JP7025683B2 - 光源装置 - Google Patents

光源装置 Download PDF

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Publication number
JP7025683B2
JP7025683B2 JP2017113552A JP2017113552A JP7025683B2 JP 7025683 B2 JP7025683 B2 JP 7025683B2 JP 2017113552 A JP2017113552 A JP 2017113552A JP 2017113552 A JP2017113552 A JP 2017113552A JP 7025683 B2 JP7025683 B2 JP 7025683B2
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JP
Japan
Prior art keywords
optical system
light
light source
led element
incident surface
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JP2017113552A
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English (en)
Japanese (ja)
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JP2018205635A (ja
Inventor
竹夫 松島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
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Ushio Denki KK
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Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP2017113552A priority Critical patent/JP7025683B2/ja
Priority to TW107117149A priority patent/TWI718376B/zh
Priority to PCT/JP2018/021675 priority patent/WO2018225774A1/ja
Publication of JP2018205635A publication Critical patent/JP2018205635A/ja
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Publication of JP7025683B2 publication Critical patent/JP7025683B2/ja
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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21SNON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Projection Apparatus (AREA)
  • Led Device Packages (AREA)
JP2017113552A 2017-06-08 2017-06-08 光源装置 Active JP7025683B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017113552A JP7025683B2 (ja) 2017-06-08 2017-06-08 光源装置
TW107117149A TWI718376B (zh) 2017-06-08 2018-05-21 光源裝置
PCT/JP2018/021675 WO2018225774A1 (ja) 2017-06-08 2018-06-06 光源装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017113552A JP7025683B2 (ja) 2017-06-08 2017-06-08 光源装置

Publications (2)

Publication Number Publication Date
JP2018205635A JP2018205635A (ja) 2018-12-27
JP7025683B2 true JP7025683B2 (ja) 2022-02-25

Family

ID=64565878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017113552A Active JP7025683B2 (ja) 2017-06-08 2017-06-08 光源装置

Country Status (3)

Country Link
JP (1) JP7025683B2 (zh)
TW (1) TWI718376B (zh)
WO (1) WO2018225774A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6709405B1 (ja) * 2019-07-03 2020-06-17 フェニックス電機株式会社 光源装置、およびそれを備える照明装置
WO2024038533A1 (ja) * 2022-08-18 2024-02-22 株式会社ニコン 光源ユニット、照明ユニット、露光装置、及び露光方法
JP2024094490A (ja) * 2022-12-28 2024-07-10 ウシオ電機株式会社 光源装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004039871A (ja) 2002-07-03 2004-02-05 Hitachi Ltd 照明方法並びに露光方法及びその装置
JP2006133635A (ja) 2004-11-09 2006-05-25 Olympus Corp 照明光学装置及び光学装置
JP2016075799A (ja) 2014-10-07 2016-05-12 株式会社リコー 光源装置及びこれを備えた画像投射装置
JP2016184126A (ja) 2015-03-26 2016-10-20 ウシオ電機株式会社 光源装置、露光装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4389543B2 (ja) * 2003-10-08 2009-12-24 セイコーエプソン株式会社 プロジェクタ
DE112005003207B4 (de) * 2004-12-22 2014-10-16 Carl Zeiss Laser Optics Gmbh Optisches Beleuchtungssystem zum Erzeugen eines Linienstrahls
JP4678493B2 (ja) * 2005-05-23 2011-04-27 株式会社ニコン 光源ユニット、照明光学装置、露光装置、および露光方法
US7683300B2 (en) * 2006-10-17 2010-03-23 Asml Netherlands B.V. Using an interferometer as a high speed variable attenuator
JP5429475B2 (ja) * 2009-11-17 2014-02-26 セイコーエプソン株式会社 照明装置およびプロジェクター
JP5962089B2 (ja) * 2012-03-15 2016-08-03 岩崎電気株式会社 光照射装置
JP2014002212A (ja) * 2012-06-15 2014-01-09 Ushio Inc 光照射装置、露光装置
JP2014003086A (ja) * 2012-06-15 2014-01-09 Ushio Inc 光照射装置、露光装置
JP6057072B2 (ja) * 2013-03-22 2017-01-11 ウシオ電機株式会社 光源装置
JP6199591B2 (ja) * 2013-04-12 2017-09-20 株式会社オーク製作所 光源装置および露光装置
TWI620889B (zh) * 2013-04-15 2018-04-11 Hoya Candeo Optronics Corp Light irradiation device
JP6464865B2 (ja) * 2015-03-25 2019-02-06 富士通株式会社 センサシステム、センサ装置、及び情報処理方法
TWI592609B (zh) * 2015-12-30 2017-07-21 中強光電股份有限公司 照明系統以及投影裝置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004039871A (ja) 2002-07-03 2004-02-05 Hitachi Ltd 照明方法並びに露光方法及びその装置
JP2006133635A (ja) 2004-11-09 2006-05-25 Olympus Corp 照明光学装置及び光学装置
JP2016075799A (ja) 2014-10-07 2016-05-12 株式会社リコー 光源装置及びこれを備えた画像投射装置
JP2016184126A (ja) 2015-03-26 2016-10-20 ウシオ電機株式会社 光源装置、露光装置

Also Published As

Publication number Publication date
TW201903318A (zh) 2019-01-16
JP2018205635A (ja) 2018-12-27
WO2018225774A1 (ja) 2018-12-13
TWI718376B (zh) 2021-02-11

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