JP7062330B2 - ダイボンド用樹脂層形成装置 - Google Patents
ダイボンド用樹脂層形成装置 Download PDFInfo
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- JP7062330B2 JP7062330B2 JP2017215843A JP2017215843A JP7062330B2 JP 7062330 B2 JP7062330 B2 JP 7062330B2 JP 2017215843 A JP2017215843 A JP 2017215843A JP 2017215843 A JP2017215843 A JP 2017215843A JP 7062330 B2 JP7062330 B2 JP 7062330B2
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- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
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- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
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- H01L2224/757—Means for aligning
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- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
- H01L2224/83874—Ultraviolet [UV] curing
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- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Coating Apparatus (AREA)
- Die Bonding (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
4 基台
6 カセット支持台
8 カセット
10 第1ガイド機構
10a,10b ガイドレール
12 第1搬送ユニット
14 第2搬送ユニット
16 第1塗布乾燥ユニット(液状樹脂塗布部)
18 チャックテーブル(待機部)
20 ノズルユニット(塗布ユニット)
22 第2ガイド機構
22a,22b ガイドレール
24 第3搬送ユニット
26 第2塗布乾燥ユニット(液状樹脂塗布部)
28 チャックテーブル(待機部)
30 ノズルユニット(塗布ユニット)
32 硬化ユニット(硬化部)
34 制御ユニット
36 筐体
38 チャックテーブル
40 支持レール
42 光源
52 チャックテーブル
54 枠体
54a 凹部
54b 吸引路
56 保持板
58 搬送パッド
60 搬送ハンド
62 爪
11 ウェーハ
11a 表面
11b 裏面
13 保護部材
15 フレーム
17 液状の樹脂(液状樹脂)
19 樹脂層
21 樹脂層(ダイボンド用樹脂層)
23 保護部材
25 支持板
27 枠部
29 通気部
Claims (3)
- 複数の分割予定ラインで区画された表面側の複数の領域にデバイスが形成されるとともに、該表面側に保護部材が貼付され該分割予定ラインに沿って分割されたウェーハの裏面側にダイボンド用樹脂層を形成するダイボンド用樹脂層形成装置であって、
該裏面側が露出するように該ウェーハを保持するチャックテーブルと、該チャックテーブルに保持された該ウェーハの該裏面側に液状樹脂を塗布する塗布ユニットと、を含む液状樹脂塗布部と、
該液状樹脂塗布部で該液状樹脂が塗布された該ウェーハを保持して1分以上待機することにより該ウェーハに塗布された該液状樹脂の平坦性を高めながら該液状樹脂を乾燥させる待機部と、
該待機部で乾燥させた該液状樹脂に外的刺激を付与し、該液状樹脂を硬化させてダイボンド用樹脂層を形成する硬化部と、
該液状樹脂塗布部又は該待機部と、該硬化部と、の間で該ウェーハを搬送する搬送ユニットと、
該液状樹脂塗布部での該液状樹脂の塗布と該待機部での該待機による該液状樹脂の乾燥とを繰り返すとともに、該ウェーハに該液状樹脂を塗布した回数に応じて、該待機部での該待機により該液状樹脂を乾燥させるか、該待機部での該待機により該液状樹脂を乾燥させずに該硬化部で該液状樹脂を硬化させるかを選択する制御ユニットと、を備えることを特徴とするダイボンド用樹脂層形成装置。 - 該搬送ユニットは、該ウェーハを支持する支持板を下面側から保持できる形状の複数の爪を有する搬送ハンドを含むことを特徴とする請求項1に記載のダイボンド用樹脂層形成装置。
- 該液状樹脂塗布部は、それぞれ該チャックテーブル及び該塗布ユニットを含む第1液状樹脂塗布部と第2液状樹脂塗布部とを有し、
該第1液状樹脂塗布部の該チャックテーブルと該第2液状樹脂塗布部の該チャックテーブルとは、該待機部としても使用され、
該第1液状樹脂塗布部の該塗布ユニットで該液状樹脂が塗布された後の該ウェーハを該第1液状樹脂塗布部の該チャックテーブルで保持して待機し、該液状樹脂を乾燥させた後に、該第2液状樹脂塗布部の該塗布ユニットで該ウェーハに該液状樹脂を更に塗布することを特徴とする請求項1又は請求項2に記載のダイボンド用樹脂層形成装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2017215843A JP7062330B2 (ja) | 2017-11-08 | 2017-11-08 | ダイボンド用樹脂層形成装置 |
US16/181,840 US20190139928A1 (en) | 2017-11-08 | 2018-11-06 | Die bonding resin layer forming apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2017215843A JP7062330B2 (ja) | 2017-11-08 | 2017-11-08 | ダイボンド用樹脂層形成装置 |
Publications (2)
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JP2019087673A JP2019087673A (ja) | 2019-06-06 |
JP7062330B2 true JP7062330B2 (ja) | 2022-05-06 |
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JP2017215843A Active JP7062330B2 (ja) | 2017-11-08 | 2017-11-08 | ダイボンド用樹脂層形成装置 |
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US (1) | US20190139928A1 (ja) |
JP (1) | JP7062330B2 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007048958A (ja) | 2005-08-10 | 2007-02-22 | Renesas Technology Corp | 半導体装置の製造方法および半導体装置 |
JP2011233577A (ja) | 2010-04-23 | 2011-11-17 | Shibaura Mechatronics Corp | 半導体装置の製造装置及び半導体装置の製造方法 |
JP2017041574A (ja) | 2015-08-21 | 2017-02-23 | 株式会社ディスコ | ウエーハの加工方法 |
JP2017183378A (ja) | 2016-03-29 | 2017-10-05 | 芝浦メカトロニクス株式会社 | 電子部品の実装装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6231956B2 (ja) * | 2014-08-11 | 2017-11-15 | 東京エレクトロン株式会社 | 基板処理装置 |
JP2018125479A (ja) * | 2017-02-03 | 2018-08-09 | 株式会社ディスコ | ウェーハの加工方法 |
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2017
- 2017-11-08 JP JP2017215843A patent/JP7062330B2/ja active Active
-
2018
- 2018-11-06 US US16/181,840 patent/US20190139928A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007048958A (ja) | 2005-08-10 | 2007-02-22 | Renesas Technology Corp | 半導体装置の製造方法および半導体装置 |
JP2011233577A (ja) | 2010-04-23 | 2011-11-17 | Shibaura Mechatronics Corp | 半導体装置の製造装置及び半導体装置の製造方法 |
JP2017041574A (ja) | 2015-08-21 | 2017-02-23 | 株式会社ディスコ | ウエーハの加工方法 |
JP2017183378A (ja) | 2016-03-29 | 2017-10-05 | 芝浦メカトロニクス株式会社 | 電子部品の実装装置 |
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US20190139928A1 (en) | 2019-05-09 |
JP2019087673A (ja) | 2019-06-06 |
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