JP7021416B2 - トレンチゲートトレンチフィールドプレート半垂直半横方向mosfet - Google Patents
トレンチゲートトレンチフィールドプレート半垂直半横方向mosfet Download PDFInfo
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- 239000000758 substrate Substances 0.000 claims description 69
- 239000004065 semiconductor Substances 0.000 claims description 66
- 210000000746 body region Anatomy 0.000 claims description 20
- 239000004020 conductor Substances 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 6
- 238000005468 ion implantation Methods 0.000 description 6
- 238000002955 isolation Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Description
Appels, et al. "Thin Layer High Voltage Devices" Philips J, Res. 35 1-13, 1980
Claims (23)
- 縦型MOSトランジスタであって、
半導体基板と、
前記半導体基板の表面に形成される第1のトレンチと、
前記半導体基板の表面に形成される第2のトレンチであって、前記第1のトレンチの内側に位置する、前記第2のトレンチと、
第1の導電型を有するソース領域と、
第2の導電型を有するボディ領域と、
前記第1の導電型を有するドレイン領域と、
を含み、
前記ソース領域と前記ボディ領域と前記ドレイン領域とが、前記半導体基板の表面から垂直方向に順に配置され、
前記ソース領域と前記ドレイン領域とが、前記第1のトレンチの閉ループ状の側壁と前記第2のトレンチの閉ループ状の側壁とにより画定される略環状の半導体領域に配置され、
前記ソース領域が、前記半導体基板の表面において、前記第1のトレンチの閉ループ状の側壁と前記第2のトレンチの閉ループ状の側壁とに隣接してその間に延在し、
前記ドレイン領域が、前記略環状の半導体領域に配置され、前記第1及び第2のトレンチの深さよりも深い前記半導体基板の領域まで延在する、縦型MOSトランジスタ。 - 請求項1に記載の縦型MOSトランジスタであって、
前記ソース領域が、前記半導体基板の表面において、前記第2トレンチの閉ループ状の側壁の全てにわたって隣接して延在する、縦型MOSトランジスタ。 - 請求項1又は2に記載の縦型MOSトランジスタであって、
前記第1のトレンチと前記第2のトレンチとが、それぞれ、側壁と底部上に形成される誘電体層と、前記誘電体層上であってトレンチ内部に形成される導電材料とを含む、縦型MOSトランジスタ。 - 請求項3記載の縦型MOSトランジスタであって、
前記第2のトレンチの内部に形成される導電材料が、ゲート電極である、縦型MOSトランジスタ。 - 請求項4に記載の縦型MOSトランジスタであって、
前記第1のトレンチの内部に形成される導電材料が、前記第2のトレンチの内部の前記ゲート電極に電気的に接続される、縦型MOSトランジスタ。 - 請求項3又は4に記載の縦型MOSトランジスタであって、
前記第1のトレンチの内部に形成される導電材料が、前記ソース領域に電気的に接続される、縦型MOSトランジスタ。 - 請求項1乃至6の何れかに記載の縦型MOSトランジスタであって、
前記第1のトレンチが、1~5マイクロメートルの間の深さを有する、縦型MOSトランジスタ。 - 請求項1乃至7の何れかに記載の縦型MOSトランジスタであって、
前記第1のトレンチが、0.5~1.5マイクロメートルの間の幅を有する、縦型MOSトランジスタ。 - 請求項1乃至8の何れかに記載の縦型MOSトランジスタであって、
前記第1のトレンチが、前記第2のトレンチの深さよりも深い深さを有する、縦型MOSトランジスタ。 - 請求項3乃至9の何れかに記載の縦型MOSトランジスタであって、
前記第1のトレンチと前記第2のトレンチとの側壁と底部上に形成される誘電体層が、シリコン窒化物を含む、縦型MOSトランジスタ。 - 請求項3乃至9の何れかに記載の縦型MOSトランジスタであって、
前記第1のトレンチと前記第2のトレンチとの側壁と底部上に形成される誘電体層が、シリコンオキシナイトライドを含む、縦型MOSトランジスタ。 - 請求項1乃至11の何れかに記載の縦型MOSトランジスタであって、
前記半導体基板の表面に形成される第3のトレンチであって、前記第1のトレンチから離れている、前記第3のトレンチと、
前記半導体基板の表面に形成される第4のトレンチであって、前記第3のトレンチの内側に位置する、前記第4のトレンチと、
前記第1の導電型を有する第2のソース領域と、
前記第2の導電型を有する第2のボディ領域と、
前記第1の導電型を有する第2のドレイン領域と、
を更に含み、
前記第2のソース領域と前記第2ボディ領域と前記2のドレイン領域とが、前記半導体基板の表面から垂直方向に順に配置され、
前記第2のソース領域と前記第2のボディ領域とが、前記第3のトレンチの閉ループ状の側壁と前記第4のトレンチの閉ループ状の側壁とにより画定される第2の略環状の半導体領域に配置され、
前記第2のドレイン領域が、前記第2の略環状の半導体領域に配置され、前記第3及び第4のトレンチよりも深い前記半導体基板の領域まで延在し、
前記ドレイン領域と前記第2のドレイン領域とが、前記第1のトレンチと前記第2のトレンチと前記第3のトレンチと前記第4のトレンチの下方に位置して前記第1のトレンチと前記第3のトレンチとの間に延在し、前記第1の導電型を有する前記半導体基板の領域により接続される、縦型MOSトランジスタ。 - 請求項12に記載の縦型MOSトランジスタであって、
前記第2のソース領域が、前記半導体基板の表面において、前記第3のトレンチの閉ループ状の側壁と前記第4のトレンチの閉ループ状の側壁とに隣接してその間にわたって延在する、縦型MOSトランジスタ。 - 請求項12又は13に記載の縦型MOSトランジスタであって、
前記第2のソース領域が、前記半導体基板の表面において、前記第4のトレンチの閉ループ状の側壁の全てにわたって隣接して延在する、縦型MOSトランジスタ。 - 請求項12乃至14の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチと前記第4のトレンチとが、それぞれ、側壁と底部上に形成される誘電体層と、前記誘電体層上であってトレンチ内部に形成される導電材料とを含む、縦型MOSトランジスタ。 - 請求項15に記載の縦型MOSトランジスタであって、
前記第4のトレンチの内部に形成される導電材料が、ゲート電極である、縦型MOSトランジスタ。 - 請求項16に記載の縦型MOSトランジスタであって、
前記第3のトレンチの内部に形成される導電材料が、前記第4のトレンチの内部の前記ゲート電極に電気的に接続される、縦型MOSトランジスタ。 - 請求項15又は16に記載の縦型MOSトランジスタであって、
前記第3のトレンチの内部に形成される導電材料が、前記第2のソース領域に電気的に接続される、縦型MOSトランジスタ。 - 請求項12乃至18の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチが、1~5マイクロメートルの間の深さを有する、縦型MOSトランジスタ。 - 請求項12乃至19の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチが、0.5~1.5マイクロメートルの間の幅を有する、縦型MOSトランジスタ。 - 請求項12乃至20の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチが、前記第4のトレンチのよりも深い深さを有する、縦型MOSトランジスタ。 - 請求項15乃至21の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチと前記第4のトレンチとの側壁と底部上に形成される誘電体層が、シリコン窒化物を含む、縦型MOSトランジスタ。 - 請求項15乃至21の何れかに記載の縦型MOSトランジスタであって、
前記第3のトレンチと前記第4のトレンチとの側壁と底部上に形成される誘電体層が、シリコンオキシナイトライドを含む、縦型MOSトランジスタ。
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