JP7204436B2 - 欠陥除去方法及びＳｉＣエピタキシャルウェハの製造方法 - Google Patents
欠陥除去方法及びＳｉＣエピタキシャルウェハの製造方法 Download PDFInfo
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- JP7204436B2 JP7204436B2 JP2018215724A JP2018215724A JP7204436B2 JP 7204436 B2 JP7204436 B2 JP 7204436B2 JP 2018215724 A JP2018215724 A JP 2018215724A JP 2018215724 A JP2018215724 A JP 2018215724A JP 7204436 B2 JP7204436 B2 JP 7204436B2
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| Application Number | Priority Date | Filing Date | Title |
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| JP2018215724A JP7204436B2 (ja) | 2018-11-16 | 2018-11-16 | 欠陥除去方法及びＳｉＣエピタキシャルウェハの製造方法 |
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| JP2018215724A JP7204436B2 (ja) | 2018-11-16 | 2018-11-16 | 欠陥除去方法及びＳｉＣエピタキシャルウェハの製造方法 |
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| JP2020083671A JP2020083671A (ja) | 2020-06-04 |
| JP2020083671A5 JP2020083671A5 (enExample) | 2021-12-23 |
| JP7204436B2 true JP7204436B2 (ja) | 2023-01-16 |
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| JP2018215724A Active JP7204436B2 (ja) | 2018-11-16 | 2018-11-16 | 欠陥除去方法及びＳｉＣエピタキシャルウェハの製造方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPWO2022004181A1 (enExample) * | 2020-07-02 | 2022-01-06 | ||
| WO2022190458A1 (ja) * | 2021-03-12 | 2022-09-15 | 住友電気工業株式会社 | 炭化珪素基板および炭化珪素基板の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011211035A (ja) | 2010-03-30 | 2011-10-20 | Lasertec Corp | 検査装置並びに欠陥分類方法及び欠陥検出方法 |
| JP2018041942A (ja) | 2016-08-31 | 2018-03-15 | 昭和電工株式会社 | ＳｉＣエピタキシャルウェハ及びその製造方法、並びに、欠陥識別方法 |
| JP2018039714A (ja) | 2016-08-31 | 2018-03-15 | 昭和電工株式会社 | ＳｉＣエピタキシャルウェハ及びその製造方法、並びに、ラージピット欠陥検出方法、欠陥識別方法 |
| JP2018098394A (ja) | 2016-12-14 | 2018-06-21 | 昭和電工株式会社 | 半導体ウェハの評価方法 |
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- 2018-11-16 JP JP2018215724A patent/JP7204436B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011211035A (ja) | 2010-03-30 | 2011-10-20 | Lasertec Corp | 検査装置並びに欠陥分類方法及び欠陥検出方法 |
| JP2018041942A (ja) | 2016-08-31 | 2018-03-15 | 昭和電工株式会社 | ＳｉＣエピタキシャルウェハ及びその製造方法、並びに、欠陥識別方法 |
| JP2018039714A (ja) | 2016-08-31 | 2018-03-15 | 昭和電工株式会社 | ＳｉＣエピタキシャルウェハ及びその製造方法、並びに、ラージピット欠陥検出方法、欠陥識別方法 |
| JP2018098394A (ja) | 2016-12-14 | 2018-06-21 | 昭和電工株式会社 | 半導体ウェハの評価方法 |
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