JPS5641342A - Electrode material for sputtering ion pump - Google Patents

Electrode material for sputtering ion pump

Info

Publication number
JPS5641342A
JPS5641342A JP11577279A JP11577279A JPS5641342A JP S5641342 A JPS5641342 A JP S5641342A JP 11577279 A JP11577279 A JP 11577279A JP 11577279 A JP11577279 A JP 11577279A JP S5641342 A JPS5641342 A JP S5641342A
Authority
JP
Japan
Prior art keywords
matrix
electrode material
ion pump
intermetallic compounds
sputtering ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11577279A
Other languages
Japanese (ja)
Inventor
Yoshito Fukube
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP11577279A priority Critical patent/JPS5641342A/en
Publication of JPS5641342A publication Critical patent/JPS5641342A/en
Pending legal-status Critical Current

Links

Landscapes

  • Heat Treatment Of Nonferrous Metals Or Alloys (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: To obtain the titled material having remarkably increased H2 capturing capacity without lowering the capacity of capturing gases other than H2 by dispersing the phase of one or more kinds of intermetallic compounds each consisting of a matrix forming metal and one of Al, Be, Si, etc. in the matrix.
CONSTITUTION: The whole or at least part of the surface part of each of the anode and cathode or the cathode alone of a sputtering ion pump is made of material obtd. by dispersing the phase of one or more kinds of intermetallic compounds in Ti, Zr, Hf or their alloy as a matrix. The intermetallic compounds each consist of one of the matrix forming metals and Al, Be, Si, Ge, Sn or Cr. This electrode material is manufactured by heat treating one of the matrix forming metals and one of the additive metals in a vacuum or other atmosphere.
COPYRIGHT: (C)1981,JPO&Japio
JP11577279A 1979-09-11 1979-09-11 Electrode material for sputtering ion pump Pending JPS5641342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11577279A JPS5641342A (en) 1979-09-11 1979-09-11 Electrode material for sputtering ion pump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11577279A JPS5641342A (en) 1979-09-11 1979-09-11 Electrode material for sputtering ion pump

Publications (1)

Publication Number Publication Date
JPS5641342A true JPS5641342A (en) 1981-04-18

Family

ID=14670666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11577279A Pending JPS5641342A (en) 1979-09-11 1979-09-11 Electrode material for sputtering ion pump

Country Status (1)

Country Link
JP (1) JPS5641342A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6098218A (en) * 1983-11-01 1985-06-01 N D C Kk Manufacture of bearing metal
US4730884A (en) * 1982-09-30 1988-03-15 Fujitsu Limited Bipolar voltage controlled optical switch using intersecting waveguides
KR20180115679A (en) * 2016-02-19 2018-10-23 사에스 게터스 에스.페.아. A sintered non-porous cathode and a sputter ion vacuum pump containing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4730884A (en) * 1982-09-30 1988-03-15 Fujitsu Limited Bipolar voltage controlled optical switch using intersecting waveguides
JPS6098218A (en) * 1983-11-01 1985-06-01 N D C Kk Manufacture of bearing metal
JPS6330525B2 (en) * 1983-11-01 1988-06-20 Ndc Kk
KR20180115679A (en) * 2016-02-19 2018-10-23 사에스 게터스 에스.페.아. A sintered non-porous cathode and a sputter ion vacuum pump containing the same
JP2019517094A (en) * 2016-02-19 2019-06-20 サエス・ゲッターズ・エッセ・ピ・ア Sintered non-porous cathode and sputter ion vacuum pump including the same

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