JP6955852B2 - 半導体装置および半導体装置の製造方法 - Google Patents
半導体装置および半導体装置の製造方法 Download PDFInfo
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Description
図1は、本発明の第1の実施形態に係る半導体装置1の構成を示す断面図である。半導体装置1は、素子形成領域R1および素子分離領域(フィールド領域)R2を有する半導体基板10を備えている。素子形成領域R1は、トランジスタや抵抗素子等の半導体素子が形成される領域である。図1には、素子形成領域R1に形成される半導体素子として、MOSFET(metal-oxide-semiconductor field-effect transistor)30が例示されている。なお、図1には、1つの素子形成領域R1が示されているが、半導体装置1は、複数の素子形成領域R1を含み得る。
図7は、本発明の第2の実施形態に係るアライメントマーク60Aの構成を示す断面である。上記の第1の実施形態では、アライメントマーク60は、第1の配線50が設けられる配線層に形成され、第1の配線50の材料と同じ材料で構成されるものであった。これに対して、第2の実施形態に係るアライメントマーク60Aは、絶縁体層(フィールド酸化膜)11を構成する絶縁体11a上に設けられた、表面にメタルシリサイド層62を有するポリシリコン膜61を含んで構成されている。メタルシリサイド層62は、ポリシリコン膜61上にコバルト、ニッケルまたはチタン等の金属を堆積した後、熱処理を実施することで形成することができる。ポリシリコン膜61は、素子形成領域R1に形成されるMOSFET30のゲート32を形成する工程と同じ工程で形成することができる。
10 半導体基板
11 絶縁体層
12 ダミーアクティブ
30 MOSFET
50 第1の配線
60、60A アライメントマーク
80 貫通電極
90 第2の配線
R1 素子形成領域
R2 素子分離領域
Claims (13)
- 第1の面に形成された半導体素子を有する素子形成領域、および前記第1の面に形成された絶縁体を有する素子分離領域を含む半導体基板と、
前記半導体基板の前記第1の面の側に設けられ、前記半導体素子に接続された第1の配線と、
前記半導体基板の前記第1の面の側において前記絶縁体の延在する範囲に内包される領域に設けられたアライメントマークと、
前記半導体基板の前記第1の面とは反対側の第2の面の側に設けられ、前記第1の配線に対して整合する位置に配置されている第2の配線と、
前記半導体基板を貫通し、前記第1の配線と前記第2の配線とを互いに接続する貫通電極と、
を含む半導体装置。 - 前記アライメントマークは、前記第1の配線が設けられる配線層に設けられている
請求項1に記載の半導体装置。 - 前記貫通電極は、前記第1の配線に対して整合する位置に配置されている
請求項1または請求項2に記載の半導体装置。 - 前記アライメントマークは、前記半導体基板の前記第2の面の側から照射される赤外線によって認識される
請求項1から請求項3のいずれか1項に記載の半導体装置。 - 前記半導体基板は、前記素子分離領域において絶縁体中に前記半導体基板が島状に露出した複数のダミー部を有し、
前記アライメントマークは、前記複数のダミー部のいずれとも重ならない位置に設けられている
請求項1から請求項4のいずれか1項に記載の半導体装置。 - 前記絶縁体はSTI構造を有する
請求項1から請求項5のいずれか1項に記載の半導体装置。 - 半導体基板の第1の面の素子分離領域に絶縁体を形成する工程と、
前記半導体基板の前記第1の面の素子形成領域に半導体素子を形成する工程と、
前記半導体基板の前記第1の面の側に、前記半導体素子に接続された第1の配線を形成する工程と、
前記半導体基板の前記第1の面の側の、前記絶縁体の延在する範囲に内包される領域にアライメントマークを形成する工程と、
前記半導体基板の前記第1の面とは反対側の第2の面の側に第2の配線を形成する工程と、
前記第1の配線および前記アライメントマークの形成後に前記半導体基板を貫通する貫通電極を形成する工程と、
を含み、
前記アライメントマークを用いて前記第2の配線を前記第1の配線に対して整合する位置に配置し、
前記第1の配線と前記第2の配線とが、前記貫通電極によって互いに接続される
半導体装置の製造方法。 - 前記アライメントマークを、前記第1の配線が設けられる配線層に設ける
請求項7に記載の製造方法。 - 前記アライメントマークを用いて前記第1の配線に対して整合する位置に前記貫通電極を配置する
請求項7または請求項8に記載の製造方法。 - 前記半導体基板の前記第2の面の側から赤外線を照射することによって前記アライメントマークを認識する
請求項7から請求項9のいずれか1項に記載の製造方法。 - 前記貫通電極を形成する工程は、前記半導体基板の前記第2の面の側から前記第1の配線に達する貫通孔を形成する工程を含み、
前記半導体基板の前記第2の面の側から赤外線を照射することによって認識された前記アライメントマークを基準として前記貫通孔の形成位置を定める
請求項9に記載の製造方法。 - 前記素子分離領域において、絶縁体中に前記半導体基板が島状に露出した複数のダミー部を形成し、
前記アライメントマークを前記複数のダミー部のいずれとも重ならない位置に配置する
請求項7から請求項11のいずれか1項に記載の製造方法。 - 前記素子分離領域に前記絶縁体を形成する工程は、
前記半導体基板の前記第1の面にトレンチを形成する工程と、
前記トレンチを埋めるように前記半導体基板の前記第1の面に前記絶縁体を構成する絶縁膜を形成する工程と、
前記絶縁膜の表面を平坦化する工程と、を含む
請求項7から請求項12のいずれか1項に記載の製造方法。
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