JP7116591B2 - 撮像装置及びその製造方法 - Google Patents
撮像装置及びその製造方法 Download PDFInfo
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- JP7116591B2 JP7116591B2 JP2018096197A JP2018096197A JP7116591B2 JP 7116591 B2 JP7116591 B2 JP 7116591B2 JP 2018096197 A JP2018096197 A JP 2018096197A JP 2018096197 A JP2018096197 A JP 2018096197A JP 7116591 B2 JP7116591 B2 JP 7116591B2
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Description
本発明の第1実施形態による撮像装置及びその製造方法について、図1乃至図7を用いて説明する。
本発明の第2実施形態による撮像装置及びその製造方法について、図10を用いて説明する。第1実施形態による撮像装置と同様の構成要素には同一の符号を付し、説明を省略し或いは簡潔にする。図10は、本実施形態による撮像装置の構造を示す概略断面図である。
本発明の第3実施形態による撮像装置及びその製造方法について、図11及び図12を用いて説明する。第1及び第2実施形態による撮像装置と同様の構成要素には同一の符号を付し、説明を省略し或いは簡潔にする。図11は、本実施形態による撮像装置の構造を示す概略断面図である。図12は、本実施形態による撮像装置の作用及び効果を説明する図である。
本発明の第4実施形態による撮像システムについて、図14を用いて説明する。図14は、本実施形態による撮像システムの概略構成を示すブロック図である。
本発明の第5実施形態による撮像システム及び移動体について、図15を用いて説明する。図15は、本実施形態による撮像システム及び移動体の構成を示す図である。
本発明は、上記実施形態に限らず種々の変形が可能である。
110…シリコン基板
120…CMOS回路部
142…素子分離溝
144…素子分離部
146,152,154…開口部
150…共通電極
158…貫通電極
160…コンタクトプラグ
124,162,164…配線
200…センサ基板
210…InP基板
220…光電変換層
222…p型InP層
224…アンドープInGaAs層
226…n型InP層
Claims (19)
- 第1導電型の第1の半導体層と第2導電型の第2の半導体層とを含む光電変換層を有し、前記光電変換層に複数の光電変換部が設けられた第1の基板と、
前記第1の基板に接合され、前記複数の光電変換部が検出した情報に基づく信号を出力する読み出し回路が設けられた第2の基板と、
前記第2の基板と、前記第1の半導体層及び前記第2の半導体層のうちの少なくとも一方と、を貫通するように設けられた第1の開口部によって規定される素子分離部と、を有し、
前記複数の光電変換部の各々は、前記素子分離部によって互いに分離されている
ことを特徴とする撮像装置。 - 前記第1の開口部は、前記第1の基板と前記第2の基板との間において連続した面を形成している
ことを特徴とする請求項1記載の撮像装置。 - 前記素子分離部は、前記第1の開口部に設けられた絶縁部材を有する
ことを特徴とする請求項1又は2記載の撮像装置。 - 前記素子分離部は、前記第1の開口部に設けられた遮光性部材を更に有する
ことを特徴とする請求項3記載の撮像装置。 - 前記第2の基板を貫通し前記第1の半導体層に達する第2の開口部に設けられ、前記第1の半導体層に電気的に接続された第1の貫通電極と、
前記第2の基板を貫通し前記第2の半導体層に達する第3の開口部に設けられ、前記第2の半導体層に電気的に接続された第2の貫通電極と
を更に有することを特徴とする請求項1乃至4のいずれか1項に記載の撮像装置。 - 前記第1の貫通電極は、前記複数の光電変換部の各々の前記第1の半導体層に接続してそれぞれ設けられており、
前記第2の貫通電極は、前記複数の光電変換部に共通の前記第2の半導体層に接続されている
ことを特徴とする請求項5記載の撮像装置。 - 前記第1の半導体層は、前記第2の半導体層よりも前記第2の基板の側に設けられている
ことを特徴とする請求項6記載の撮像装置。 - 前記第2の基板は、前記第1の基板に対向する第1面と、前記第1面と反対の第2面と、を有し、
前記第1の貫通電極及び前記第2の貫通電極の各々は、前記第2の基板の前記第2面の側に配された配線を介して、前記読み出し回路に電気的に接続されている
ことを特徴とする請求項5乃至7のいずれか1項に記載の撮像装置。 - 前記第2の基板は、平面視において前記複数の光電変換部の各々と重なる領域に配された複数の第2の光電変換部を更に有する
ことを特徴とする請求項1乃至8のいずれか1項に記載の撮像装置。 - 前記複数の光電変換部を構成する半導体材料の吸収波長帯域は、前記複数の第2の光電変換部を構成する半導体材料の吸収波長帯域よりも長波長である
ことを特徴とする請求項9記載の撮像装置。 - 前記光電変換層は、前記第1の半導体層と前記第2の半導体層との間に設けられ、アンドープの半導体材料よりなる第3の半導体層を更に有する
ことを特徴とする請求項1乃至10のいずれか1項に記載の撮像装置。 - 前記光電変換層は、赤外線の波長帯域に吸収波長帯域を有する半導体材料を含む
ことを特徴とする請求項1乃至11のいずれか1項に記載の撮像装置。 - 前記光電変換層は、シリコンのキャリア移動度以上のキャリア移動度を有する半導体材料により構成されている
ことを特徴とする請求項1乃至12のいずれか1項に記載の撮像装置。 - 前記光電変換層は、In、Ga及びAsを含む化合物半導体材料により構成されている
ことを特徴とする請求項1乃至13のいずれか1項に記載の撮像装置。 - 第1の基板の上に、第1導電型の第1の半導体層と第2導電型の第2の半導体層とを形成し、前記第1の半導体層及び前記第2の半導体層を含む光電変換層を形成する工程と、
前記光電変換層が設けられた前記第1の基板に、第2の基板を接合する工程と、
前記第2の基板の側から、少なくとも前記第2の基板と前記第2の半導体層とを貫通するように第1の開口部を形成し、前記光電変換層を複数の光電変換部に分離する工程と
を有することを特徴とする撮像装置の製造方法。 - 前記第2の基板及び前記第2の半導体層を貫通し、前記第1の半導体層に達する第2の開口部を形成する工程と、
前記第2の開口部に、前記第1の半導体層に電気的に接続された第1の貫通電極を形成する工程と、
前記第2の基板を貫通し、前記第2の半導体層に達する第3の開口部を形成する工程と、
前記第3の開口部に、前記第2の半導体層に電気的に接続された第2の貫通電極を形成する工程と
を更に有することを特徴とする請求項15記載の撮像装置の製造方法。 - 前記第2の基板は、前記複数の光電変換部が検出した情報に基づく信号を出力する読み出し回路を有し、
前記第2の基板に、前記読み出し回路に接続された第1の配線に達する第4の開口部を形成する工程と、
前記第4の開口部に、前記第1の配線に接続された電極を形成する工程と、
前記第2の基板の上に、前記電極と前記第1の貫通電極又は前記第2の貫通電極とを接続する第2の配線を形成する工程とを更に有する
ことを特徴とする請求項16記載の撮像装置の製造方法。 - 請求項1乃至14のいずれか1項に記載の撮像装置と、
前記撮像装置から出力される信号を処理する信号処理部と
を有することを特徴とする撮像システム。 - 移動体であって、
請求項1乃至14のいずれか1項に記載の撮像装置と、
前記撮像装置からの信号に基づく視差画像から、対象物までの距離情報を取得する距離情報取得手段と、
前記距離情報に基づいて前記移動体を制御する制御手段と
を有することを特徴とする移動体。
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