JP7088947B2 - マスクストリップ及びその製造方法、マスクプレート - Google Patents
マスクストリップ及びその製造方法、マスクプレート Download PDFInfo
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- JP7088947B2 JP7088947B2 JP2019545296A JP2019545296A JP7088947B2 JP 7088947 B2 JP7088947 B2 JP 7088947B2 JP 2019545296 A JP2019545296 A JP 2019545296A JP 2019545296 A JP2019545296 A JP 2019545296A JP 7088947 B2 JP7088947 B2 JP 7088947B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K11/00—Resistance welding; Severing by resistance heating
- B23K11/10—Spot welding; Stitch welding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K9/00—Arc welding or cutting
- B23K9/04—Welding for other purposes than joining, e.g. built-up welding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Description
本出願は、2017年8月25日に提出した中国特許出願番号201710742464.3との中国特許出願を基礎とする優先権を主張し、その開示の総てをここに取り込む。
Claims (12)
- マスクストリップであって、
第1方向に沿う複数のマスクユニットを備え、
前記マスクユニットの各々は、マスク領域と、前記マスク領域を取り囲んでいる非マスク領域とを備え、前記非マスク領域は、サイド領域と、前記サイド領域内のオリジナル応力集中領域とを備え、
前記マスクユニットの各々は、応力集中構造をさらに備え、
前記応力集中構造は、前記サイド領域内の前記オリジナル応力集中領域以外の部分に位置し、
前記応力集中構造は、複数の凹溝を含み、
前記凹溝は、エッチング溝であるマスクストリップ。 - 前記サイド領域は、前記非マスク領域内の、前記マスクストリップの縁部からの間隔が第1間隔以下の部分である請求項1に記載のマスクストリップ。
- 前記オリジナル応力集中領域は、前記サイド領域内の、対応するマスク領域からの間隔が第2間隔以下の部分である請求項1に記載のマスクストリップ。
- 前記第1方向は、引張方向である請求項1に記載のマスクストリップ。
- 前記マスクユニットの各々の中心が前記マスク領域の中心と重なり、且つ、前記応力集中構造は、前記サイド領域内の各マスクユニットの四隅に位置する請求項1に記載のマスクストリップ。
- 前記応力集中構造は、長手方向が前記第1方向に平行する矩形形状をしている請求項1に記載のマスクストリップ。
- 前記マスクユニットの各々は、前記第1方向に垂直な方向に配列された2つ以上のマスク領域を備える請求項1に記載のマスクストリップ。
- 請求項1ないし請求項7のいずれか1項に記載のマスクストリップを備えるマスクプレート。
- マスクストリップの製造方法であって、
マスクストリップ本体を形成するステップと、
サイド領域内のオリジナル応力集中領域以外の部分に応力集中構造を形成するステップとを含み、
前記マスクストリップ本体は、第1方向に配列された複数のマスクユニットを備え、前記マスクユニットの各々がマスク領域と前記マスク領域を取り囲んでいる非マスク領域とを備え、前記非マスク領域がサイド領域と前記サイド領域内のオリジナル応力集中領域とを備え、
前記応力集中構造は、複数の凹溝を含み、
前記凹溝は、エッチング溝であるマスクストリップの製造方法。 - 前記応力集中構造は、アレイ状に配列された複数の凹溝を含む請求項9に記載の製造方法。
- 前記エッチング溝は、互いに重ならない請求項10に記載の製造方法。
- 前記応力集中構造を形成するステップは、
エッチング液を用いて、前記マスクストリップ本体の表面において、前記凹溝を形成する対象となる位置に対応して前記エッチング溝を形成するステップを含む請求項11に記載の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710742464.3A CN109423600B (zh) | 2017-08-25 | 2017-08-25 | 掩膜条及其制备方法、掩膜板 |
CN201710742464.3 | 2017-08-25 | ||
PCT/CN2018/073790 WO2019037387A1 (en) | 2017-08-25 | 2018-01-23 | MASK STRIP AND METHOD OF MANUFACTURING THE SAME, AND MASK PLATE |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020531679A JP2020531679A (ja) | 2020-11-05 |
JP7088947B2 true JP7088947B2 (ja) | 2022-06-21 |
Family
