CN114586473B - 等离子体产生装置及等离子体处理方法 - Google Patents

等离子体产生装置及等离子体处理方法 Download PDF

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Publication number
CN114586473B
CN114586473B CN201980101498.1A CN201980101498A CN114586473B CN 114586473 B CN114586473 B CN 114586473B CN 201980101498 A CN201980101498 A CN 201980101498A CN 114586473 B CN114586473 B CN 114586473B
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plasma
nozzle
gas
opening
main body
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Chinese (zh)
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CN114586473A (zh
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岩田卓也
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Fuji Corp
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Fuji Corp
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
CN201980101498.1A 2019-10-22 2019-10-22 等离子体产生装置及等离子体处理方法 Active CN114586473B (zh)

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PCT/JP2019/041419 WO2021079420A1 (ja) 2019-10-22 2019-10-22 プラズマ発生装置、およびプラズマ処理方法

Publications (2)

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CN114586473A CN114586473A (zh) 2022-06-03
CN114586473B true CN114586473B (zh) 2025-02-18

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CN201980101498.1A Active CN114586473B (zh) 2019-10-22 2019-10-22 等离子体产生装置及等离子体处理方法

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EP (1) EP4050973A4 (https=)
JP (1) JP7133724B2 (https=)
CN (1) CN114586473B (https=)
WO (1) WO2021079420A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017056185A1 (ja) * 2015-09-29 2017-04-06 富士機械製造株式会社 プラズマ発生装置
EP3357879A1 (de) * 2017-02-07 2018-08-08 Heraeus Quarzglas GmbH & Co. KG Gasverteilelement für den einsatz in der halbleiterfertigung sowie verfahren zur herstellung eines gasverteilelements
EP3432691A1 (en) * 2016-03-14 2019-01-23 Fuji Corporation Plasma generator

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (https=) * 1959-02-03 1961-08-21
US5317126A (en) * 1992-01-14 1994-05-31 Hypertherm, Inc. Nozzle and method of operation for a plasma arc torch
JP3707563B2 (ja) * 1995-01-27 2005-10-19 日野自動車株式会社 ホール型燃料噴射ノズル
DE29911974U1 (de) 1999-07-09 2000-11-23 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Plasmadüse
JP2005302681A (ja) * 2003-05-14 2005-10-27 Sekisui Chem Co Ltd プラズマ処理装置
KR101481928B1 (ko) * 2010-12-23 2015-01-21 엘리멘트 식스 리미티드 합성 다이아몬드 물질의 도핑을 제어하는 방법
GB201021870D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
US9144148B2 (en) * 2013-07-25 2015-09-22 Hypertherm, Inc. Devices for gas cooling plasma arc torches and related systems and methods
JP2015144078A (ja) 2014-01-31 2015-08-06 富士機械製造株式会社 大気圧プラズマ発生装置
US9960017B2 (en) * 2014-09-16 2018-05-01 Fuji Machine Mfg. Co., Ltd. Plasma gas jetting device
CN107110496A (zh) * 2014-12-24 2017-08-29 克利尔赛恩燃烧公司 具有燃料和氧化剂再循环的火焰稳定器、包括此类火焰稳定器的燃烧系统，以及相关方法
WO2016194138A1 (ja) * 2015-06-02 2016-12-08 富士機械製造株式会社 プラズマ発生装置
DE102016125699A1 (de) * 2016-12-23 2018-06-28 Plasmatreat Gmbh Düsenanordnung, Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, Verwendung derselben, Verfahren zur Plasmabehandlung eines Stoffs oder einer Kunststofffolie, plasmabehandelter Vliesstoff und Verwendung desselben
US11904401B2 (en) * 2018-01-30 2024-02-20 Fuji Corporation Plasma processing machine
JP6713039B2 (ja) * 2018-12-26 2020-06-24 株式会社Ｆｕｊｉ プラズマガス照射装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017056185A1 (ja) * 2015-09-29 2017-04-06 富士機械製造株式会社 プラズマ発生装置
EP3432691A1 (en) * 2016-03-14 2019-01-23 Fuji Corporation Plasma generator
EP3357879A1 (de) * 2017-02-07 2018-08-08 Heraeus Quarzglas GmbH & Co. KG Gasverteilelement für den einsatz in der halbleiterfertigung sowie verfahren zur herstellung eines gasverteilelements

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Publication number Publication date
JPWO2021079420A1 (https=) 2021-04-29
CN114586473A (zh) 2022-06-03
WO2021079420A1 (ja) 2021-04-29
EP4050973A4 (en) 2022-11-09
JP7133724B2 (ja) 2022-09-08
EP4050973A1 (en) 2022-08-31

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