JP6976686B2 - エッジリング特性評価を実行するためのシステムおよび方法 - Google Patents
エッジリング特性評価を実行するためのシステムおよび方法 Download PDFInfo
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Description
本願は、2016年3月29日出願の米国仮出願第62/314,659号の利益を主張する。上記の出願の開示全体が、参照によって本明細書に組み込まれる。
[適用例1]
基板処理システム内の基板支持体であって、
基板を支持するよう構成された内側部分と、
前記内側部分を囲むエッジリングと、
コントローラと、
を備え、
前記コントローラは、
(i)前記エッジリングを上げて、前記エッジリングを前記基板と選択的に係合させること、および、(ii)前記内側部分を下げて、前記エッジリングを前記基板と選択的に係合させること、の内の少なくとも一方を実行し、
前記エッジリングが前記基板と係合した時を決定し、
前記エッジリングが前記基板と係合した時の決定に基づいて、前記基板処理システムの少なくとも1つの特性を計算する、基板支持体。
[適用例2]
適用例1に記載の基板支持体であって、前記エッジリングが前記基板と係合した時を決定することは、前記エッジリングを前記基板と係合させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定することを含む、基板支持体。
[適用例3]
適用例1に記載の基板支持体であって、前記少なくとも1つの特性は、前記エッジリングの寸法である、基板支持体。
[適用例4]
適用例1に記載の基板支持体であって、前記基板は、前記基板の縁部から外向きに伸びる少なくとも1つの接触フィンガを備え、前記少なくとも1つの接触フィンガは、前記エッジリングと係合するよう構成されている、基板支持体。
[適用例5]
適用例4に記載の基板支持体であって、前記接触フィンガは、前記エッジリングの内径と係合するよう構成されている、基板支持体。
[適用例6]
適用例1に記載の基板支持体であって、前記エッジリングが前記基板と係合した時を決定するために、前記コントローラは、前記基板の表面から反射された信号を監視する、基板支持体。
[適用例7]
適用例1に記載の基板支持体であって、前記基板処理システムの前記少なくとも1つの特性を計算するために、前記コントローラは、前記エッジリングを前記基板と係合させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定する、基板支持体。
[適用例8]
適用例1に記載の基板支持体であって、さらに、
前記エッジリングを支持するために配置された複数のピンと、
前記コントローラに応答して、前記複数のピンのそれぞれを選択的に上下させるよう構成された複数のアクチュエータと、
を備える、基板支持体。
[適用例9]
適用例1に記載の基板支持体であって、さらに、
前記コントローラに応答して、前記内側部分を選択的に上下させるよう構成された少なくとも1つのアクチュエータを備える、基板支持体。
[適用例10]
基板処理システムの特性を決定する方法であって、
基板支持体の内側部分の上にテスト基板を配置する工程であって、前記テスト基板は、前記テスト基板の縁部から外向きに伸びる接触フィンガを備える、工程と、
(i)前記内側部分を囲むエッジリングを上げて、前記エッジリングの内径を前記接触フィンガと係合させること、および、(ii)前記内側部分を下げて、前記エッジリングの前記内径を前記接触フィンガと係合させること、の内の少なくとも一方を実行する工程と、
前記エッジリングの前記内径が前記接触フィンガと係合した時を決定する工程と、
前記エッジリングの前記内径が前記接触フィンガと係合した時の決定に基づいて、前記基板処理システムの少なくとも1つの特性を計算する工程と、
を備える、方法。
[適用例11]
適用例10に記載の方法であって、前記エッジリングの前記内径が前記基板と係合した時を決定する工程は、前記エッジリングの前記内径を前記基板と係合させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定する工程を含む、方法。
[適用例12]
適用例10に記載の方法であって、前記少なくとも1つの特性は、前記エッジリングの寸法である、方法。
[適用例13]
適用例10に記載の方法であって、前記基板は、前記基板の縁部から外向きに伸びる少なくとも1つの接触フィンガを備え、前記少なくとも1つの接触フィンガは、前記エッジリングと係合するよう構成されている、方法。
[適用例14]
適用例13に記載の方法であって、前記接触フィンガは、前記エッジリングの内径と係合するよう構成されている、方法。
[適用例15]
適用例10に記載の方法であって、前記エッジリングが前記基板と係合した時を決定する工程は、前記基板の表面から反射された信号を監視する工程を含む、方法。
[適用例16]
適用例10に記載の方法であって、前記基板処理システムの前記少なくとも1つの特性を計算する工程は、前記エッジリングを前記基板と係合させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定する工程を含む、方法。
[適用例17]
適用例10に記載の方法であって、前記エッジリングを上げる工程は、前記エッジリングを支持するために配置された複数のピンと、前記複数のピンのそれぞれを選択的に上下させるよう構成された複数のアクチュエータとを用いて、前記エッジリングを上げる工程を含む、方法。
