JP7025683B2 - 光源装置 - Google Patents
光源装置 Download PDFInfo
- Publication number
- JP7025683B2 JP7025683B2 JP2017113552A JP2017113552A JP7025683B2 JP 7025683 B2 JP7025683 B2 JP 7025683B2 JP 2017113552 A JP2017113552 A JP 2017113552A JP 2017113552 A JP2017113552 A JP 2017113552A JP 7025683 B2 JP7025683 B2 JP 7025683B2
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- light
- light source
- led element
- incident surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Projection Apparatus (AREA)
- Led Device Packages (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017113552A JP7025683B2 (ja) | 2017-06-08 | 2017-06-08 | 光源装置 |
TW107117149A TWI718376B (zh) | 2017-06-08 | 2018-05-21 | 光源裝置 |
PCT/JP2018/021675 WO2018225774A1 (ja) | 2017-06-08 | 2018-06-06 | 光源装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017113552A JP7025683B2 (ja) | 2017-06-08 | 2017-06-08 | 光源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018205635A JP2018205635A (ja) | 2018-12-27 |
JP7025683B2 true JP7025683B2 (ja) | 2022-02-25 |
Family
ID=64565878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017113552A Active JP7025683B2 (ja) | 2017-06-08 | 2017-06-08 | 光源装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7025683B2 (zh) |
TW (1) | TWI718376B (zh) |
WO (1) | WO2018225774A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6709405B1 (ja) * | 2019-07-03 | 2020-06-17 | フェニックス電機株式会社 | 光源装置、およびそれを備える照明装置 |
WO2024038533A1 (ja) * | 2022-08-18 | 2024-02-22 | 株式会社ニコン | 光源ユニット、照明ユニット、露光装置、及び露光方法 |
JP2024094490A (ja) * | 2022-12-28 | 2024-07-10 | ウシオ電機株式会社 | 光源装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004039871A (ja) | 2002-07-03 | 2004-02-05 | Hitachi Ltd | 照明方法並びに露光方法及びその装置 |
JP2006133635A (ja) | 2004-11-09 | 2006-05-25 | Olympus Corp | 照明光学装置及び光学装置 |
JP2016075799A (ja) | 2014-10-07 | 2016-05-12 | 株式会社リコー | 光源装置及びこれを備えた画像投射装置 |
JP2016184126A (ja) | 2015-03-26 | 2016-10-20 | ウシオ電機株式会社 | 光源装置、露光装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4389543B2 (ja) * | 2003-10-08 | 2009-12-24 | セイコーエプソン株式会社 | プロジェクタ |
DE112005003207B4 (de) * | 2004-12-22 | 2014-10-16 | Carl Zeiss Laser Optics Gmbh | Optisches Beleuchtungssystem zum Erzeugen eines Linienstrahls |
JP4678493B2 (ja) * | 2005-05-23 | 2011-04-27 | 株式会社ニコン | 光源ユニット、照明光学装置、露光装置、および露光方法 |
US7683300B2 (en) * | 2006-10-17 | 2010-03-23 | Asml Netherlands B.V. | Using an interferometer as a high speed variable attenuator |
JP5429475B2 (ja) * | 2009-11-17 | 2014-02-26 | セイコーエプソン株式会社 | 照明装置およびプロジェクター |
JP5962089B2 (ja) * | 2012-03-15 | 2016-08-03 | 岩崎電気株式会社 | 光照射装置 |
JP2014002212A (ja) * | 2012-06-15 | 2014-01-09 | Ushio Inc | 光照射装置、露光装置 |
JP2014003086A (ja) * | 2012-06-15 | 2014-01-09 | Ushio Inc | 光照射装置、露光装置 |
JP6057072B2 (ja) * | 2013-03-22 | 2017-01-11 | ウシオ電機株式会社 | 光源装置 |
JP6199591B2 (ja) * | 2013-04-12 | 2017-09-20 | 株式会社オーク製作所 | 光源装置および露光装置 |
TWI620889B (zh) * | 2013-04-15 | 2018-04-11 | Hoya Candeo Optronics Corp | Light irradiation device |
JP6464865B2 (ja) * | 2015-03-25 | 2019-02-06 | 富士通株式会社 | センサシステム、センサ装置、及び情報処理方法 |
TWI592609B (zh) * | 2015-12-30 | 2017-07-21 | 中強光電股份有限公司 | 照明系統以及投影裝置 |
-
2017
- 2017-06-08 JP JP2017113552A patent/JP7025683B2/ja active Active
-
2018
- 2018-05-21 TW TW107117149A patent/TWI718376B/zh active
- 2018-06-06 WO PCT/JP2018/021675 patent/WO2018225774A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004039871A (ja) | 2002-07-03 | 2004-02-05 | Hitachi Ltd | 照明方法並びに露光方法及びその装置 |
JP2006133635A (ja) | 2004-11-09 | 2006-05-25 | Olympus Corp | 照明光学装置及び光学装置 |
JP2016075799A (ja) | 2014-10-07 | 2016-05-12 | 株式会社リコー | 光源装置及びこれを備えた画像投射装置 |
JP2016184126A (ja) | 2015-03-26 | 2016-10-20 | ウシオ電機株式会社 | 光源装置、露光装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201903318A (zh) | 2019-01-16 |
JP2018205635A (ja) | 2018-12-27 |
WO2018225774A1 (ja) | 2018-12-13 |
TWI718376B (zh) | 2021-02-11 |
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