JP6962463B2 - Iii族窒化物半導体基板の製造方法 - Google Patents
Iii族窒化物半導体基板の製造方法 Download PDFInfo
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Description
0072
ダミーSi基板を予めMOCVD炉内に設置し、1200℃のH2雰囲気で炉内のベーキングを30分間行い、炉内のクリーニングを実施した後、NH3を導入して1100℃で5分間処理し、TMAをさらに導入して10分間処理し、炉内にAlN被膜を形成した。その後、炉内を降温してダミーSi基板を取り出した。
炉内にAlN被膜を形成する際にTMA及びNH3を交互に供給する手法を用いた点以外は実施例1と同じ条件でIII族窒化物半導体基板を製造した。詳細には、1200℃の炉内にTMAをArキャリアガスとともに3秒間導入し、NH3をArキャリアガスとともに6秒間導入する工程を50回繰り返して、AlN被膜を形成した。その後、Si基板上に第一AlN層、第二AlN層、GaN層を順に形成することにより、実施例2のIII族窒化物半導体基板を得た。
AlNバッファ層を成長させる際にTMAを先行して導入し、TMAの導入を一時停止してNH3のみを導入した後、TMAとNH3の両方を供給した点以外は実施例2と同じ条件でIII族窒化物半導体基板を製造した。詳細には、1000℃まで昇温した炉内にTMAを先行して10秒間供給し、TMAの供給を一時停止してNH3のみを20秒間供給した後、TMAの供給を再開してTMAとNH3を一緒に供給した。こうして実施例3のIII族窒化物半導体基板を得た。
AlNバッファ層を形成する際に第一AlN層を600℃の低温で成長させた後、第二AlN層を1100℃の高温で成長させた点以外は実施例3と同じ条件でIII族窒化物半導体基板を製造した。詳細には、600℃の炉内にTMA及びNH3をArキャリアガスとともに導入し、Si基板の上面に第一AlN層を10nm成長させた。その際、TMAを先行して導入し、TMAの導入を一時停止してNH3のみを導入した後、TMAとNH3の両方を供給した。その後、TMA及びNH3を供給し続けながら炉内温度を1100℃まで昇温し、第一AlN層の上面に第二AlN層を90nm成長させた。
Si基板上にSiO2からなるストライプ状のマスクパターンを形成した後、AlNバッファ層及びGaN層を順に積層した点以外は実施例2と同じ条件でIII族窒化物半導体基板を製造した。詳細には、Si基板の全面を厚さ100nmのSiO2多結晶膜で覆った後、ライン幅及びスペース幅がともに1umのストライプ形状にパターニングしてSi基板の表面を部分的に露出させた。その後、マスクパターンが形成されたSi基板上に第一AlN層、第二AlN層、GaN層を順に形成することにより、実施例5のIII族窒化物半導体基板を得た。
炉内にAlN被膜を形成しなかった点以外は実施例1と同じ条件で比較例1のIII族窒化物半導体基板を製造した。炉内にAlN被膜を形成しないため、ダミーSi基板も使用しなかった。
10 Si基板
20 AlNバッファ層
21 第一AlN層
22 第二AlN層
30 III族窒化物半導体層
50 マスクパターン
100 MOCVD装置
101 サセプタ
102 炉(チャンバー)
103 ヒーター
104 回転軸
105 ガスインレット
106 ガスアウトレット
108 AlN被膜
D ダミーSi基板
E III-V族堆積物
W ウェーハ
Claims (22)
- 炉内にAlN被膜を形成する工程と、
前記AlN被膜に覆われた前記炉内にSi基板を投入して前記Si基板上にAlNバッファ層を形成する工程と、
前記AlNバッファ層上にIII族窒化物半導体層を形成する工程とを備え、
前記AlN被膜の形成温度が1100〜1200℃であることを特徴とするIII族窒化物半導体基板の製造方法。 - 前記AlN被膜は、炉内面又は炉内部材に付着する堆積物を被覆する、請求項1に記載のIII族窒化物半導体基板の製造方法。
- 前記AlN被膜の形成時間が1〜30分である、請求項1又は2に記載のIII族窒化物半導体基板の製造方法。
- 前記AlN被膜を形成する工程は、前記炉内にAl原料とN原料とを交互に繰り返し導入する、請求項1乃至3のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記Al原料及び前記N原料をそれぞれ導入する際の1回当たりの時間が0.5〜10秒である、請求項4に記載のIII族窒化物半導体基板の製造方法。
- 前記繰り返し回数が5〜200回である、請求項4又は5に記載のIII族窒化物半導体基板の製造方法。
- 前記AlN被膜を形成する前に、前記炉内を水素含有雰囲気でクリーニングする工程をさらに備える、請求項1乃至6のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記AlN被膜を形成する前に、前記炉内にダミーSi基板を投入する工程と、
前記炉内に前記Si基板を投入する前に、前記炉内から前記ダミーSi基板を取り出す工程とをさらに備える、請求項1乃至7のいずれか一項に記載のIII族窒化物半導体基板の製造方法。 - 前記III族窒化物半導体層は、GaN層を含む、請求項1乃至8のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記AlNバッファ層の成長温度が400〜1200℃である、請求項1乃至9のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記AlNバッファ層を形成する工程は、
400〜800℃の成長温度で第一AlN層を成長させる工程と、
前記第一AlN層上に900〜1200℃の成長温度で第二AlN層を成長させる工程とを含む、請求項1乃至10のいずれか一項に記載のIII族窒化物半導体基板の製造方法。 - 前記AlNバッファ層を形成する工程は、
前記炉内にAl原料とN原料を導入する際に、前記N原料よりも先に前記Al原料を導入する、請求項1乃至11のいずれか一項に記載のIII族窒化物半導体基板の製造方法。 - 前記AlNバッファ層の形成を開始する前に前記炉内を昇温する工程、前記AlNバッファ層を形成する工程、及び前記III族窒化物半導体層を形成する工程の少なくとも一つにおいて、前記炉内の雰囲気ガスがArガスである、請求項1乃至12のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記AlNバッファ層を形成する工程は、
前記炉内にAl原料とN原料を導入する際に、
前記N原料を供給することなく前記Al原料を供給し、
前記Al原料の供給を一時停止して前記N原料の供給を開始し、
前記Al原料の供給を再開して前記Al原料と前記N原料の両方を供給する、請求項1乃至13のいずれか一項に記載のIII族窒化物半導体基板の製造方法。 - 前記Al原料の供給を一時停止して前記N原料を供給する時間が1〜180秒である、請求項14に記載のIII族窒化物半導体基板の製造方法。
- 前記AlNバッファ層を形成する前に、前記Si基板の表面の一部が露出するように前記Si基板上にマスクパターンを形成する工程をさらに備え、
前記AlNバッファ層は、前記マスクパターンが形成された前記Si基板上に形成される、請求項1乃至15のいずれか一項に記載のIII族窒化物半導体基板の製造方法。 - 前記Si基板の露出面積に対する前記マスクパターンによる被覆面積の割合が0.5〜10である、請求項16に記載のIII族窒化物半導体基板の製造方法。
- 前記マスクパターンがストライプパターンであり、前記ストライプパターンのライン幅が0.1〜2umである、請求項16又は17に記載のIII族窒化物半導体基板の製造方法。
- 前記マスクパターンは多結晶又はアモルファスからなる、請求項16乃至18のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記マスクパターンはSiO2又はSiNXからなる、請求項16乃至19のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記マスクパターンの厚さが5〜300nmである、請求項16乃至20のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
- 前記AlNバッファ層の厚さが10〜300nmである、請求項16乃至21のいずれか一項に記載のIII族窒化物半導体基板の製造方法。
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