JP7010830B2 - 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ - Google Patents

焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ Download PDF

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JP7010830B2
JP7010830B2 JP2018537638A JP2018537638A JP7010830B2 JP 7010830 B2 JP7010830 B2 JP 7010830B2 JP 2018537638 A JP2018537638 A JP 2018537638A JP 2018537638 A JP2018537638 A JP 2018537638A JP 7010830 B2 JP7010830 B2 JP 7010830B2
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Prior art keywords
cathode
atomic
sip
titanium
sputter ion
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English (en)
Japanese (ja)
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JP2019517094A (ja
JP2019517094A5 (enExample
Inventor
トンマーゾ・ポルチェッリ
ファブリツィオ・シヴィエロ
アレッサンドロ・ガリートニョッタ
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サエス・ゲッターズ・エッセ・ピ・ア
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
    • F04B37/04—Selection of specific absorption or adsorption materials
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2300/00—Materials; Properties thereof
    • F05D2300/10—Metals, alloys or intermetallic compounds
    • F05D2300/13—Refractory metals, i.e. Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W
    • F05D2300/133—Titanium
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2300/00—Materials; Properties thereof
    • F05D2300/10—Metals, alloys or intermetallic compounds
    • F05D2300/13—Refractory metals, i.e. Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W
    • F05D2300/134—Zirconium
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2300/00—Materials; Properties thereof
    • F05D2300/60—Properties or characteristics given to material by treatment or manufacturing
    • F05D2300/611—Coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Electron Tubes For Measurement (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
JP2018537638A 2016-02-19 2017-02-15 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ Active JP7010830B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021173171A JP2022009412A (ja) 2016-02-19 2021-10-22 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITUB2016A000885A ITUB20160885A1 (it) 2016-02-19 2016-02-19 Catodi sinterizzati non porosi e pompe a vuoto ioniche contenenti gli stessi
ITUB2016A000885 2016-02-19
PCT/EP2017/053407 WO2017140730A1 (en) 2016-02-19 2017-02-15 Sintered non-porous cathode and sputter ion vacuum pump containing the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021173171A Division JP2022009412A (ja) 2016-02-19 2021-10-22 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ

Publications (3)

Publication Number Publication Date
JP2019517094A JP2019517094A (ja) 2019-06-20
JP2019517094A5 JP2019517094A5 (enExample) 2020-03-26
JP7010830B2 true JP7010830B2 (ja) 2022-01-26

Family

ID=55948996

Family Applications (2)

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JP2018537638A Active JP7010830B2 (ja) 2016-02-19 2017-02-15 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ
JP2021173171A Pending JP2022009412A (ja) 2016-02-19 2021-10-22 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2021173171A Pending JP2022009412A (ja) 2016-02-19 2021-10-22 焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ

Country Status (8)

Country Link
US (1) US11056326B2 (enExample)
EP (1) EP3417471B1 (enExample)
JP (2) JP7010830B2 (enExample)
KR (1) KR102419940B1 (enExample)
CN (1) CN108475613B (enExample)
IT (1) ITUB20160885A1 (enExample)
RU (1) RU2721379C2 (enExample)
WO (1) WO2017140730A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10580629B2 (en) * 2017-07-31 2020-03-03 Agilent Technologies, Inc. Ion pump shield
US11355327B2 (en) * 2017-07-31 2022-06-07 Agilent Technologies, Inc. Ion pump shield
US10121627B1 (en) * 2017-10-26 2018-11-06 Edwards Vacuum Llc Ion pump noble gas stability using small grain sized cathode material
CN115121799B (zh) * 2021-03-24 2024-11-12 新奥科技发展有限公司 等离子体炬阴极及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3150819A (en) * 1962-06-07 1964-09-29 Varian Associates High vacuum apparatus and method
GB1171141A (en) * 1965-12-03 1969-11-19 Ultek Corp Asymmetric Ion Pump
US3542488A (en) * 1968-10-28 1970-11-24 Andar Iti Inc Method and apparatus for producing alloyed getter films in sputter-ion pumps
US3684401A (en) * 1970-11-17 1972-08-15 Westinghouse Electric Corp Cathode-getter materials for sputter-ion pumps
US4097195A (en) * 1975-02-12 1978-06-27 Varian Associates, Inc. High vacuum pump
JPS5641342A (en) * 1979-09-11 1981-04-18 Ulvac Corp Electrode material for sputtering ion pump
JPH03245449A (ja) * 1990-02-23 1991-11-01 Hitachi Ltd 放電安定化ペニング放電電極
RU2034359C1 (ru) * 1990-05-03 1995-04-30 Научно-исследовательский и конструкторский институт энерготехники Электроразрядный вакуумный насос
CN2165528Y (zh) * 1993-06-18 1994-05-18 南京理工大学 微型冷阴极溅射离子泵
JP2001357814A (ja) * 2000-06-15 2001-12-26 Jeol Ltd 極高真空スパッタイオンポンプ
US6509588B1 (en) * 2000-11-03 2003-01-21 Cardiac Pacemakers, Inc. Method for interconnecting anodes and cathodes in a flat capacitor
US20060045754A1 (en) * 2004-08-27 2006-03-02 Peter Lukens Ion pump for cryogenic magnet apparatus
CN201106064Y (zh) * 2007-09-28 2008-08-27 安徽华东光电技术研究所 一种三极溅射离子泵结构
FR2982618B1 (fr) * 2011-11-10 2014-08-01 Institut Nat Des Sciences Appliquees De Rennes Insa De Rennes Procede de fabrication d'un alliage a base de titane pour dispositifs biomedicaux
JP7059943B2 (ja) * 2019-01-15 2022-04-26 株式会社豊田自動織機 ロッカアーム

Also Published As

Publication number Publication date
US11056326B2 (en) 2021-07-06
RU2018133004A (ru) 2020-03-19
RU2721379C2 (ru) 2020-05-19
KR20180115679A (ko) 2018-10-23
JP2022009412A (ja) 2022-01-14
EP3417471B1 (en) 2021-06-02
CN108475613A (zh) 2018-08-31
US20190051504A1 (en) 2019-02-14
CN108475613B (zh) 2020-06-23
JP2019517094A (ja) 2019-06-20
ITUB20160885A1 (it) 2017-08-19
EP3417471A1 (en) 2018-12-26
WO2017140730A1 (en) 2017-08-24
RU2018133004A3 (enExample) 2020-03-19
KR102419940B1 (ko) 2022-07-13

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