JP7093893B2 - レベルセンサ及びレベルセンサを組み込んだリソグラフィ装置 - Google Patents

レベルセンサ及びレベルセンサを組み込んだリソグラフィ装置 Download PDF

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Publication number
JP7093893B2
JP7093893B2 JP2021515028A JP2021515028A JP7093893B2 JP 7093893 B2 JP7093893 B2 JP 7093893B2 JP 2021515028 A JP2021515028 A JP 2021515028A JP 2021515028 A JP2021515028 A JP 2021515028A JP 7093893 B2 JP7093893 B2 JP 7093893B2
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JP
Japan
Prior art keywords
measurement
temperature
sensor
gap
outlet
Prior art date
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Active
Application number
JP2021515028A
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English (en)
Japanese (ja)
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JP2022501638A (ja
Inventor
ブロックス，ルート，ヘンドリカス，マルティヌス，ヨハネス
クネン，ヨハン，ヘルトルディス，コルネリス
ザール，オクサナ
ライアンズ，ジョセフ，ハリー
スリヴァスタヴァ，スディール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
ASML Netherlands BV
Original Assignee
ASML Holding NV
ASML Netherlands BV
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Publication of JP2022501638A publication Critical patent/JP2022501638A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00—Measuring arrangements characterised by the use of fluids
    • G01B13/02—Measuring arrangements characterised by the use of fluids for measuring length, width or thickness
    • G01B13/06—Measuring arrangements characterised by the use of fluids for measuring length, width or thickness for measuring thickness
    • G01B13/065—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00—Measuring arrangements characterised by the use of fluids
    • G01B13/12—Measuring arrangements characterised by the use of fluids for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021515028A 2018-09-27 2019-08-26 レベルセンサ及びレベルセンサを組み込んだリソグラフィ装置 Active JP7093893B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862737557P 2018-09-27 2018-09-27
US62/737,557 2018-09-27
PCT/EP2019/072680 WO2020064240A1 (en) 2018-09-27 2019-08-26 A level sensor and a lithographic apparatus incorporating a level sensor

Publications (2)

Publication Number Publication Date
JP2022501638A JP2022501638A (ja) 2022-01-06
JP7093893B2 true JP7093893B2 (ja) 2022-06-30

Family

ID=67770500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021515028A Active JP7093893B2 (ja) 2018-09-27 2019-08-26 レベルセンサ及びレベルセンサを組み込んだリソグラフィ装置

Country Status (5)

Country Link
JP (1) JP7093893B2 (zh)
CN (1) CN112771451B (zh)
NL (1) NL2023704A (zh)
TW (1) TWI720618B (zh)
WO (1) WO2020064240A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114088025B (zh) * 2022-01-14 2022-04-12 常州吴越纺织器材有限公司 多参数连续测试的钢筘性能测试装置及测试方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007218901A (ja) 2005-12-29 2007-08-30 Asml Holding Nv 圧力センサ
JP2011514514A (ja) 2008-02-20 2011-05-06 エーエスエムエル ホールディング エヌ．ブイ． 真空環境に適合可能なガスゲージ
US20140320832A1 (en) 2013-04-25 2014-10-30 Nikon Corporation Position-measurement systems

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0371007A (ja) * 1989-08-11 1991-03-26 Hitachi Ltd エアマイクロ検出制御方法および制御機構
US7549521B2 (en) * 2001-02-15 2009-06-23 Integral Technologies, Inc. Low cost electrical power connectivity for railway systems manufactured from conductive loaded resin-based materials
JP5311724B2 (ja) * 2006-06-27 2013-10-09 日本空圧システム株式会社 位置確認装置
US7578168B2 (en) * 2007-06-27 2009-08-25 Asml Holding N.V. Increasing gas gauge pressure sensitivity using nozzle-face surface roughness
NL2016877A (en) * 2015-06-18 2016-12-22 Asml Holding Nv An apparatus including a gas gauge and method of operating the same
CN107949810B (zh) * 2015-07-14 2020-12-11 Asml荷兰有限公司 光刻设备中的图形化装置冷却系统
WO2017157552A1 (en) * 2016-03-18 2017-09-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007218901A (ja) 2005-12-29 2007-08-30 Asml Holding Nv 圧力センサ
JP2011514514A (ja) 2008-02-20 2011-05-06 エーエスエムエル ホールディング エヌ．ブイ． 真空環境に適合可能なガスゲージ
US20140320832A1 (en) 2013-04-25 2014-10-30 Nikon Corporation Position-measurement systems

Also Published As

Publication number Publication date
JP2022501638A (ja) 2022-01-06
NL2023704A (en) 2020-05-01
TW202035953A (zh) 2020-10-01
TWI720618B (zh) 2021-03-01
WO2020064240A1 (en) 2020-04-02
CN112771451A (zh) 2021-05-07
CN112771451B (zh) 2024-05-07

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