JP7133724B2 - プラズマ発生装置、およびプラズマ処理方法 - Google Patents
プラズマ発生装置、およびプラズマ処理方法 Download PDFInfo
- Publication number
- JP7133724B2 JP7133724B2 JP2021553194A JP2021553194A JP7133724B2 JP 7133724 B2 JP7133724 B2 JP 7133724B2 JP 2021553194 A JP2021553194 A JP 2021553194A JP 2021553194 A JP2021553194 A JP 2021553194A JP 7133724 B2 JP7133724 B2 JP 7133724B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- nozzle
- gas
- main body
- passages
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/041419 WO2021079420A1 (ja) | 2019-10-22 | 2019-10-22 | プラズマ発生装置、およびプラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2021079420A1 JPWO2021079420A1 (https=) | 2021-04-29 |
| JP7133724B2 true JP7133724B2 (ja) | 2022-09-08 |
Family
ID=75619936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021553194A Active JP7133724B2 (ja) | 2019-10-22 | 2019-10-22 | プラズマ発生装置、およびプラズマ処理方法 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4050973A4 (https=) |
| JP (1) | JP7133724B2 (https=) |
| CN (1) | CN114586473B (https=) |
| WO (1) | WO2021079420A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005302681A (ja) | 2003-05-14 | 2005-10-27 | Sekisui Chem Co Ltd | プラズマ処理装置 |
| JP2015144078A (ja) | 2014-01-31 | 2015-08-06 | 富士機械製造株式会社 | 大気圧プラズマ発生装置 |
| WO2016194138A1 (ja) | 2015-06-02 | 2016-12-08 | 富士機械製造株式会社 | プラズマ発生装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS3621622Y1 (https=) * | 1959-02-03 | 1961-08-21 | ||
| US5317126A (en) * | 1992-01-14 | 1994-05-31 | Hypertherm, Inc. | Nozzle and method of operation for a plasma arc torch |
| JP3707563B2 (ja) * | 1995-01-27 | 2005-10-19 | 日野自動車株式会社 | ホール型燃料噴射ノズル |
| DE29911974U1 (de) | 1999-07-09 | 2000-11-23 | Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen | Plasmadüse |
| KR101481928B1 (ko) * | 2010-12-23 | 2015-01-21 | 엘리멘트 식스 리미티드 | 합성 다이아몬드 물질의 도핑을 제어하는 방법 |
| GB201021870D0 (en) * | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
| US9144148B2 (en) * | 2013-07-25 | 2015-09-22 | Hypertherm, Inc. | Devices for gas cooling plasma arc torches and related systems and methods |
| US9960017B2 (en) * | 2014-09-16 | 2018-05-01 | Fuji Machine Mfg. Co., Ltd. | Plasma gas jetting device |
| CN107110496A (zh) * | 2014-12-24 | 2017-08-29 | 克利尔赛恩燃烧公司 | 具有燃料和氧化剂再循环的火焰稳定器、包括此类火焰稳定器的燃烧系统,以及相关方法 |
| WO2017056185A1 (ja) * | 2015-09-29 | 2017-04-06 | 富士機械製造株式会社 | プラズマ発生装置 |
| EP3432691B1 (en) * | 2016-03-14 | 2020-06-24 | Fuji Corporation | Plasma generator |
| DE102016125699A1 (de) * | 2016-12-23 | 2018-06-28 | Plasmatreat Gmbh | Düsenanordnung, Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, Verwendung derselben, Verfahren zur Plasmabehandlung eines Stoffs oder einer Kunststofffolie, plasmabehandelter Vliesstoff und Verwendung desselben |
| EP3357879A1 (de) * | 2017-02-07 | 2018-08-08 | Heraeus Quarzglas GmbH & Co. KG | Gasverteilelement für den einsatz in der halbleiterfertigung sowie verfahren zur herstellung eines gasverteilelements |
| US11904401B2 (en) * | 2018-01-30 | 2024-02-20 | Fuji Corporation | Plasma processing machine |
| JP6713039B2 (ja) * | 2018-12-26 | 2020-06-24 | 株式会社Fuji | プラズマガス照射装置 |
-
2019
- 2019-10-22 JP JP2021553194A patent/JP7133724B2/ja active Active
- 2019-10-22 WO PCT/JP2019/041419 patent/WO2021079420A1/ja not_active Ceased
- 2019-10-22 EP EP19950060.4A patent/EP4050973A4/en active Pending
- 2019-10-22 CN CN201980101498.1A patent/CN114586473B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005302681A (ja) | 2003-05-14 | 2005-10-27 | Sekisui Chem Co Ltd | プラズマ処理装置 |
| JP2015144078A (ja) | 2014-01-31 | 2015-08-06 | 富士機械製造株式会社 | 大気圧プラズマ発生装置 |
| WO2016194138A1 (ja) | 2015-06-02 | 2016-12-08 | 富士機械製造株式会社 | プラズマ発生装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2021079420A1 (https=) | 2021-04-29 |
| CN114586473B (zh) | 2025-02-18 |
| CN114586473A (zh) | 2022-06-03 |
| WO2021079420A1 (ja) | 2021-04-29 |
| EP4050973A4 (en) | 2022-11-09 |
| EP4050973A1 (en) | 2022-08-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107454730B (zh) | 包括回旋环的等离子体电弧切割系统和有关运行方法 | |
| US20260054320A1 (en) | Highly positioned laser processing nozzle | |
| CN103492084B (zh) | 轴向进给型等离子喷镀装置 | |
| JP2010539644A (ja) | 表面処理又は表面コーティング方法及び装置 | |
| JP6605598B2 (ja) | プラズマ発生装置 | |
| CA2325305A1 (en) | Sequential feedstock injector for thermal spray torches | |
| JP7133724B2 (ja) | プラズマ発生装置、およびプラズマ処理方法 | |
| TWI598465B (zh) | 常壓電漿鍍膜裝置 | |
| CN108781499A (zh) | 等离子发生装置 | |
| TWI758621B (zh) | 多段噴淋組件 | |
| JP6944066B2 (ja) | プラズマ発生装置 | |
| JP7461961B2 (ja) | プラズマ発生装置、およびプラズマ処理方法 | |
| CN101298668A (zh) | 等离子体产生装置 | |
| JP7773559B2 (ja) | ノズル、プラズマ処理装置、およびガス噴出方法 | |
| JP2016043287A (ja) | プラズマ溶射装置およびプラズマ溶射方法 | |
| JP7168792B2 (ja) | プラズマ発生装置 | |
| JP2004152665A (ja) | 除電装置 | |
| JP5645157B2 (ja) | プラズマ装置 | |
| JP7142481B2 (ja) | プラズマ供給装置、プラズマ生成方法 | |
| JPS61104625A (ja) | プラズマ処理装置 | |
| WO2024241473A1 (ja) | 清掃治具、および清掃方法 | |
| JP6587689B2 (ja) | 大気圧プラズマ発生装置 | |
| JP7268932B1 (ja) | プラズマ噴射装置 | |
| JP2007063575A (ja) | プロセスガス供給機構並びにプラズマcvd成膜装置 | |
| JP2020009785A (ja) | プラズマ発生装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20211015 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220614 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220802 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220816 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220829 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7133724 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |