の長辺に対応する側面に、長手方向に沿って複数の溝部が形成されている、請求項1又は請求項2に記載の半導体モジュールのケース。
- 前記第1ゲート部の厚みは、前記第1ゲート部の幅の1/100倍以上、1/10倍以下である、請求項1から請求項3のいずれかに記載の半導体モジュールのケース。
- 前記樹脂は、フィラーが添加されたポリアミド樹脂で形成されている、請求項1から請求項4のいずれかに記載の半導体モジュールのケース。
- 前記第1ゲート部は、前記ケースの下縁部に設けられている、請求項1から請求項5のいずれかに記載の半導体モジュールのケース。
- 前記ケースの下縁部に、下方へ突出する突起部を有し、
前記第1ゲート部は、前記突起部よりも上方に形成されている、請求項6に記載の半導体モジュールのケース。 - 前記矩形状の一端側に位置する一側面に前記樹脂の出口である単一の第2ゲート部を更に備え、
前記第2ゲート部は、前記ケースの幅方向に長い扁平形状を有している、請求項1から請求項7のいずれかに記載の半導体モジュールのケース。 - 前記第2ゲート部は、前記第1ゲート部に対して対称位置に設けられている、請求項8に記載の半導体モジュールのケース。
- 請求項1から請求項9のいずれかに記載の半導体モジュールのケースの製造方法であって、
前記第1ゲート部を通じて金型内に樹脂を充填する工程と、
前記ケースに連なった樹脂流路部分を除去する工程と、を備え、
前記樹脂流路部分は、前記第1ゲート部に連なって前記樹脂の通路を形成するランナー部を有し、
前記ランナー部は、前記ケースの幅方向に長いフィルム形状を有し、前記第1ゲート部側に向かうにしたがって厚みが小さくなるように傾斜している、半導体モジュールのケースの製造方法。 - 前記ランナー部の傾斜角は、10度以上、30度以下である、請求項10に記載の半導体モジュールのケースの製造方法。
- 前記矩形状の一端側に位置する一側面に前記樹脂の出口である単一の第2ゲート部が設けられており、
前記第2ゲート部は、前記ケースの幅方向に長い扁平形状を有し、
前記樹脂流路部分は、前記第2ゲート部に連なって前記樹脂の通路を形成する他のランナー部を含み、
前記他のランナー部は、前記ケースの幅方向に長いフィルム形状を有し、前記第2ゲート部側に向かうにしたがって厚みが小さくなるように傾斜しており、前記ランナー部よりも短い、請求項10又は請求項11に記載の半導体モジュールのケースの製造方法。
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PCT/JP2021/016399 WO2022004104A1 (ja) | 2020-06-29 | 2021-04-23 | 半導体モジュールのケース及び半導体モジュールのケースの製造方法 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005319708A (ja) | 2004-05-10 | 2005-11-17 | Murata Mfg Co Ltd | 筐体ケースおよびその筐体ケース成型用の金型 |
JP2006093255A (ja) | 2004-09-22 | 2006-04-06 | Fuji Electric Device Technology Co Ltd | パワー半導体モジュールおよびその製造方法 |
JP2006256311A (ja) | 2005-02-15 | 2006-09-28 | Sumitomo Chemical Co Ltd | 固体撮像素子収納ケース用樹脂製蓋材及びその製造方法 |
JP2007069602A (ja) | 2005-08-08 | 2007-03-22 | Sumitomo Chemical Co Ltd | 固体撮像素子収納用ケース、その製造方法、及び、固体撮像装置 |
WO2013145619A1 (ja) | 2012-03-28 | 2013-10-03 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2017094589A (ja) | 2015-11-24 | 2017-06-01 | マツダ株式会社 | 樹脂成形品の成形方法及び当該成形に用いる一次成形品 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03290217A (ja) * | 1990-03-15 | 1991-12-19 | Fujitsu Miyagi Electron:Kk | 樹脂封止用金型装置 |
JPH04267115A (ja) | 1991-02-21 | 1992-09-22 | Nissan Motor Co Ltd | 射出成形装置 |
JP3236597B2 (ja) | 1992-04-15 | 2001-12-10 | 大日本印刷株式会社 | Icカード用カード基材の製造方法及び製造用金型 |
JPH05293846A (ja) * | 1992-04-20 | 1993-11-09 | Hitachi Ltd | 成形装置 |
US5409362A (en) * | 1992-11-24 | 1995-04-25 | Neu Dynamics Corp. | Encapsulation molding equipment |
JPH08197564A (ja) | 1995-01-26 | 1996-08-06 | Hitachi Ltd | 射出成形品 |
CN104205322B (zh) * | 2012-03-29 | 2017-03-15 | 住友化学株式会社 | 中空成形体的制造方法、中空成形体及制造装置 |
JP2014171440A (ja) | 2013-03-11 | 2014-09-22 | Menicon Co Ltd | 細胞培養容器の製造方法 |
US11198784B2 (en) * | 2016-05-02 | 2021-12-14 | Sumitomo Chemical Company, Limited | Resin composition |
JP6768569B2 (ja) * | 2017-03-21 | 2020-10-14 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
JP7300268B2 (ja) | 2019-01-10 | 2023-06-29 | 株式会社シマノ | 人力駆動車用のリム |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005319708A (ja) | 2004-05-10 | 2005-11-17 | Murata Mfg Co Ltd | 筐体ケースおよびその筐体ケース成型用の金型 |
JP2006093255A (ja) | 2004-09-22 | 2006-04-06 | Fuji Electric Device Technology Co Ltd | パワー半導体モジュールおよびその製造方法 |
JP2006256311A (ja) | 2005-02-15 | 2006-09-28 | Sumitomo Chemical Co Ltd | 固体撮像素子収納ケース用樹脂製蓋材及びその製造方法 |
JP2007069602A (ja) | 2005-08-08 | 2007-03-22 | Sumitomo Chemical Co Ltd | 固体撮像素子収納用ケース、その製造方法、及び、固体撮像装置 |
WO2013145619A1 (ja) | 2012-03-28 | 2013-10-03 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
JP2017094589A (ja) | 2015-11-24 | 2017-06-01 | マツダ株式会社 | 樹脂成形品の成形方法及び当該成形に用いる一次成形品 |
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