[適用例18]
適用例10に記載の方法であって、前記内側部分を下げる工程は、前記内側部分を選択的に上下させるよう構成された少なくとも1つのアクチュエータを用いて、前記内側部分を下げる工程を含む、方法。
Claims (16)
- 基板処理システム内の基板支持体であって、
基板を支持するよう構成された内側部分と、
前記内側部分を囲むエッジリングと、
コントローラと、
を備え、
前記コントローラは、
(i)前記エッジリングを上げて、前記エッジリングを前記基板と選択的に接触させること、および、(ii)前記内側部分を下げて、前記エッジリングを前記基板と選択的に接触させること、の内の少なくとも一方を実行し、
前記エッジリングが前記基板に接触したことを示す測定信号に応答して、前記エッジリングが前記基板と接触した時を決定し、
前記エッジリングが前記基板と接触した時の決定に基づいて、前記エッジリングの厚さを計算するように構成されている、基板支持体。 - 請求項1に記載の基板支持体であって、前記エッジリングが前記基板と接触した時を決定するために、前記コントローラは、更に、前記エッジリングを前記基板と接触させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定するように構成されている、基板支持体。
- 請求項1に記載の基板支持体であって、更に、前記基板を備え、前記基板は、前記基板の縁部から外向きに伸びる少なくとも1つの接触フィンガを備え、前記少なくとも1つの接触フィンガは、前記エッジリングと接触するよう構成されている、基板支持体。
- 請求項3に記載の基板支持体であって、前記接触フィンガは、前記エッジリングの内径と接触するよう構成されている、基板支持体。
- 請求項1に記載の基板支持体であって、前記エッジリングが前記基板と接触した時を決定するために、前記コントローラは、前記測定信号を用いて、前記基板の表面から反射された信号を監視するように構成されている、基板支持体。
- 請求項1に記載の基板支持体であって、前記エッジリングの厚さを計算するために、前記コントローラは、前記エッジリングを前記基板と接触させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定するように構成されている、基板支持体。
- 請求項1に記載の基板支持体であって、さらに、
前記エッジリングを支持するために配置された複数のピンと、
前記コントローラに応答して、前記複数のピンのそれぞれを選択的に上下させるよう構成された複数のアクチュエータと、
を備える、基板支持体。 - 請求項1に記載の基板支持体であって、さらに、
前記コントローラに応答して、前記内側部分を選択的に上下させるよう構成された少なくとも1つのアクチュエータを備える、基板支持体。 - 基板処理システムにおけるエッジリングの厚さを決定する方法であって、
基板支持体の内側部分の上にテスト基板を配置する工程であって、前記テスト基板は、前記テスト基板の縁部から外向きに伸びる接触フィンガを備える、工程と、
(i)前記内側部分を囲むエッジリングを上げて、前記エッジリングの内径を前記接触フィンガと接触させること、および、(ii)前記内側部分を下げて、前記エッジリングの前記内径を前記接触フィンガと接触させること、の内の少なくとも一方を実行する工程と、
前記エッジリングの前記内径が前記テスト基板の前記接触フィンガに接触したことを示す測定信号に応答して、前記エッジリングの前記内径が前記接触フィンガと接触した時を決定する工程と、
前記エッジリングの前記内径が前記接触フィンガと接触した時の決定に基づいて、前記エッジリングの前記厚さを決定する工程と、
を備える、方法。 - 請求項9に記載の方法であって、前記エッジリングの前記内径が前記テスト基板と接触した時を決定する工程は、前記エッジリングの前記内径を前記テスト基板と接触させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定する工程を含む、方法。
- 請求項9に記載の方法であって、前記テスト基板は、前記テスト基板の縁部から外向きに伸びる少なくとも1つの接触フィンガを備え、前記少なくとも1つの接触フィンガは、前記エッジリングと接触するよう構成されている、方法。
- 請求項11に記載の方法であって、前記接触フィンガは、前記エッジリングの内径と接触するよう構成されている、方法。
- 請求項9に記載の方法であって、前記エッジリングが前記テスト基板と接触した時を決定する工程は、前記測定信号を用いて、前記テスト基板の表面から反射された信号を監視する工程を含む、方法。
- 請求項9に記載の方法であって、前記エッジリングの前記厚さを決定する工程は、前記エッジリングを前記テスト基板と接触させるために前記エッジリングが上げられた量および前記内側部分が下げられた量の少なくとも一方を決定する工程を含む、方法。
- 請求項9に記載の方法であって、前記エッジリングを上げる工程は、前記エッジリングを支持するために配置された複数のピンと、前記複数のピンのそれぞれを選択的に上下させるよう構成された複数のアクチュエータとを用いて、前記エッジリングを上げる工程を含む、方法。
- 請求項9に記載の方法であって、前記内側部分を下げる工程は、前記内側部分を選択的に上下させるよう構成された少なくとも1つのアクチュエータを用いて、前記内側部分を下げる工程を含む、方法。
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