JP6924458B2 - 積層体の製造方法および積層体 - Google Patents

積層体の製造方法および積層体 Download PDF

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JP6924458B2
JP6924458B2 JP2016220078A JP2016220078A JP6924458B2 JP 6924458 B2 JP6924458 B2 JP 6924458B2 JP 2016220078 A JP2016220078 A JP 2016220078A JP 2016220078 A JP2016220078 A JP 2016220078A JP 6924458 B2 JP6924458 B2 JP 6924458B2
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substrate
mist
carrier gas
droplets
film
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JP2018076567A5 (enExample
JP2018076567A (ja
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貴博 佐々木
貴博 佐々木
柳生　慎悟
慎悟 柳生
俊実 人羅
俊実 人羅
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Flosfia Inc
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JP2016220078A 2016-11-10 2016-11-10 積層体の製造方法および積層体 Active JP6924458B2 (ja)

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JP2018076567A5 JP2018076567A5 (enExample) 2019-12-26
JP6924458B2 true JP6924458B2 (ja) 2021-08-25

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Publication number Priority date Publication date Assignee Title
JP4205912B2 (ja) * 2002-08-13 2009-01-07 時田シーブイディーシステムズ株式会社 透明な酸化イットリウム膜とその製造方法
JP2004300575A (ja) * 2003-03-14 2004-10-28 Showa Denko Kk 金属酸化物の成膜方法
JP4257518B2 (ja) * 2003-12-05 2009-04-22 Ｊｓｒ株式会社 ペロブスカイト型結晶粒子の製造方法、ペロブスカイト型結晶粒子分散体の製造方法および誘電体膜
JP2006016668A (ja) * 2004-07-01 2006-01-19 Seiko Epson Corp 成膜方法、無機物膜、電子部品および電子機器
JP5055747B2 (ja) * 2004-11-10 2012-10-24 大日本印刷株式会社 金属酸化物膜の製造方法
JP4829036B2 (ja) * 2006-08-11 2011-11-30 株式会社小糸製作所 透光性積層体
WO2011027425A1 (ja) * 2009-09-02 2011-03-10 東芝三菱電機産業システム株式会社 金属酸化膜の成膜方法、金属酸化膜および金属酸化膜の成膜装置
JP5688911B2 (ja) * 2010-03-03 2015-03-25 東京エレクトロン株式会社 成膜装置、システム及び成膜方法
JP6103633B2 (ja) * 2013-02-08 2017-03-29 高知県公立大学法人 オゾン支援による高品質均質金属酸化物薄膜作製技術、及び、該薄膜作製技術による酸化物薄膜トランジスタの製造方法
CN111876751A (zh) * 2015-02-18 2020-11-03 株式会社尼康 电子器件制造装置及方法、半导体装置和显示器

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