JP7185510B2 - 中心検出方法 - Google Patents
中心検出方法 Download PDFInfo
- Publication number
- JP7185510B2 JP7185510B2 JP2018228008A JP2018228008A JP7185510B2 JP 7185510 B2 JP7185510 B2 JP 7185510B2 JP 2018228008 A JP2018228008 A JP 2018228008A JP 2018228008 A JP2018228008 A JP 2018228008A JP 7185510 B2 JP7185510 B2 JP 7185510B2
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- JP
- Japan
- Prior art keywords
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018228008A JP7185510B2 (ja) | 2018-12-05 | 2018-12-05 | 中心検出方法 |
KR1020190153532A KR20200068584A (ko) | 2018-12-05 | 2019-11-26 | 중심 검출 방법 |
CN201911218257.3A CN111276412B (zh) | 2018-12-05 | 2019-12-03 | 中心检测方法 |
TW108144330A TWI824071B (zh) | 2018-12-05 | 2019-12-04 | 中心檢測方法 |
DE102019218969.5A DE102019218969A1 (de) | 2018-12-05 | 2019-12-05 | Zentrumsdetektionsverfahren |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018228008A JP7185510B2 (ja) | 2018-12-05 | 2018-12-05 | 中心検出方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020091177A JP2020091177A (ja) | 2020-06-11 |
JP7185510B2 true JP7185510B2 (ja) | 2022-12-07 |
Family
ID=70776525
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018228008A Active JP7185510B2 (ja) | 2018-12-05 | 2018-12-05 | 中心検出方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7185510B2 (ko) |
KR (1) | KR20200068584A (ko) |
CN (1) | CN111276412B (ko) |
DE (1) | DE102019218969A1 (ko) |
TW (1) | TWI824071B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112539714B (zh) * | 2020-06-30 | 2022-07-26 | 深圳中科飞测科技股份有限公司 | 一种偏心检测方法、检测方法、处理方法及检测设备 |
CN112767363B (zh) * | 2021-01-22 | 2023-03-14 | 电子科技大学 | 一种对线图进行目标检测的方法 |
CN114628299B (zh) * | 2022-03-16 | 2023-03-24 | 江苏京创先进电子科技有限公司 | 晶圆对中确认方法及太鼓环切割方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002148019A (ja) | 2000-11-07 | 2002-05-22 | Yaskawa Electric Corp | ウエハのエッジ位置検出方法およびその方法を実行させるプログラムを記録したコンピュータ読み取り可能な記録媒体ならびにウエハのエッジ位置検出装置。 |
JP2005268530A (ja) | 2004-03-18 | 2005-09-29 | Olympus Corp | 半導体ウエハのアライメント装置 |
JP2015133371A (ja) | 2014-01-10 | 2015-07-23 | 株式会社ディスコ | マーク検出方法 |
JP2018028713A (ja) | 2016-08-15 | 2018-02-22 | Jfeスチール株式会社 | 二次元画像のエッジ抽出方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08149522A (ja) * | 1994-09-20 | 1996-06-07 | Matsushita Electric Ind Co Ltd | 位置検出装置及び画像補正装置 |
JP2006093333A (ja) | 2004-09-22 | 2006-04-06 | Disco Abrasive Syst Ltd | 切削方法 |
US20090304258A1 (en) * | 2005-12-06 | 2009-12-10 | Yoshinori Hayashi | Visual Inspection System |
US20090116727A1 (en) * | 2006-05-02 | 2009-05-07 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Defects Detection |
TWI429002B (zh) * | 2007-02-23 | 2014-03-01 | Rudolph Technologies Inc | 包含邊緣球狀物移除處理的晶圓製造監視系統與方法 |
JP5360403B2 (ja) * | 2009-09-29 | 2013-12-04 | サクサ株式会社 | 移動体撮像装置 |
JP5486405B2 (ja) | 2010-05-27 | 2014-05-07 | 株式会社ディスコ | ウェーハの中心位置検出方法 |
JP6174980B2 (ja) | 2013-11-22 | 2017-08-02 | 株式会社ディスコ | ウェーハの検出方法 |
US9734568B2 (en) * | 2014-02-25 | 2017-08-15 | Kla-Tencor Corporation | Automated inline inspection and metrology using shadow-gram images |
-
2018
- 2018-12-05 JP JP2018228008A patent/JP7185510B2/ja active Active
-
2019
- 2019-11-26 KR KR1020190153532A patent/KR20200068584A/ko unknown
- 2019-12-03 CN CN201911218257.3A patent/CN111276412B/zh active Active
- 2019-12-04 TW TW108144330A patent/TWI824071B/zh active
- 2019-12-05 DE DE102019218969.5A patent/DE102019218969A1/de active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002148019A (ja) | 2000-11-07 | 2002-05-22 | Yaskawa Electric Corp | ウエハのエッジ位置検出方法およびその方法を実行させるプログラムを記録したコンピュータ読み取り可能な記録媒体ならびにウエハのエッジ位置検出装置。 |
JP2005268530A (ja) | 2004-03-18 | 2005-09-29 | Olympus Corp | 半導体ウエハのアライメント装置 |
JP2015133371A (ja) | 2014-01-10 | 2015-07-23 | 株式会社ディスコ | マーク検出方法 |
JP2018028713A (ja) | 2016-08-15 | 2018-02-22 | Jfeスチール株式会社 | 二次元画像のエッジ抽出方法 |
Also Published As
Publication number | Publication date |
---|---|
CN111276412A (zh) | 2020-06-12 |
JP2020091177A (ja) | 2020-06-11 |
TW202022313A (zh) | 2020-06-16 |
CN111276412B (zh) | 2024-06-07 |
DE102019218969A1 (de) | 2020-06-10 |
TWI824071B (zh) | 2023-12-01 |
KR20200068584A (ko) | 2020-06-15 |
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