JP7162799B2 - 複合被膜および複合被膜の形成方法 - Google Patents

複合被膜および複合被膜の形成方法 Download PDF

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Publication number
JP7162799B2
JP7162799B2 JP2018041398A JP2018041398A JP7162799B2 JP 7162799 B2 JP7162799 B2 JP 7162799B2 JP 2018041398 A JP2018041398 A JP 2018041398A JP 2018041398 A JP2018041398 A JP 2018041398A JP 7162799 B2 JP7162799 B2 JP 7162799B2
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Prior art keywords
hard carbon
layer
film
carbon film
composite coating
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JP2018041398A
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Japanese (ja)
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JP2019157156A (ja
Inventor
慎也 藤井
秀樹 森口
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Nippon ITF Inc
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Nippon ITF Inc
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Priority to JP2018041398A priority Critical patent/JP7162799B2/ja
Priority to CN201980016129.2A priority patent/CN111788328B/zh
Priority to PCT/JP2019/008891 priority patent/WO2019172321A1/fr
Publication of JP2019157156A publication Critical patent/JP2019157156A/ja
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Publication of JP7162799B2 publication Critical patent/JP7162799B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2018041398A 2018-03-08 2018-03-08 複合被膜および複合被膜の形成方法 Active JP7162799B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018041398A JP7162799B2 (ja) 2018-03-08 2018-03-08 複合被膜および複合被膜の形成方法
CN201980016129.2A CN111788328B (zh) 2018-03-08 2019-03-06 复合被膜及复合被膜的形成方法
PCT/JP2019/008891 WO2019172321A1 (fr) 2018-03-08 2019-03-06 Revêtement composite et procédé de formation d'un revêtement composite

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018041398A JP7162799B2 (ja) 2018-03-08 2018-03-08 複合被膜および複合被膜の形成方法

Publications (2)

Publication Number Publication Date
JP2019157156A JP2019157156A (ja) 2019-09-19
JP7162799B2 true JP7162799B2 (ja) 2022-10-31

Family

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Family Applications (1)

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JP2018041398A Active JP7162799B2 (ja) 2018-03-08 2018-03-08 複合被膜および複合被膜の形成方法

Country Status (3)

Country Link
JP (1) JP7162799B2 (fr)
CN (1) CN111788328B (fr)
WO (1) WO2019172321A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7431150B2 (ja) * 2020-12-21 2024-02-14 トヨタ自動車株式会社 被膜及び被膜を有する複合材料
WO2024063157A1 (fr) * 2022-09-22 2024-03-28 日本ピストンリング株式会社 Élément coulissant, son procédé de fabrication et film de revêtement

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000128516A (ja) 1998-10-30 2000-05-09 Riken Corp 低摩耗性と優れた密着性を有する複合ダイヤモンドライクカーボン皮膜
JP2003027214A (ja) 2001-07-17 2003-01-29 Sumitomo Electric Ind Ltd 非晶質炭素被膜と非晶質炭素被膜の製造方法および非晶質炭素被膜の被覆部材
JP2005264221A (ja) 2004-03-18 2005-09-29 Toyota Motor Corp 摺動部材
JP2005342834A (ja) 2004-06-03 2005-12-15 Mitsubishi Materials Corp プラズマｃｖｄ成膜のダイヤモンド状炭素被膜がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具
JP2009504919A (ja) 2005-08-18 2009-02-05 ナムローゼ・フェンノートシャップ・ベーカート・ソシエテ・アノニム 四面体炭素膜を備える層状構造体により被覆した基板
WO2016042629A1 (fr) 2014-09-17 2016-03-24 日本アイ・ティ・エフ株式会社 Film de revêtement, son procédé de fabrication, et dispositif de dépôt physique en phase vapeur
WO2017026043A1 (fr) 2015-08-10 2017-02-16 日本アイ・ティ・エフ株式会社 Segment de piston et son procédé de fabrication
WO2017130587A1 (fr) 2016-01-25 2017-08-03 株式会社リケン Élément de coulissement et son procédé de fabrication
JP2017171988A (ja) 2016-03-23 2017-09-28 日本アイ・ティ・エフ株式会社 被覆膜とその製造方法およびｐｖｄ装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4988421A (en) * 1989-01-12 1991-01-29 Ford Motor Company Method of toughening diamond coated tools
US7947372B2 (en) * 2005-08-18 2011-05-24 Sulzer Metaplas Gmbh Substrate coated with a layered structure comprising a tetrahedral carbon layer and a softer outer layer
CN101728449A (zh) * 2008-10-31 2010-06-09 宋健民 类钻碳电子装置及其制造方法
EP2587518B1 (fr) * 2011-10-31 2018-12-19 IHI Hauzer Techno Coating B.V. Appareil et procédé de dépôt de couches ta C dépourvues d'hydrogène sur des pièces de travail et pièces
EP3239349B1 (fr) * 2016-04-26 2022-06-22 IHI Ionbond AG Couche de carbone résistant à l'usure semblable à un diamant tétrahédrique
WO2018155385A1 (fr) * 2017-02-21 2018-08-30 日本アイ・ティ・エフ株式会社 Film de carbone dur, son procédé de fabrication et élément coulissant

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000128516A (ja) 1998-10-30 2000-05-09 Riken Corp 低摩耗性と優れた密着性を有する複合ダイヤモンドライクカーボン皮膜
JP2003027214A (ja) 2001-07-17 2003-01-29 Sumitomo Electric Ind Ltd 非晶質炭素被膜と非晶質炭素被膜の製造方法および非晶質炭素被膜の被覆部材
JP2005264221A (ja) 2004-03-18 2005-09-29 Toyota Motor Corp 摺動部材
JP2005342834A (ja) 2004-06-03 2005-12-15 Mitsubishi Materials Corp プラズマｃｖｄ成膜のダイヤモンド状炭素被膜がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具
JP2009504919A (ja) 2005-08-18 2009-02-05 ナムローゼ・フェンノートシャップ・ベーカート・ソシエテ・アノニム 四面体炭素膜を備える層状構造体により被覆した基板
WO2016042629A1 (fr) 2014-09-17 2016-03-24 日本アイ・ティ・エフ株式会社 Film de revêtement, son procédé de fabrication, et dispositif de dépôt physique en phase vapeur
WO2017026043A1 (fr) 2015-08-10 2017-02-16 日本アイ・ティ・エフ株式会社 Segment de piston et son procédé de fabrication
WO2017130587A1 (fr) 2016-01-25 2017-08-03 株式会社リケン Élément de coulissement et son procédé de fabrication
JP2017171988A (ja) 2016-03-23 2017-09-28 日本アイ・ティ・エフ株式会社 被覆膜とその製造方法およびｐｖｄ装置

Also Published As

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WO2019172321A1 (fr) 2019-09-12
CN111788328B (zh) 2023-02-28
JP2019157156A (ja) 2019-09-19
CN111788328A (zh) 2020-10-16

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