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JP2019545296A Active JP7088947B2 (ja) | 2017-08-25 | 2018-01-23 | マスクストリップ及びその製造方法、マスクプレート |
Country Status (6)
Country | Link |
---|---|
US (1) | US20210363625A1 (ja) |
EP (1) | EP3673095A4 (ja) |
JP (1) | JP7088947B2 (ja) |
KR (1) | KR102269310B1 (ja) |
CN (1) | CN109423600B (ja) |
WO (1) | WO2019037387A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111188008B (zh) * | 2020-02-21 | 2021-03-23 | 武汉华星光电半导体显示技术有限公司 | 一种金属掩膜条、金属掩膜板及其制作方法以及玻璃光罩 |
CN111926291A (zh) * | 2020-08-31 | 2020-11-13 | 合肥维信诺科技有限公司 | 掩膜板及掩膜板组件 |
TWI757041B (zh) * | 2021-01-08 | 2022-03-01 | 達運精密工業股份有限公司 | 遮罩 |
CN113088879B (zh) * | 2021-04-15 | 2023-01-20 | 京东方科技集团股份有限公司 | 精细金属掩模版及掩模装置 |
CN114318222A (zh) * | 2021-12-07 | 2022-04-12 | 昆山国显光电有限公司 | 掩模板 |
JP2024055260A (ja) * | 2022-10-07 | 2024-04-18 | 大日本印刷株式会社 | メタルマスク及びその製造方法 |
CN116200746A (zh) * | 2023-02-07 | 2023-06-02 | 福建华佳彩有限公司 | 一种掩膜条的制作方法 |
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JP2012229484A (ja) | 2011-04-25 | 2012-11-22 | Samsung Mobile Display Co Ltd | 薄膜蒸着用のマスクフレームアセンブリー |
JP2012233250A (ja) | 2011-05-06 | 2012-11-29 | Samsung Mobile Display Co Ltd | 薄膜蒸着用マスクフレーム組立体及びその製造方法 |
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-
2017
- 2017-08-25 CN CN201710742464.3A patent/CN109423600B/zh active Active
-
2018
- 2018-01-23 WO PCT/CN2018/073790 patent/WO2019037387A1/en unknown
- 2018-01-23 JP JP2019545296A patent/JP7088947B2/ja active Active
- 2018-01-23 US US16/315,718 patent/US20210363625A1/en not_active Abandoned
- 2018-01-23 KR KR1020197024488A patent/KR102269310B1/ko active IP Right Grant
- 2018-01-23 EP EP18847793.9A patent/EP3673095A4/en active Pending
Patent Citations (3)
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JP2010180476A (ja) | 2009-02-05 | 2010-08-19 | Samsung Mobile Display Co Ltd | マスク組立体及びこれを利用した平板表示装置用蒸着装置 |
JP2012229484A (ja) | 2011-04-25 | 2012-11-22 | Samsung Mobile Display Co Ltd | 薄膜蒸着用のマスクフレームアセンブリー |
JP2012233250A (ja) | 2011-05-06 | 2012-11-29 | Samsung Mobile Display Co Ltd | 薄膜蒸着用マスクフレーム組立体及びその製造方法 |
Also Published As
Publication number | Publication date |
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EP3673095A4 (en) | 2021-08-25 |
WO2019037387A1 (en) | 2019-02-28 |
JP2020531679A (ja) | 2020-11-05 |
KR102269310B1 (ko) | 2021-06-25 |
KR20190111074A (ko) | 2019-10-01 |
EP3673095A1 (en) | 2020-07-01 |
CN109423600A (zh) | 2019-03-05 |
US20210363625A1 (en) | 2021-11-25 |
CN109423600B (zh) | 2020-01-07 |
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